NL2033484A - Adjustment device for control of density of extracted particles from ion source and control method thereof - Google Patents
Adjustment device for control of density of extracted particles from ion source and control method thereof Download PDFInfo
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- NL2033484A NL2033484A NL2033484A NL2033484A NL2033484A NL 2033484 A NL2033484 A NL 2033484A NL 2033484 A NL2033484 A NL 2033484A NL 2033484 A NL2033484 A NL 2033484A NL 2033484 A NL2033484 A NL 2033484A
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- gas inlet
- density
- inlet pipe
- flange
- ramp
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/08—Arrangements for injecting particles into orbits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21B—FUSION REACTORS
- G21B1/00—Thermonuclear fusion reactors
- G21B1/11—Details
- G21B1/15—Particle injectors for producing thermonuclear fusion reactions, e.g. pellet injectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/024—Moving components not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/065—Source emittance characteristics
- H01J2237/0656—Density
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/08—Arrangements for injecting particles into orbits
- H05H2007/081—Sources
- H05H2007/082—Ion sources, e.g. ECR, duoplasmatron, PIG, laser sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/08—Arrangements for injecting particles into orbits
- H05H2007/087—Arrangements for injecting particles into orbits by magnetic means
Abstract
The present invention provides an adjustment device for control of density of extracted particles from ion source and control method thereof. The adjustment device includes a first flange, a second flange, insulating rods, a coupling coil, a glass cylinder, a discharge chamber, a compression plate, a gas inlet pipe, a clamping mechanism, a slipway rail, a connecting rod and a sealing ring, where the first flange and the second flange are connected to the glass cylinder with rubber sealing rings, so as to form the discharge chamber in the glass cylinder; the discharge chamber is a plasma generation chamber, which is isolated from the outside air when working; the first flange and the second flange are connected to a quantity of the insulating rods through threads; and one end of the first flange is tightly connected to one end of the clamping mechanism through a clamp.
Description
P1634 /NL
ADJUSTMENT DEVICE FOR CONTROL OF DENSITY OF EXTRACTED PARTICLES
FROM ION SOURCE AND CONTROL METHOD THEREOF
The present invention belongs to the field of plasma extrac- tion, and particularly relates to an adjustment device for control of density of extracted particles from ion source and control method thereof.
Inductively coupled RF ion sources have been widely used in material science, medical instruments, magnetic confinement fu- sion, and the like. In a neutral beam injection (NBI) system, RF power generates an electromagnetic field through a coupling coil, accelerating electrons to collide with other particles, thus ion- izing the gas to form a plasma. Charged particles in the plasma, such as negatively charged electrons and negative ions as well as positively charged positive ions, can be accelerated and extracted through extraction electrodes, and the extracted particles, through the acceleration of acceleration electrodes, constitute a particle beam, which can be used for plasma heating and current driving of a magnetic confinement fusion device, and the same principle also applies to the apparatus such as a proton therapeu- tic apparatus.
At present, the length of a discharge chamber of a RF ion source is relatively fixed, so that it is not easy to control the density of the gas in the chamber. By changing the volume of the extraction chamber, the density of the extracted particles is changed, so as to achieve the purpose of changing the beam energy.
Main shortcomings of existing structures are as follows: (1) The volume of the discharge chamber is relatively fixed, which lacks volume adjustment capability and has low flexibility. (2) The volume adjustment of the discharge chamber needs on- site human operation, and the adjustment can only be performed af- ter stopping the test each time, which is not intelligent enough.
(3) The density of the extracted particles can only be changed by changing RF discharge parameters (RF power or discharge pressure) or changing extraction voltage, and frequent changes of the discharge parameters or extraction voltage are not conducive to the stable operation of the system. (4) Changing the RF discharge parameters to adjust the densi- ty of the extracted particles may lead to a change of equivalent impedance of the coupling coil, which makes the design of imped- ance matching network more difficult and costly. (5) Adjusting the discharge parameters or extraction voltage to adjust the density of the extracted particles may increase com- plexity of apparatus operation, requiring operators to have rich experience on RF plasma discharge and extraction as well as solid knowledge of RF plasma physics, which results in a reduction of universality of the apparatus operation.
