NL220139A - - Google Patents
Info
- Publication number
- NL220139A NL220139A NL220139DA NL220139A NL 220139 A NL220139 A NL 220139A NL 220139D A NL220139D A NL 220139DA NL 220139 A NL220139 A NL 220139A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US834337XA | 1956-08-27 | 1956-08-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL220139A true NL220139A (fr) |
Family
ID=22178295
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL220139D NL220139A (fr) | 1956-08-27 | ||
NL103565D NL103565C (fr) | 1956-08-27 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL103565D NL103565C (fr) | 1956-08-27 |
Country Status (4)
Country | Link |
---|---|
BE (1) | BE560154A (fr) |
FR (1) | FR1186296A (fr) |
GB (1) | GB834337A (fr) |
NL (2) | NL103565C (fr) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5917414B2 (ja) * | 1975-10-07 | 1984-04-21 | 村上スクリ−ン (株) | スクリ−ン版用感光性組成物及び感光膜 |
DE3144905A1 (de) * | 1981-11-12 | 1983-05-19 | Basf Ag, 6700 Ludwigshafen | Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials |
DE3274156D1 (en) * | 1981-12-10 | 1986-12-11 | Toray Industries | Photosensitive polymer composition |
DE3322994A1 (de) * | 1983-06-25 | 1985-01-10 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliches, wasserentwickelbares aufzeichnungsmaterial fuer die herstellung von druck-, reliefformen oder resistmustern |
DE3322993A1 (de) * | 1983-06-25 | 1985-01-03 | Basf Ag, 6700 Ludwigshafen | Verfahren zur acylierung von polyvinylalkoholen und so acylierte produkte enthaltende photopolymerisierbare und/oder photovernetzbare mischungen |
DE3324642A1 (de) * | 1983-07-08 | 1985-01-17 | Basf Ag, 6700 Ludwigshafen | Verfahren zur stabilisierung von photopolymerisierbaren mischungen |
DE3324643A1 (de) * | 1983-07-08 | 1985-01-17 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbare wasserloesliche oder wasserdispergierbare mischung |
US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US4670507A (en) * | 1985-08-02 | 1987-06-02 | American Hoechst Corporation | Resin |
US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
EP0211406A3 (fr) * | 1985-08-02 | 1988-08-17 | Hoechst Celanese Corporation | Composition photopolymérisable à base de polyvinylacétal comme liant, et matériel d'enregistrement préparé avec cette composition |
US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4895788A (en) * | 1985-08-02 | 1990-01-23 | Hoechst Celanese Corporation | Water developable lithographic composition |
US4707437A (en) * | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
DE3541162A1 (de) * | 1985-11-21 | 1987-05-27 | Basf Ag | Photoempfindliche aufzeichnungsmaterialien mit elastomeren pfropfcopolymerisat-bindemitteln sowie reliefformen daraus |
DE3924811A1 (de) * | 1989-07-27 | 1991-01-31 | Hoechst Ag | Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial |
US5683837A (en) * | 1994-11-18 | 1997-11-04 | Napp Systems, Inc. | Water-soluble compositions for preparation of durable, high-resolution printing plates |
WO1996018133A1 (fr) * | 1994-12-06 | 1996-06-13 | Napp Systems, Inc. | Plaques d'impression typo a haute resolution et compositions hydrosolubles photopolymerisables comprenant un derive de l'alcool polyvinylique associees |
-
0
- BE BE560154D patent/BE560154A/xx unknown
- NL NL220139D patent/NL220139A/xx unknown
- NL NL103565D patent/NL103565C/xx active
-
1957
- 1957-08-13 GB GB25584/57A patent/GB834337A/en not_active Expired
- 1957-08-26 FR FR1186296D patent/FR1186296A/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
BE560154A (fr) | |
FR1186296A (fr) | 1959-08-19 |
NL103565C (fr) | |
GB834337A (en) | 1960-05-04 |