NL2029826B1 - An X-ray radiation generating system using inverse Compton scattering. - Google Patents

An X-ray radiation generating system using inverse Compton scattering. Download PDF

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Publication number
NL2029826B1
NL2029826B1 NL2029826A NL2029826A NL2029826B1 NL 2029826 B1 NL2029826 B1 NL 2029826B1 NL 2029826 A NL2029826 A NL 2029826A NL 2029826 A NL2029826 A NL 2029826A NL 2029826 B1 NL2029826 B1 NL 2029826B1
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Netherlands
Prior art keywords
optical resonator
generating system
ray generating
laser device
light
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NL2029826A
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Dutch (nl)
Inventor
Hendrikus Wilhelmus Stopel Martijn
Wilhelmus De Klerk Johannes
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Vdl Enabling Tech Group B V
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Priority to NL2029826A priority Critical patent/NL2029826B1/en
Priority to TW111144266A priority patent/TW202332320A/en
Priority to PCT/NL2022/050662 priority patent/WO2023091013A1/en
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Publication of NL2029826B1 publication Critical patent/NL2029826B1/en

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/1086—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering using scattering effects, e.g. Raman or Brillouin effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08018—Mode suppression
    • H01S3/0804—Transverse or lateral modes
    • H01S3/0805—Transverse or lateral modes by apertures, e.g. pin-holes or knife-edges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813—Configuration of resonator
    • H01S3/0816—Configuration of resonator having 4 reflectors, e.g. Z-shaped resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/1068—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using an acousto-optical device

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Nonlinear Science (AREA)
  • Lasers (AREA)

Abstract

According to a first example of the disclosure, an X—ray radiation generating system using inverse Compton scattering is proposed. The system according to the disclosure at least comprises a laser device structured for generating a beam of laser light, an charged particle generating means structured for generating and emitting a beam of free charged particles towards an interaction area, at which interaction area the beam of free charged particles collides with the beam of laser light for generating X—ray radiation by inverse Compton scattering; wherein the laser device at least comprises a pump source, a gain medium and an optical resonator, wherein the interaction area is positioned within the optical resonator. The benefit of the laser device implementing an optical resonator or cavity with the interaction area being positioned within the optical resonator causes the photons to recycle within the the optical resonator. Figure 3a