An object of the present invention is to provide an adjust- ment device for control of density of extracted particles from ion source and control method therecf, which is able to effectively solve the following problems in the background art: the volume of the discharge chamber is relatively fixed and cannot be adjusted; the adjustment of the discharge chamber needs the apparatus to be stopped for on-site adjustment; and under the same conditions, changing the discharge parameters and extraction voltage may have a great impact on the density and performance of extracted parti- cles.
The present invention adopts the following technical solu- tions for solving the above technical problems:
The present invention includes an adjustment device for con- trol of density of extracted particles from ion source, where the device includes a first flange, a second flange, insulating rods, a coupling coil, a glass cylinder, a discharge chamber, a compres- sion plate, a gas inlet pipe, a clamping mechanism, a slipway rail, a connecting rod and a sealing ring, where the first flange and the second flange are connected to the glass cylinder with rubber sealing rings, so as to form the discharge chamber in the glass cylinder; the discharge chamber is a plasma generation cham- ber, which is isolated from the outside air when working; a lower end of the gas inlet pipe is welded to an upper surface of the compression plate, and a gas inlet hole is reserved at the welding position of the gas inlet pipe with the compression plate; the compression plate is arranged in the discharge chamber, so as to compress the volume of the discharge chamber by the compression plate moving up and down; the first flange and the second flange are connected to a quantity of the insulating rods through threads; one end of the first flange is tightly connected to one end of the clamping mechanism through a clamp, where the clamping mechanism includes the sealing ring which is arranged at an upper end of the clamping mechanism, and the upper end of the clamping mechanism is provided with a through-hole, the gas inlet pipe passes through the through-hole and is tightly fitted with the sealing ring; one end of the gas inlet pipe is arranged in the discharge chamber, and the other end of the gas inlet pipe passes through a rod hole, which is provided at one end of the connecting rod, and is tightly connected thereto with screws; the other end of the connecting rod is fixedly connected to a side surface of the slipway rail; the slipway rail further includes a remote con- trol end, and is electrically connected thereto; the number of the insulating rods is six, and the first flange is electrically iso- lated from the second flange by the insulating rods.
Further, a gap is reserved between the coupling coil and the glass cylinder, the slipway rail is in a horizontal state and is arranged parallel to the axis of the discharge chamber, and when moving, the slipway rail drives the connecting rod and the gas in- let pipe to move up and down without forcing the discharge chamber to displace, thereby increasing gas tightness of the apparatus; and since the slipway rail is parallel to the axis of the dis- charge chamber, it is ensured that the connecting rod drives the gas inlet pipe to move in a vertical state, so as to avoid shaking of the glass cylinder.
Further, the connecting rod is made from an insulating mate- rial so as to electrically isolate the slipway rail from the gas inlet pipe.
Further, threaded holes are provided at the connection of the slipway rail with the connecting rod, so as to facilitate removal and replacement of the connecting rod.
Further, the remote control end transmits signals to the slipway rail via optical fibers, so as to prevent interference of a RF electromagnetic field.
A control method of the adjustment device for control of den- sity of extracted particles from ion source of the present inven- tion includes the following steps:
Step 1: after installing an ion source apparatus, fixing the slipway rail onto a workbench, allowing one end of the gas inlet pipe to pass through the clamping mechanism and into the glass cylinder, while the other end serving as a gas access port, and fixing two ends of the connecting rod respectively to the slipway rail and the gas inlet pipe with screws, so as to ensure that the gas inlet pipe will not fall off or excessively shake when the rail moves up and down, which may otherwise affect the gas tight- ness;
Step 2: introducing a gas at an upper end of the gas inlet pipe, and connecting the coupling coil to a high voltage, so as to ionize the gas in the glass cylinder; when the density of the ex- tracted particles needs to be increased, a signal is given from the remote control end to control the slipway rail to move down, so as to drive the gas inlet pipe and the compression plate to move down, where the compression plate compresses the volume of the gas in the glass cylinder, thereby increasing the density of the extracted particles; when the density of the extracted parti- cles needs to be reduced, a signal is given from the remote con- trol end to control the slipway rail to move up, so as to drive the gas inlet pipe and the compression plate to move up, where the compression plate releases the volume of the gas in the glass cyl- inder, thereby reducing the density of the extracted particles.
