NL2030558B1 - Hydrophobic self-cleaning resin slurry, hydrophobic self-cleaning resin dental material and application thereof - Google Patents
Hydrophobic self-cleaning resin slurry, hydrophobic self-cleaning resin dental material and application thereof Download PDFInfo
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- 239000011347 resin Substances 0.000 title claims abstract description 78
- 229920005989 resin Polymers 0.000 title claims abstract description 78
- 238000004140 cleaning Methods 0.000 title claims abstract description 44
- 239000005548 dental material Substances 0.000 title claims description 51
- 230000002209 hydrophobic effect Effects 0.000 title claims description 44
- 239000002002 slurry Substances 0.000 title description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims abstract description 9
- -1 perfluoroalkyl acrylate Chemical compound 0.000 claims abstract description 4
- 238000002360 preparation method Methods 0.000 claims description 14
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 claims description 13
- 239000000178 monomer Substances 0.000 claims description 11
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052681 coesite Inorganic materials 0.000 claims description 8
- 229910052906 cristobalite Inorganic materials 0.000 claims description 8
- 229910052682 stishovite Inorganic materials 0.000 claims description 8
- 229910052905 tridymite Inorganic materials 0.000 claims description 8
- 229930006711 bornane-2,3-dione Natural products 0.000 claims description 7
- 239000003085 diluting agent Substances 0.000 claims description 7
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 5
- MKVYSRNJLWTVIK-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O.CC(=C)C(O)=O MKVYSRNJLWTVIK-UHFFFAOYSA-N 0.000 claims description 3
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 claims description 2
- 230000001476 alcoholic effect Effects 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 239000000725 suspension Substances 0.000 claims 7
- 241000894006 Bacteria Species 0.000 abstract description 8
- 230000005661 hydrophobic surface Effects 0.000 abstract description 4
- 230000001580 bacterial effect Effects 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000002086 nanomaterial Substances 0.000 abstract description 3
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 3
- 210000000214 mouth Anatomy 0.000 abstract description 2
- 239000005543 nano-size silicon particle Substances 0.000 abstract description 2
- 108090000623 proteins and genes Proteins 0.000 abstract description 2
- 102000004169 proteins and genes Human genes 0.000 abstract description 2
- 230000000052 comparative effect Effects 0.000 description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000010586 diagram Methods 0.000 description 8
- 230000010065 bacterial adhesion Effects 0.000 description 7
- 238000002386 leaching Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 230000000844 anti-bacterial effect Effects 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- 238000003760 magnetic stirring Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 238000000016 photochemical curing Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 241000194019 Streptococcus mutans Species 0.000 description 3
- 238000010998 test method Methods 0.000 description 3
- 108091003079 Bovine Serum Albumin Proteins 0.000 description 2
- 239000006144 Dulbecco’s modified Eagle's medium Substances 0.000 description 2
- 230000003385 bacteriostatic effect Effects 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 230000004663 cell proliferation Effects 0.000 description 2
- 239000012894 fetal calf serum Substances 0.000 description 2
- 238000012757 fluorescence staining Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 1
- GHXZTYHSJHQHIJ-UHFFFAOYSA-N Chlorhexidine Chemical compound C=1C=C(Cl)C=CC=1NC(N)=NC(N)=NCCCCCCN=C(N)N=C(N)NC1=CC=C(Cl)C=C1 GHXZTYHSJHQHIJ-UHFFFAOYSA-N 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- XEFQLINVKFYRCS-UHFFFAOYSA-N Triclosan Chemical compound OC1=CC(Cl)=CC=C1OC1=CC=C(Cl)C=C1Cl XEFQLINVKFYRCS-UHFFFAOYSA-N 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 230000010261 cell growth Effects 0.000 description 1
- 229940126678 chinese medicines Drugs 0.000 description 1
- 229960003260 chlorhexidine Drugs 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 210000002744 extracellular matrix Anatomy 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 230000002503 metabolic effect Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 230000002188 osteogenic effect Effects 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 230000010069 protein adhesion Effects 0.000 description 1
- TUFFYSFVSYUHPA-UHFFFAOYSA-M rhodamine 123 Chemical compound [Cl-].COC(=O)C1=CC=CC=C1C1=C(C=CC(N)=C2)C2=[O+]C2=C1C=CC(N)=C2 TUFFYSFVSYUHPA-UHFFFAOYSA-M 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229940009188 silver Drugs 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 229960003500 triclosan Drugs 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
- A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
- A61K6/887—Compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/70—Preparations for dentistry comprising inorganic additives
- A61K6/71—Fillers
- A61K6/76—Fillers comprising silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
Landscapes
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Plastic & Reconstructive Surgery (AREA)
- Inorganic Chemistry (AREA)
- Dental Preparations (AREA)
Abstract
According to the disclosure, the surface energy of the material is reduced by adding perfluoroalkyl acrylate (FMA). By introducing nano-silicon dioxide (nano-SiOz), the 5 mechanical property of resin is enhanced. Meanwhile, the micro roughness of resin is improved to construct a lotus-leaf-like micro-nano hierarchical structure. Such hydrophobic surface of the micro-nano structure could retain air to form an air layer on the surface of the material, so that the contact area with protein and bacteria is reduced. In such case, the adhesion of oral cavity-related bacteria and the formation of the 10 bacterial biofilm are inhibited, indicating that the material has excellent self-cleaning anti-biofouling property.