Description

TITLE
An X-ray radiation generating system using inverse Compton scattering.
TECHNICAL FIELD
The present disclosure relates to an X-ray radiation generating system using inverse Compton scattering by colliding a beam of free charged particles with a beam of laser light.
BACKGROUND OF THE INVENTION
Inverse Compton scattering is the scattering of a photon after an interaction with a charged particle, usually an electron, in a colliding or interaction area or colliding (interaction) point, whereby the charged particle transfers part of its energy to the photon. Accordingly, the increase in photon energy results in a decrease in the wavelength of the photon, which may be an X-ray or gamma ray photon.
X-ray radiation sources based on inverse Compton scattering wherein charged particle beam pulses interacts with photon beam pulses by precisely overlapping their foci in space and time, can have increased technological capabilities within, for example, the medical and semiconductor industries, as large investments that typically come with a high-quality synchrotron source solution can be obviated.
A drawback however is the efficiency of the present day X-ray radiation sources using inverse Compton scattering. The inverse Compton scattering cross-section (the interaction area) is very small compared to the charged particle beam focus and photon beam focus, meaning there is a small chance of interaction that would consequently generate X-ray light through inverse Compton scattering.
Accordingly, in the known application intense charged particle pulses and photon pulses are required to generate a reasonable amount of X-ray photons. The interaction region where the two pulses overlap requires very precise control in both space and time to allow for stable operation of the X-ray source, meaning stable spatial overlap between the foci and synchronized pulse timing that is typically on the femtosecond to picosecond scale.
These latter conditions are hard to achieve in practice, mainly due to thermal effects that come with the high powers of the primary sources, and due to tolerance of the primary sources, like variations in pulse energy or pointing uncertainty between subsequent pulses. In addition, the known systems are more complex with the use of multiple components to control and align the laser light beam and the charged particle beam, which will add to the overall cost of such system.
Accordingly, it is a goal of the present disclosure to provide an improved X- ray radiation generating system using inverse Compton scattering with a more efficient conversion of the initial bundle of laser light photons into a reasonable amount of X-ray photons.
SUMMARY OF THE INVENTION
According to a first example of the disclosure, an X-ray radiation generating system using inverse Compton scattering is proposed. The system according to the disclosure at least comprises a laser device structured for generating a beam of laser light, an charged particle generating means structured for generating and emitting a beam of free charged particles towards an interaction area, at which interaction area the beam of free charged particles collides with the beam of laser light for generating X-ray radiation by inverse Compton scattering; wherein the laser device at least comprises a pump source, a gain medium and an optical resonator, wherein the interaction area is positioned within the optical resonator.
The benefit of the laser device implementing an optical resonator or cavity with the interaction area being positioned within the optical resonator causes the photons to recycle within the the optical resonator. The beam of photons has a higher collision or interaction occurrence with the charged particle beam, with the result of a higher conversion of the initial bundle of laser light photons into X-ray photons. This increases the X-ray brightness with several orders of magnitude compared to a system without such an optical resonator/cavity. Lesser complex components are required to control and align the laser light beam and the charged particle beam, simplifying the system according to the disclosure, also reducing the overall cost of such system.
In an example according to the disclosure, the optical resonator is formed by at least two main mirrors placed around or at both sides of the gain medium. In additional example, either one of the two main mirrors can be provided with a flat, convex or concave mirror surface depending on the optical application of the system and desired light beam control. In either combination of the two main mirrors being used, the optical configuration not only causes the photons to recycle within the optical resonator, but also creates a focal point within the optical resonator with an increased interaction occurrence.