The travel of the compression plate will not exceed the length of the glass cylinder when the slipway rail moves.
The present invention has following advantageous effects: 1. The present invention divides the glass cylinder inte two parts by a compression plate, so that the discharge chamber can be adjusted, thereby increasing the density of the particles so as to improve the extraction capacity, and during adjustment of the den- sity of the extracted particles, it is no longer necessary to ad-
Just RF power or discharge pressure, or the required adjustment 5 range of the RF power and the discharge pressure can be reduced. 2. The present invention can remotely adjust the apparatus through the remote end, which increases the safety of the experi- ment and reduces repetitive work, and the connecting rod is made from an insulating material so that the movement mechanism is iso- lated from the experimental site, which increases the reliability of the experiment. 3. The impact on the impedance matching network and the RF power source caused by the adjustment of RF power or discharge pressure is avoided, the requirement for the adjustment response of the RF power source is reduced, and the adjustment range re- quired by the impedance matching network is reduced, which may re- duce the cost to a certain extent, enhance the stability of RF plasma discharge, and greatly reduce the complexity of system op- eration.
Of course, it is not necessary for any product embodying the present invention to achieve all the advantages described above together.
In order to illustrate more clearly the technical solutions in embodiments of the present invention, a brief introduction will be given to the accompanying drawings which are required to be used in the description of the embodiments; it is obvious that the drawings in the description below are merely some embodiments of the present invention, and that a person of ordinary skill in the art can obtain other drawings according to these drawings without involving any inventive effort.
FIG. 1 is a schematic structural diagram of an adjustment de- vice for control of density of extracted particles from ion source and control method thereof according to the present invention;
FIG. 2 is a schematic top view of an adjustment device for control of density of extracted particles from ion source and con-
trol method thereof according to the present invention;
FIG. 3 is a schematic sectional view at A-A in FIG. 2; and
FIG. 4 is a partially enlarged view at the portion I in FIG. 3.
In the drawings, the components represented by the reference numerals are as follows: 1, first flange; 2, second flange; 3, insulating rods; 4, coupling coil; 5, glass cylinder; 6, discharge chamber; 7, com- pression plate; 8, gas inlet pipe; 9, clamping mechanism; 10, slipway rail; 11, connecting rod; 12, sealing ring.
The technical solutions in the embodiments of the present in- vention will now be described more clearly and fully hereinafter with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the embodiments de- scribed are only a few, but not all embodiments of the invention.
Based on the embodiments of the present invention, all other em- bodiments obtained by a person of ordinary skill in the art with- out inventive effort shall fall within the protection scope of the present invention.
In description of the present invention, it is to be under- stood that the terms “upper”, “middle”, “outside”, “inside”, etc., indicate directional or positional relationships, and are merely used to facilitate the description of the present invention and simplify the description, without indicating or suggesting that the assembly or element referred to must have a particular direc- tion or be constructed and operated in a particular direction.
Therefore, it cannot be interpreted as limiting the scope of pro- tection of the present invention.