Description
HYDROPHOBIC SELF-CLEANING RESIN SLURRY, HYDROPHOBIC SELF-
CLEANING RESIN DENTAL MATERIAL AND APPLICATION THEREOF
[01] The disclosure relates to the technical field of dental materials, and in particular to a hydrophobic self-cleaning resin slurry a hydrophobic self-cleaning resin dental material and applications.
[02] At present, the most common methods for removing the oral plaque biofilm in clinical practice are mechanical removal methods or the use of antibacterial preparations.
The mechanical removal methods include tooth brushing, flossing and the like.
However, such physical removal methods lack durability, which does not meet the standards for plaque control. The commonly used antibacterial preparations include antibiotics, bacteriostatic and bactericidal chemical preparations (such as chlorhexidine, triclosan, silver preparations and antibacterial peptides), fluorides, extracts of traditional
Chinese medicines and natural plants, small molecular substances for inhibiting metabolic enzymes and the like to prevent biofilm maturation by means of bacteriostatic and bactericidal effects, bacterial adhesion inhibition and destruction of extracellular matrixes of plaques. However, the antibacterial preparations described above do not have the self-cleaning anti-biofouling efficacy.
[03] The disclosure provides a hydrophobic self-cleaning resin slurry, which includes the following preparation raw materials in parts by mass: 3-10 parts of a dimethacrylate monomer, 5-30 parts of triethylene glycol dimethacrylate (TEGDMA), 5-15 parts of perfluoroalkyl acrylate (FMA), 0-15 parts of a diluent, 1-15 parts of nano-silicon dioxide (nano-S102), 1-30 parts of y-methacryloxypropyl trimethoxysilane (KHS570), 0.05-0.5 part of Camphorquinone (CQ), and 0.1-1 part of a photocuring accelerator.
[04] Preferably, the dimethacrylate monomer includes bisphenol A-glycidyl dimethacrylate (Bis-GMA) and/or urethane dimethacrylate (UDMA).
[05] Preferably, the photocuring accelerator includes ethyl 4-dimethylaminobenzoate (EDMAB) and/or dimethylaminoethyl methacrylate.
[06] Preferably, the particle size of nano-Si10; is 15-20 nm.
[07] The disclosure provides a hydrophobic self-cleaning resin dental material,
which is obtained by performing light irradiation curing on the hydrophobic self- cleaning resin slurry in the technical solution described above.
[08] Preferably, the light wavelength of light irradiation curing is 420-480 nm.
[09] The disclosure provides application of the hydrophobic self-cleaning resin slurry in the technical solution described above or the hydrophobic self-cleaning resin dental material in the technical solution described above as a dental material.
[10] The dimethacrylate monomer is used as a resin matrix, TEGDMA is used as a diluting monomer, and the hydrophobic modifier FMA with a hydrophobic functional group (long fluorocarbon chain) and a resin reaction active functional group (carbon- carbon double bond) is added to reduce the surface energy of the material. By introducing the inorganic filler nano-SiOz, the mechanical property of resin is enhanced.