In a preferred example, the optical resonator comprises at least one power element positioned between the interaction area and the gain medium. The at least one power element can be configured as a lens element, however the power element can also be configured as at least one curved mirror element, which is capable of collimating or converging the beam of laser light. Not only one power element can be used, also multiple power elements, such as multiple lenses or curved mirror elements can be used, depending on the desired level of light beam control.
In all examples, a focal point thus formed within the optical resonator lies within the interaction area, furthering the collision or interaction occurrence of the beam of photons with the charged particle beam, with the result of a higher conversion of the initial bundle of laser light photons into X-ray photons.
In another advantageous example causing the photons to recycle within the optical resonator, the optical resonator comprises at least two minor mirror positioned between the interaction area and the gain medium. As the optical resonator additionally may comprise at least one diaphragm element positioned between the at least two minor mirrors, the laser light beam can effectively be collimated in order to adjust and control the focal spot within the interaction area.
Additionally, the focal spot within the interaction area can be further controlled as the optical resonator may comprise at least two light collimating elements, one light collimating element positioned between the interaction area and a first minor mirror and the other light collimating element positioned between the gain medium and a second minor mirror.
As the optical resonator may also comprise one or more beam splitting elements, and/or one or more light polarizing elements and/or one or more acousto-optic modulators, AOM, additional functional control measurements can be performed within the optical resonator without adversely affecting the optical performance, such as the optical conversion into X-ray radiation.
The two main mirrors may have an identical concave mirror surface.
In a preferred example, the laser device is a continuous-wave, CW, laser device. Alternatively, the laser device may be a pulsed-wave laser device. Preferably, the laser light being emitted has a wavelength of 1064 nm. However also other wavelength ranges are possible, depending on the optical characteristics (or desired laser beam properties) of the device.
BRIEF DESCRIPTION OF THE DRAWINGS
The invention will now be discussed with reference to the drawings, which show in:
Figure 1 a schematic depiction of the principle of inverse Compton light scattering;
Figures 2a-2b examples of systems for generating X-ray radiation using inverse Compton scattering according to the state of the art;
Figures 3a-3c examples of systems for generating X-ray radiation using inverse Compton scattering according to the disclosure.
DETAILED DESCRIPTION OF THE INVENTION
For a proper understanding of the invention, in the detailed description below corresponding elements or parts of the invention will be denoted with identical reference numerals in the drawings.
Figure 1 shows a schematic depiction of the principle of inverse Compton light scattering. Inverse Compton scattering is the scattering of a photon of an incident photon beam 1, e.g. a laser beam 1 after an interaction with a charged particle 2, usually an electron 2 in a charged particle beam, in an interaction area 4 or colliding point, whereby the charged particle 2 transfers part of its energy to the incident photon 1.
Accordingly, the increase in photon energy results in a decrease in the wavelength of the photon, which may be an X-ray or gamma ray photon 3, which X-ray or gamma ray photon 3 is emitted (reflected) in a different direction as a X-ray radiation beam 3.
Known X-ray radiation sources based on inverse Compton scattering wherein charged particle beam pulses interacts with photon beam pulses by precisely overlapping their foci in space and time, can have increased technological capabilities within, for example, the medical and semiconductor industries, as large investments that typically come with a high-quality synchrotron source solution can be obviated.
A drawback however is the efficiency of the present day X-ray radiation sources using inverse Compton scattering. The inverse Compton scattering cross-section (the interaction area) is very small compared to the charged particle beam focus and photon beam focus, meaning there is a small chance of interaction that would consequently generate X-ray light through inverse Compton scattering.
Known examples of such systems are depicted in Figures 2a and 2b, and are dented with reference numerals 10 and 10’ respectively.