Embodiment 1:
With reference to FIGs. 1-4, the present invention provides an adjustment device for control of density of extracted particles from ion source, where the device includes a first flange 1, a second flange 2, insulating rods 3, a coupling coil 4, a glass cylinder 5, a discharge chamber 6, a compression plate 7, a gas inlet pipe 8, a clamping mechanism 9, a slipway rail 10, a con-
necting rod 11 and a sealing ring 12, wherein the first flange 1 and the second flange 2 are connected to the glass cylinder 5 with rubber sealing rings, so as to form the discharge chamber 6 in the glass cylinder 5; the discharge chamber 6 is a plasma generation chamber, which is isolated from the outside air when working; a lower end of the gas inlet pipe 8 is welded to an upper surface of the compression plate 7, and a gas inlet hole is reserved at the welding position of the gas inlet pipe 8 with the compression plate 7; the compression plate 7 is arranged in the discharge chamber 6, so as to compress the volume of the discharge chamber 6 by the compression plate 7 moving up and down. The first flange 1 and the second flange 2 are connected to a quantity of the insu- lating rods 3 through threads; one end of the first flange 1 is tightly connected to one end of the clamping mechanism 9 through a clamp, wherein the clamping mechanism 9 includes the sealing ring 12 which is arranged at an upper end of the clamping mechanism 9, and the upper end of the clamping mechanism 9 is provided with a through-hole, the gas inlet pipe 8 passes through the through-hole and is tightly fitted with the sealing ring 12; one end of the gas inlet pipe 8 is arranged in the discharge chamber 6, and the other end of the gas inlet pipe 8 passes through a rod hole, which is provided at one end of the connecting rod 11, and is tightly con- nected thereto with screws; the other end of the connecting rod 11 is fixedly connected to a side surface of the slipway rail 10; the slipway rail 10 further includes a remote control end, and is electrically connected thereto; the number of the insulating rods 3 is six, and the first flange 1 is electrically isolated from the second flange 2 by the insulating rods 3.
A gap is reserved between the coupling coil 4 and the glass cylinder 5, the slipway rail 10 is in a horizontal state and is arranged parallel to the axis of the discharge chamber 6, and when moving, the slipway rail 10 drives the connecting rod 11 and the gas inlet pipe 8 to move up and down without forcing the discharge chamber 6 to displace, thereby increasing gas tightness of the ap- paratus; and since the slipway rail 10 is parallel to the axis of the discharge chamber 6, it is ensured that the connecting rod 11 drives the gas inlet pipe 8 to move in a vertical state, so as to avoid shaking of the glass cylinder 5.
The connecting rod 11 is made from an insulating material so as to electrically isolate the slipway rail 10 from the gas inlet pipe 8.
Threaded holes are provided at the connection of the slipway rail 10 with the connecting rod 11, so as to facilitate removal and replacement of the connecting rod 11.
The remote control end transmits signals to the slipway rail via optical fibers, so as to prevent interference of a RF elec- 10 tromagnetic field.
A control method of the adjustment device for control of den- sity of extracted particles from ion source of the present inven- tion includes the following steps:
Step 1: after installing an ion source apparatus, fixing the slipway rail 10 onto a workbench, allowing one end of the gas in- let pipe 8 to pass through the clamping mechanism 9 and into the glass cylinder 5, while the other end serving as a gas access port, and fixing two ends of the connecting rod 11 respectively to the slipway rail 10 and the gas inlet pipe 8 with screws, so as to ensure that the gas inlet pipe 8 will not fall off or excessively shake when the rail moves up and down, which may otherwise affect the gas tightness;
Step 2: introducing a gas at an upper end of the gas inlet pipe 8, and connecting the coupling coil 4 to a high voltage, so as to ionize the gas in the glass cylinder 5; when the density of the extracted particles needs to be increased, a signal is given from the remote control end to control the slipway rail 10 to move down, so as to drive the gas inlet pipe 8 and the compression plate 7 to move down, wherein the compression plate 7 compresses the volume of the gas in the glass cylinder 5, thereby increasing the density of the extracted particles; when the density of the extracted particles needs to be reduced, a signal is given from the remote control end to control the slipway rail 10 to move up, so as to drive the gas inlet pipe 8 and the compression plate 7 to move up, wherein the compression plate 7 releases the volume of the gas in the glass cylinder 5, thereby reducing the density of the extracted particles.
The travel of the compression plate 7 will not exceed the length of the glass cylinder 5 when the slipway rail 10 moves.
