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Publication of NL220174ApublicationCriticalpatent/NL220174A/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
G03C1/00—Photosensitive materials
G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
G03C1/825—Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
G03C1/835—Macromolecular substances therefor, e.g. mordants
C—CHEMISTRY; METALLURGY
C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
C08F8/00—Chemical modification by after-treatment
C—CHEMISTRY; METALLURGY
C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
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Physics & Mathematics
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Organic Chemistry
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Chemical Kinetics & Catalysis
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Medicinal Chemistry
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Polymers & Plastics
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Health & Medical Sciences
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General Chemical & Material Sciences
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Spectroscopy & Molecular Physics
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Engineering & Computer Science
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Materials Engineering
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General Physics & Mathematics
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Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications
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