Meanwhile, the micro roughness of resin is improved to construct a lotus-leaf-like micro-nano hierarchical structure with excellent hydrophobic property. Such hydrophobic surface of the micro-nano structure could retain air to form an air layer on the surface of the material, so that the contact area (site adhesion) with protein and bacteria is reduced. In such case, the adhesion of oral cavity-related bacteria (such as streptococcus mutans) and the formation of the bacterial biofilm are inhibited, indicating that the material has excellent self-cleaning anti-biofouling property (namely, the property of inhibiting bacteria and protein adhesion on the surface). Meanwhile, one end of the organic silane KH570 molecule is -Si (OCHs)3, which is hydrolyzed to produce -
Si (OH). The -Si (OH): can be condensed with -OH on the surface of SiO; to produce a -Si-O- bond to realize bonding, so that the bonding force between the inorganic filler nano-Si02 and resin, and the dispersibility of nano-SiO; in resin are improved.
[11] FIG. 1 is a scanning electron microscope diagram of resin dental materials prepared in Embodiment 4 and Comparative Example 1, (ar) - (a3) are Comparative
Example 1, and (by) - (b3) are Embodiment 4.
[12] FIG. 2 is a dynamic contact behavior diagram of water droplets with surfaces of the resin dental materials prepared in Embodiment 4 and Comparative Example 1, (a) - (as) are Comparative Example 1, and (bi) - (bs, are Embodiment 4.
[13] FIG. 3 is a cytocompatibility fluorescence microscope diagram of resin dental material leaching solutions prepared in Embodiment 4, Comparative Examples 1-2 and a blank control group, (ai) - (a3) are the blank control group, (bi) - (ba) are Comparative
Example 2, (ci) - (c3) are Comparative Example 1, and (di) - (ds) are Embodiment 4.
[14] FIG. 4 is a laser scanning confocal microscope fluorescence staining diagram showing bacterial adhesion on the surfaces of resin dental materials prepared in
Embodiment 4, Comparative Examples 1-2 and a blank control group, (a) is the blank control group, (b) is Comparative Example 2, (c) is Comparative Example 1, and (d} is
Embodiment 4.
[15] In the disclosure, if not specifically stated, all raw material components are commercially available products well known to those skilled in the art.
[16] In the disclosure, the structural formula of Bis-GMA 1s as follows:
[17] Inthe disclosure, the structural formula of urethane dimethacrylate is as follows: 9 a
Ahr NS o 0
[18] Based on the mass part of the dimethacrylate monomer, the preparation raw materials of hydrophobic self-cleaning resin slurry provided by the disclosure include 5- 30 parts of TEGDMA, preferably, 8-25 parts of TEGDMA, more preferably 10-22 parts of TEGDMA, and most preferably 20 parts of TEGDMA. In the disclosure, the structural formula of TEGDMA is as follows:
Py Sd ee See Mem PN
[19] Based on the mass part of the dimethacrylate monomer, the preparation raw materials of the hydrophobic self-cleaning resin slurry provided by the disclosure include 5-15 parts of perfluoroalkyl acrylate (FMA), preferably, 7-13 parts of FMA, more preferably 8-12 parts of FMA, and most preferably 10-11 parts of FMA. In the disclosure, the structural formula of FMA is as follows:
Ie En pi \ ory
Ne er ì VF z/ ? 0
[20] Based on the mass part of the dimethacrylate monomer, the preparation raw materials of the hydrophobic self-cleaning resin slurry provided by the disclosure include 0-15 parts of a diluent, more preferably 1-12 parts of the diluent, and most preferably 5-10 parts of the diluent; and the diluent is preferably an alcoholic solvent, more preferably ethanol.
[21] Based on the mass part of the dimethacrylate monomer, the preparation raw materials of the hydrophobic self-cleaning resin slurry provided by the disclosure include 1-15 parts of nano-Si02, preferably, 2-10 parts of nano-SiOz, more preferably 3- 8 parts of nano-S102, and most preferably 4-5 parts of nano-Si02. In the disclosure, preferably, the particle size of nano-SiO; is 15-20 nm. In the disclosure, SiO2 has hydrophilicity with hydroxyl groups on its surface.
[22] Based on the mass part of the dimethacrylate monomer, the preparation raw materials of the hydrophobic self-cleaning resin slurry provided by the disclosure include 1-30 parts ofy-methacryloxypropyl trimethoxysilane (KHS570), preferably, 5-20 parts of KH570, more preferably 5-15 parts of KH570, and most preferably 5-10 parts of KH570. In the disclosure, the structural formula of KH570 is as follows: 3 po Y ee \
[23] In the embodiments of the disclosure, CQ is preferably DL-CQ (CAS Number: 10373-78-1).