The specific working principle is as follows: the clamping mechanism 9 and the sealing ring 12 are integrated in an existing product with a model thereof being KF25C025, and the model of the slipway rail 10 is FSK30; after the apparatus is installed and fixed, the discharge chamber 6 is in a vacuum state; a gas is in- troduced at the upper end of the gas inlet pipe 8; the gas is ion- ized in the glass cylinder 5, and the volume of the glass cylinder 5 is the volume of the discharge chamber 6, since there is cur- rently no device available for adjusting and controlling the vol- ume of the discharge chamber 6 in the market; by adding the com- pression plate 7 at the tail end of the gas inlet pipe 8, the glass cylinder 5 is divided into two parts, so that the introduced gas converges below the compression plate 7, and the volume of the discharge chamber 6 is the volume of the glass cylinder 5 below the compression plate 7, thereby achieving the purpose of control- ling the volume of the discharge chamber 6. In operation, the re- mote control end controls the slipway rail 10 to move, which fur- ther drives the connecting rod 11 to move up and down, so that the gas inlet pipe 8 is pulled; the gas inlet pipe 8 and the clamping mechanism 9 ensure tightness of the apparatus with the sealing ring 12, and the other end of the gas inlet pipe 8 drives the com- pression plate 7 to compress and release the volume of the dis- charge chamber 6, thereby achieving the purpose of controlling the density of the extracted particles.
In description of the specification, the description of ref- erence terms such as “one embodiment”, “an example”, “a specific example”, means that particular features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the invention. In the specification, schematic expressions of the above terms do not necessarily refer to the same embodiment or ex- ample. Further, the particular feature, structure, material, or characteristic described may be combined in a suitable manner in any one or more embodiments or examples.
The preferred embodiments of the present invention disclosed above are provided to help illustrate the present invention only.
The preferred embodiments do not set forth all the details, nor do they limit the invention to the specific implementations de- scribed. Obviously, many modifications and variations are possible in light of contents of the specification. The embodiments are se- lected and described specifically in the specification in order to better explain principles of the invention and its practical ap- plication to thereby enable those skilled in the art to well un- derstand and utilize the invention. The invention is limited only by the claims and the full scope and equivalents thereof.
Claims (6)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN202111616279.2A CN114284128B (en) | 2021-12-27 | 2021-12-27 | Adjusting device for controlling density of ion source extracted particles and control method thereof |
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NL2033484A true NL2033484A (en) | 2023-06-30 |
NL2033484B1 NL2033484B1 (en) | 2024-01-30 |
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NL2033484A NL2033484B1 (en) | 2021-12-27 | 2022-11-08 | Adjustment device for control of density of extracted particles from ion source and control method thereof |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150349740A1 (en) * | 2011-07-01 | 2015-12-03 | Plasmart Inc. | Impedance matching device, linear motion module, and radio frequency power supply device |
US20180138020A1 (en) * | 2016-11-02 | 2018-05-17 | Varian Semiconductor Equipment Associates, Inc. | Rf ion source with dynamic volume control |
WO2020082551A1 (en) * | 2018-10-23 | 2020-04-30 | 山东大学 | Precisely adjustable dielectric barrier discharge device and method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7557362B2 (en) * | 2004-02-04 | 2009-07-07 | Veeco Instruments Inc. | Ion sources and methods for generating an ion beam with a controllable ion current density distribution |
US8597462B2 (en) * | 2010-05-21 | 2013-12-03 | Lam Research Corporation | Movable chamber liner plasma confinement screen combination for plasma processing apparatuses |
CN108990245B (en) * | 2018-06-04 | 2021-01-12 | 台州学院 | Small-size adjustable plasma source in area |
CN113411944B (en) * | 2021-06-16 | 2023-08-01 | 中国科学院合肥物质科学研究院 | Device for adjusting coupling coil position to realize density adjustment of extracted particles |
-
2021
- 2021-12-27 CN CN202111616279.2A patent/CN114284128B/en active Active
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2022
- 2022-11-08 NL NL2033484A patent/NL2033484B1/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150349740A1 (en) * | 2011-07-01 | 2015-12-03 | Plasmart Inc. | Impedance matching device, linear motion module, and radio frequency power supply device |
US20180138020A1 (en) * | 2016-11-02 | 2018-05-17 | Varian Semiconductor Equipment Associates, Inc. | Rf ion source with dynamic volume control |
WO2020082551A1 (en) * | 2018-10-23 | 2020-04-30 | 山东大学 | Precisely adjustable dielectric barrier discharge device and method |
Also Published As
Publication number | Publication date |
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CN114284128A (en) | 2022-04-05 |
NL2033484B1 (en) | 2024-01-30 |
CN114284128B (en) | 2024-01-26 |
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