The known systems 10 (Figure 2a) and 10’ (Figure 2b) are composed of a laser device, which is schematically depicted with reference numeral 20. The laser device 20 is structured for generating a beam of laser light 1 towards an interaction area (or 5 colliding point 4). Charged particle generating means 30 (Figure 2a) and 30’ (Figure 30’) are implemented for generating and emitting a beam 2 of free charged particles towards the interaction area 4. In the known art, such charged particle generating means 30-30’ are composed of a charged particle gun 31. In the example of the charged particle generating means 30-30’ emitting a beam of free electrons 2, the charged particle gun 31 comprises a cathode consisting of an electron emitting material from which electrons 2 are freed using techniques already known in the art.
The electrons 2 freed from in the charged particle gun 31 are accelerated by a high-voltage electric field in the charged particle accelerating unit or linear particle accelerator 32 and exit the linear particle accelerator 32 via exit window 32a. The beam 2 of accelerated electrons (charged particles) is directed towards the interaction area 4 (see
Figure 2b) and optionally a charge particle beam guide 33 and a storage ring 34 is used, prior to the collision or interaction with the beam 1 of laser light. In the interaction area 4,
X-ray radiation 3 is generated by inverse Compton scattering.
In the known applications as shown in Figure 2a-2b intense charged particle pulses 2 and photon pulses 1 are required to generate a reasonable amount of X- ray photons 3 exiting the interaction area 4. The interaction or colliding region 4 where the two pulses 1 and 2 overlap requires very precise control in both space and time to allow for stable operation of the X-ray source, meaning stable spatial overlap between the foci and synchronized pulse timing that is typically on the femtosecond to picosecond scale.
The known applications as shown in Figures 2a-2b also have a significant surface foot print, which footprint is further enlarged with the use of additional complex and costly components such as a charge particle beam guide 33 and a storage ring 34.
Figures 3a-3c show examples of improved X-ray radiation generating systems 100-100-100" according to the disclosure using inverse Compton scattering having a more efficient conversion of the initial bundle 1 of laser light photons into a reasonable amount of X-ray photons 3.
A first example of the disclosure is shown in Figure 3a, wherein the X-ray radiation generating system is denoted with reference numeral 100. System 100 comprises a charged particle generating means 30-30’ structured for generating and emitting a beam 2 of free charged particles, for example electrons, towards the interaction area 4. The laser device 200 as shown in Figure 3a is an improved example of the disclosure and is structured for generating a beam 1 of laser light. The laser device 200 at least comprises a pump source 201, a gain medium 202 and an optical resonator 210 of a specific design.
The optical resonator 210 according to a first example of the disclosure is provided with an optical path 210z. Accordingly, the interaction area 4 is positioned within the optical resonator 210 and more in particular the interaction area 4 is positioned in the optical path 210z.
The benefit of the laser device 200 according to the disclosure implementing an optical resonator or cavity 210 with the interaction area 4 being positioned within the optical resonator 210 causes the photons 1 to recycle within the the optical resonator 210 along the optical path 210z. The beam 1 of photons thus has a higher collision (interaction) occurrence with the charged particle beam 2 generated by the charged particle generating means 30-30" and entering the optical resonator 210. This results in a higher conversion of the initial bundle 1 of laser light photons into a bundle 3 of X-ray photons by inverse Compton scattering. The compactness of the construction of the optical resonator 210 according to the disclosure increases the X-ray brightness with several orders of magnitude compared to a known system without such an optical resonator/cavity, such as depicted in Figures 2a-2b.
The system 100 according to the disclosure does not require additional control components for a very precise control in both space and time of the charged particle beam 2 and laser light beam 1 to allow for a stable operation of the X-ray source.
The system 100 according to the disclosure is of a more simple, yet more accurate design, with a limited surface foot print due to the compact construction of the optical resonator 210.