Embodiment 1
[24] (1)0.5 gof Bis-GMA, 1.5 g of TEGDMA, 1.0 g of FMA and 0.5 g of anhydrous ethanol are added into a brown glass bottle, and magnetic stirring is carried out at room temperature for 0.5 h to obtain a first mixture.
[25] (2) 0.1 g of nano-Si0; (the particle size being 15-20 nm) is added into the first mixture obtained in step (1), 0.1 g of KH570 is dropwise added under the condition of magnetic stirring, and after dropwise adding is completed, magnetic stirring is carried out at room temperature for 0.5 h to obtain a second mixture.
[26] (3) 0.0105 got CQ and 0.02405 g of EDMAB are added into the second mixture obtained in step (2), and magnetic stirring is carried out at room temperature for 1 h to obtain hydrophobic self-cleaning resin slurry.
[27] (4) Light irradiation curing is carried out on the hydrophobic self-cleaning resin slurry obtained in step (3) for 20 s through a dental photocuring machine under an anaerobic condition to obtain a hydrophobic self-cleaning resin dental material.
Embodiments 2-5
[28] Hydrophobic self-cleaning resin dental materials are prepared following the method of Embodiment 1, with the preparation conditions of Embodiments 2-5 shown in Table 1.
Table 1 The preparation conditions of Embodiments 1-5
Bis. Light
GMA TEGDMA [FMA SiO: KH570 ICQ EDMAB irradiation curing
Embodiment4 059 20g [10 g
Comparative Example 1
[29] (1) 0.5 g of Bis-GMA, 2.0 g of TEGDMA and 0.5 g of anhydrous ethanol are added into a brown glass bottle, and magnetic stirring is carried out at room temperature for 0.5 h to obtain a first mixture.
[30] (2) 0.0075 g of CQ and 0.0175 g of EDMAB are added into the first mixture obtained in step (1), and magnetic stirring is carried out at room temperature for 1 h to obtain hydrophilic resin slurry.
[31] (3) Light irradiation curing is carried out on the hydrophilic resin slurry obtained in step (2) for 40 s through a dental photocuring machine under an anaerobic condition to obtain a hydrophilic resin dental material.
Comparative Example 2
[32] Light irradiation curing is carried out on a commercial resin dental material (3M
Filtek™ P60) for 20 s through a dental photocuring machine under an anaerobic condition to obtain a cured commercial resin dental material.
Test Example
[33] The surface topography and property of the hydrophobic self-cleaning resin dental material prepared according to the disclosure will be studied below by taking
Embodiment 4 as an example.
[34] (1) Microtopography and surface wettability
[35] FIG. 1 is a scanning electron microscope diagram of resin dental materials prepared in Embodiment 4 and Comparative Example 1, (ar) - (a3) are Comparative
Example 1, and (br) - (b3) are Embodiment 4. As can be seen from (bi) - (bz), the hydrophobic self-cleaning resin dental material prepared in Embodiment 4 of the disclosure is composed of a plurality of micron-sized protrusion structures, and a plurality of nano-SiO: particles are distributed on the surfaces of the micron-sized protrusion structures to form a micro-nano hydrophobic surface (the contact angle being greater than 150 ©) with a lotus-leaf-like structure. Compared with smoother hydrophilic resin dental materials ((a1) - (a3), with a contact angle being about 60 °), the hydrophobic surface of such micro-nano structure could retain air to form an air layer on the surface of the material. Therefore, the contact area (site adhesion) with bacteria 1s reduced, and the formation of the bacterial biofilm is inhibited.