As shown in the examples of an X-ray radiation generation system 100- 100-100” according to the disclosure shown in Figures 3a-3b-3c, the optical resonator 210-210-210" is formed by at least two main mirrors 211a-211b, which are placed around the gain medium 202 and facing each other along the optical path 210z. Each of the two main mirrors 211a-211b is provided with a concave mirror surface 212a-212b. The concave mirror surfaces 212a-212b not only causes the photons 2 to recycle within the optical resonator 210-210-210”, but also creates a focal point within the optical resonator.
This focal point lies within the interaction area 4, increasing the collision occurrence with the charged particle beam 2 and thus increasing the conversion of the initial bundle 1 of laser light photons into a bundle 3 of X-ray photons by inverse Compton scattering.
The two main mirrors 211a-211b may have an identical concave mirror surface 212a-212b, however depending of the application of the X-ray radiation generating system 100, two main mirrors 211a-211b may have a concave mirror surface 212a-212b with a different surface curvature.
In another example, as shown in Figure 3b, the X-ray radiation generating system 100° implements a laser device 200’ with an optical resonator 210°, which comprises at least one power element 213 positioned in the optical path 210z between the interaction area 4 and the gain medium 202. In Figure 3b, the at least one power element is configured as a lens element 213, however the power element can also be configured as at least one curved mirror element, which is capable of collimating or converging the laser beam 2. Note that in Figure 3b one power element 213 is positioned, however multiple power elements, such as multiple lenses or curved mirror elements can be used, depending on the desired level of light beam control.
Accordingly, the power element 213 divides the optical resonator 210’ in an interaction cavity area 210a bound by the first main mirror 211a, the interaction area 4 and the power element 213, and an amplifier cavity area 210b bound by the power element 213, the gain medium 202 (and the pump source 201) and the second main mirror 211b.
The X-ray radiation conversion 3 by inverse Compton scattering takes place in the interaction cavity 210a, whereas the buildup of photons 2 takes places in the amplifier cavity 210b. The two cavities 210a-210b can be designed independently to optimize control of the overall system 100’. In addition the power element 213 can also be replaced by equivalent optical elements, like curved mirrors as shown in Figure 3c.
The cavities 210a-210b can also be split to completely independent submodules of the system 100’, for example by splitting the at least one power or lens element 213 into two lenses 213a-213b (not shown), each with different focal length. Also additional components can be placed inside (diaphragm elements, AOM, non-linear crystal) or outside (power sensor, pointing detection, interaction region imaging) the optical resonator 210’ to enhance its flexibility and the control of the overall system 100’.
Also in Figure 3b, a focal point is formed by the at least one (power) lens element 213 within the optical resonator 210’, which focal point lies within the interaction area 4. Accordingly, the colliding or interaction occurrence of the beam 2 of photons with the charged particle beam 1 is improved, resulting in a higher conversion of the initial bundle of laser light photons 2 into X-ray photons 3.
Figure 3c depicts another advantageous example of a system 100° according to the disclosure. The laser device 200” implements an optical resonator 2107, which comprises, next to the first and second main mirrors 211a-211b, also at least two minor mirrors 214a and 214b. The minor mirrors 214a and 214b are positioned in the optical path 210z between the interaction area 4 and the gain medium 202. In addition, the optical resonator 210” may comprise at least one diaphragm element 215 positioned in the optical path 210z between the at least two minor mirrors 214a-214b.
The use of additional (at least two) minor mirrors 214a and 214b positioned in the optical path 210z further decreases the foot print of the laser device 200” and according the system 100” next to an optimal recycling of the photons 2 within the optical resonator 210” (between the first and second main mirrors 211a-211b). The use of a diaphragm element 215 positioned in the optical path 210z between the at least two minor mirrors 214a-214b allows the laser light beam to be effectively collimated in order to adjust and control the focal spot within the interaction area 4.
Additionally, the focal spot within the interaction area 4 can be further controlled as the optical resonator 210” of Figure 3c may further comprise at least two light collimating elements 216a and 216b. One light collimating element 2186a is positioned in the optical path 210z between the interaction area 4 and the first minor mirror 214a, whereas the other light collimating element 216b is positioned in the optical path 210z between the gain medium 202 and the second minor mirror 214b.
As the optical resonator 210-210-210” according the disclosures shown in
Figures 3a-3c may also comprise one or more beam splitting elements, and/or one or more light polarizing elements and/or one or more acousto-optic modulators, AOM, additional functional control measurements can be performed within the optical resonator without adversely affecting the optical performance, such as the optical conversion into X- ray radiation.
In a preferred example, the laser device 200-200-200” as used in the system 100-100-100” according to the disclosure, is a continuous-wave, CW, laser device. Additionally, the laser device may be a pulsed-wave laser device. In both examples, the emitted laser light 2 has a wavelength of 1064 nm. However also other wavelength ranges are possible, depending on the optical characteristics or desired laser beam properties of the device.
With a continuous wave laser (CW laser) 200-200-200” a coherent light beam 2 can be created within the optical resonator 210-210-210", which generates a continuous primary photon flux through the interaction area 4, which removes the precise timing constraint, and allows for a better focus control within the optical resonator 210-
210-210", because the light behavior in the optical resonator 210-210-210" can be directly monitored and also corrected if needed. In addition, when configured as a CW laser device, the footprint of the system is further reduced.
The laser wavelength for this invention is not limited, but has been chosen to 1064 nm due to practical reasons and good availability and low costs of off-the-shelf components.
With the use of a CW laser device any critical pulse timing between the charged particle beam 2 and the pulsed laser beam 1 is removed. It achieves a stable and controlled laser light intensity, and also a quick recovery after interaction with the charged particle beam 2 due to high cavity finesse as no out-coupling of light occurs, due to the near 100% reflectivity of the first and second main mirrors 211a-211b.
The examples shown in Figures 3a-3c¢ allow for a stable focus of the laser light beam 2 within the interaction area 4, and its focus size is tunable with the assistance of additional optics, such as the at least one focussing power element 213, the at least first and second minor mirrors 214a-214b, the at least one diaphragm element 215, and the first and second light collimating elements 216a-216b, which are low-cost components further reducing manufacturing costs.
The optical resonators 210-210-210” according the disclosures shown in
Figures 34-3c are more compact, increasing the photon flux of the laser beam 2, reducing the footprint, and an external laser device is not needed, as the laser device 200-200- 200” is integrated with the optical resonator 210-210-210".
The use of at least two minor mirrors 214a-214b allows for a ‘foldable’ light path 210z further reducing the footprint.
LIST OF REFERENCE NUMERALS
1 laser light beam (impinging) 2 charged particle beam (impinging) 3 inverse Compton scattered X-ray light beam (exiting) 4 interaction area or colliding area
X-ray radiation generating system (prior art: first example) 10° X-ray radiation generating system (prior art: second example) 20 laser device (prior art) 10 30 charged particle generating means (prior art: first example) 30 charged particle generating means (prior art: second example) 31 charged particle generating unit (charged particle source) 32 charged particle accelerating unit (linear particle accelerator) 32a exit window for charged particle beam 2 33 charge particle beam guide 34 storage ring 100 X-ray radiation generating system (first example acc. to disclosure) 100 X-ray radiation generating system (second example acc. to disclosure) 100” X-ray radiation generating system (third example acc. to disclosure) 200 laser device (first example acc. to disclosure) 200° laser device (second example acc. to disclosure) 200” laser device (third example acc. to disclosure) 201 pump source 202 gain medium 210 optical resonator 210a first, interaction cavity of optical resonator 210b second, amplification cavity of optical resonator 210z optical path of optical resonator 211a-211b first and second main mirrors 212a-212b concave mirror surface of main mirror 213 focussing power element 214a-214b first and second minor mirrors 215 diaphragm element 216a-216b first and second light collimating elements