[36] (2) Dynamic contact behavior of water droplets with surfaces of the resin dental materials
[37] Test Method: 5 uL of water droplets are placed on the surfaces of the resin dental materials prepared in Embodiment 4 and Comparative Example 1, the resin dental materials are lifted up by hand and pressure is applied to the water droplets, and then the resin dental materials are moved down. [B8] FIG. 2 is a dynamic contact behavior diagram of water droplets with surfaces of the resin dental materials prepared in Embodiment 4 and Comparative Example 1, (a1) - (as) are Comparative Example 1, and (by) - (bs) are Embodiment 4. As can be seen from (bi) - (bs), when the hydrophobic self-cleaning resin dental material prepared in
Embodiment 4 of the disclosure is lifted up by hand and pressure is applied to the water droplets, the water droplets deform. The water droplets do not adhere to the surface of the resin dental material when it is moved down. An air layer on the surface of the hydrophobic resin dental material could reduce the contact area between the sample surface and water, so that the adhesion force between them is reduced, and a hydrophobic self-cleaning effect 1s achieved. As can be seen from (ai) - (as), when the hydrophilic resin dental material is lifted up by hand, the water droplets immediately adhere to it and spread out after contacting, which indicates that there is strong adhesion force between the hydrophilic resin dental material and water.
[39] (3) Biocompatibility
[40] Test Method: the hydrophobic self-cleaning resin dental material prepared in
Embodiment 4, the hydrophilic resin dental material prepared in Comparative Example 1 and the cured commercial resin dental material prepared in Comparative Example 2 are respectively placed in 85% DMEM + 15% fetal calf serum for leaching to obtain leaching solutions to be tested. 85% DMEM + 15% fetal calf serum is used as a blank control.
[41] The mouse osteogenic precursor cells (MC3T3-El) are co-cultured with the leaching solutions to be tested for 1 day, 3 days and 5 days by adopting a leaching solution method, and the cell growth and proliferation are observed using a fluorescence microscope after staining with Rhodamine 123.
[42] FIG. 3 is a cytocompatibility fluorescence microscope diagram of resin dental material leaching solutions prepared in Embodiment 4 and Comparative Examples 1-2 and a blank control group, (a1)-(a3) are the blank control group, (b1)-(b3) are Comparative
Example 2, (c1)-(c3) are Comparative Example 1, and (d1)-(ds) are Embodiment 4. As can be seen from (di)-(ds), the experimental group co-cultured with the hydrophobic self-cleaning resin dental material leaching solution prepared in Embodiment 4 of the disclosure has the highest cell proliferation density and the best cell morphology, which is better than the blank control group and the hydrophilic resin dental material group (Comparative Example 1), and far better than the commercial resin dental material group (Comparative Example 2). Therefore, the hydrophobic self-cleaning resin dental material prepared by the disclosure has the best biocompatibility among all the tested groups.
[43] (4) Surface bacterial adhesion
[44] Test Method: the hydrophobic self-cleaning resin dental material prepared in
Embodiment 4, the hydrophilic resin dental material prepared in Comparative Example 1 and the cured commercial resin dental material prepared in Comparative Example 2 are respectively co-cultured with streptococcus mutans for 6 h, and then sampled, rinsed and stained with live and dead bacteria. The surface bacterial adhesion of the samples are observed by using a laser scanning confocal microscope. The group without the resin dental materials is used as a blank control.
[45] FIG. 4 is a laser scanning confocal microscope fluorescence staining diagram showing surface bacterial adhesion of resin dental materials prepared in Embodiment 4,
Comparative Examples 1-2 and a blank control group, (a) is the blank control group, (b) is Comparative Example 2, (c) is Comparative Example 1, and (d) is Embodiment 4. As can be seen from (d), the surface of the hydrophobic self-cleaning resin dental material prepared in Embodiment 4 only has an extremely small amount of bacteria adhesion, which proves that the material has good bacterial adhesion inhibition property, namely, “anti-biofouling” property; whereas, the surfaces of the blank control group, the commercial resin dental material group (Comparative Example 2) and the hydrophilic resin dental material group (Comparative Example 1) have a large amount of streptococcus mutans adhesion to different degrees. Therefore, the hydrophobic self- cleaning resin dental material prepared by the disclosure can effectively inhibit bacterial adhesion and has good self-cleaning “anti-biofouling” property compared with other groups.
Claims (8)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2030558A NL2030558B1 (en) | 2022-01-14 | 2022-01-14 | Hydrophobic self-cleaning resin slurry, hydrophobic self-cleaning resin dental material and application thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| NL2030558A NL2030558B1 (en) | 2022-01-14 | 2022-01-14 | Hydrophobic self-cleaning resin slurry, hydrophobic self-cleaning resin dental material and application thereof |
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| Country | Link |
|---|---|
| NL (1) | NL2030558B1 (en) |
-
2022
- 2022-01-14 NL NL2030558A patent/NL2030558B1/en active
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