Claims (13)

CONCLUSIESCONCLUSIONS 1. Een systeem voor het genereren van röntgenstraling door middel van inverse Compton-verstrooiing, waarbij het systeem ten minste omvat: een laser inrichting ingericht voor het genereren van een bundel laserlicht; een geladen deeltjes genereer inrichting ingericht voor het genereren en uitzenden van een bundel van geladen deeltjes naar een interactiegebied, in welk interactiegebied de bundel van geladen deeltjes interacteert met de bundel laserlicht voor het genereren van röntgenstraling door middel van inverse Compton-verstrooiing; waarin de laser inrichting ten minste een pomp bron, een versterkingsmedium en een optische resonator omvat, waarbij het interactiegebied binnen de optische resonator is opgenomen.A system for generating X-rays by Compton inverse scattering, the system comprising at least: a laser device adapted to generate a beam of laser light; a charged particle generating device configured to generate and emit a beam of charged particles to an interaction region, in which interaction region the beam of charged particles interacts with the beam of laser light to generate X-rays by inverse Compton scattering; wherein the laser device comprises at least a pump source, a gain medium and an optical resonator, the interaction region being contained within the optical resonator. 2. Het systeem voor het genereren van röntgenstraling volgens conclusie 1, waarbij de optische resonator wordt gevormd door ten minste twee hoofdspiegels die aan weerszijden van het versterkingsmedium zijn geplaatst.The X-ray generating system according to claim 1, wherein the optical resonator is formed by at least two main mirrors placed on opposite sides of the gain medium. 3. Het systeem voor het opwekken van röntgenstraling volgens conclusie 2, waarbij een van de twee hoofdspiegels is voorzien van een vlak, convex of concaaf spiegeloppervlak.The X-ray generating system according to claim 2, wherein one of the two main mirrors has a flat, convex or concave mirror surface. 4. Het systeem voor het genereren van röntgenstraling volgens een van de conclusies 1-3, waarbij de optische resonator ten minste één vermogenselement omvat dat is gepositioneerd tussen het interactiegebied en het versterkingsmedium.The X-ray generating system according to any one of claims 1 to 3, wherein the optical resonator comprises at least one power element positioned between the interaction region and the gain medium. 5. Het systeem voor het opwekken van réntgenstraling volgens conclusie 4, waarbij het ten minste ene vermogenselement als lenselement of als gekromd spiegelelement is geconfigureerd.The X-ray generating system of claim 4, wherein the at least one power element is configured as a lens element or a curved mirror element. 6. Het systeem voor het genereren van röntgenstraling volgens een van de conclusies 1-3, waarbij de optische resonator ten minste twee bijspiegels omvat die zijn geplaatst tussen het interactiegebied en het versterkingsmedium.The X-ray generating system according to any one of claims 1 to 3, wherein the optical resonator comprises at least two sub-mirrors interposed between the interaction region and the gain medium. 7. Het systeem voor het genereren van röntgenstraling volgens conclusie 6, waarbij de optische resonator ten minste één diafragma-element omvat dat tussen de ten minste twee bijspiegels is geplaatst.The X-ray generating system of claim 6, wherein the optical resonator comprises at least one diaphragm element disposed between the at least two secondary mirrors. 8. Het systeem voor het genereren van röntgenstraling volgens conclusie 6 of 7, waarbij de optische resonator ten minste twee lichtcollimerende elementen omvat, waarbij één lichtcollimerend element is geplaatst tussen het interactiegebied en een eerste bijspiegel en het andere licht collimerend element geplaatst tussen het versterkingsmedium en een tweede bijspiegel.The X-ray generating system according to claim 6 or 7, wherein the optical resonator comprises at least two light-collimating elements, one light-collimating element disposed between the interaction region and a first sub-mirror and the other light-collimating element disposed between the gain medium and a second secondary mirror. 9. Het systeem voor het genereren van röntgenstraling volgens een of meer van de conclusies 1-8, waarbij de optische resonator een of meer bundelsplitsende elementen en/of een of meer lichtpolariserende elementen en/of een of meer akoestisch- optische modulatoren, AOM, omvat.The X-ray generating system according to any one of claims 1 to 8, wherein the optical resonator comprises one or more beam-splitting elements and/or one or more light polarizing elements and/or one or more acousto-optical modulators, AOM, includes. 10. Het systeem voor het opwekken van röntgenstraling volgens een of meer van de conclusies 2-9, waarbij de twee hoofdspiegels een identiek vlak, convex of concaaf spiegeloppervlak bezitten.The X-ray generating system according to any one of claims 2 to 9, wherein the two primary mirrors have an identical flat, convex or concave mirror surface. 11. Het systeem voor het genereren van röntgenstraling volgens een of meer van de conclusies 1-10, waarbij de optische resonator een brandpunt heeft dat binnen het interactiegebied ligt.The X-ray generating system according to any one of claims 1 to 10, wherein the optical resonator has a focal point that is within the region of interaction. 12. Het systeem voor het genereren van röntgenstraling volgens een of meer van de conclusies 1-11, waarbij de laser inrichting een continu-golf, CW, laser inrichting is.The X-ray generating system according to any one of claims 1-11, wherein the laser device is a continuous wave, CW, laser device. 13. Het systeem voor het genereren van röntgenstraling volgens een of meer van de conclusies 1-11, waarbij de laser inrichting een laser inrichting met gepulseerde golven is.The X-ray generating system according to any one of claims 1 to 11, wherein the laser device is a pulsed wave laser device.
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US5825847A (en) * 1997-08-13 1998-10-20 The Board Of Trustees Of The Leland Stanford Junior University Compton backscattered collimated x-ray source

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US5825847A (en) * 1997-08-13 1998-10-20 The Board Of Trustees Of The Leland Stanford Junior University Compton backscattered collimated x-ray source

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GEA-BANACLOCHE J ET AL: "SOFT X-RAY FREE-ELECTRON LASER WITH A LASER UNDULATOR", IEEE JOURNAL OF QUANTUM ELECTRONICS, IEEE, USA, vol. QE-23, no. 9, 1 September 1987 (1987-09-01), pages 1558 - 1570, XP000705869, ISSN: 0018-9197, DOI: 10.1109/JQE.1987.1073559 *

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