NL2028094B1 - Vitrification method for enhancing transmittance of surface-unpolished sapphire - Google Patents
Vitrification method for enhancing transmittance of surface-unpolished sapphire Download PDFInfo
- Publication number
- NL2028094B1 NL2028094B1 NL2028094A NL2028094A NL2028094B1 NL 2028094 B1 NL2028094 B1 NL 2028094B1 NL 2028094 A NL2028094 A NL 2028094A NL 2028094 A NL2028094 A NL 2028094A NL 2028094 B1 NL2028094 B1 NL 2028094B1
- Authority
- NL
- Netherlands
- Prior art keywords
- sapphire
- vitrification
- unpolished
- present disclosure
- transmittance
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
The present disclosure discloses a vitrification method for enhancing transmittance of surface-unpolished sapphire and a production process thereof. In the vitrification, the 5 following glass components are added, in molar percentage: 10% to 30% of RE203 (RE = Y, La, Gd, and Ce) and 70% to 90% of SiOz, and unpolished sapphire is used. The rare earth RE203 and SiOz are thoroughly mixed and then uniformly spread on the surface of the unpolished sapphire, with a thickness above 1 mm, the sapphire is incubated in a high-temperature furnace at l,400°C to 1,600°C for more than 2 h and 10 then cooled to room temperature in the furnace, and the sapphire is taken out and tested to finally obtain desired sapphire with significantly-increased transmittance, which can be used in the fields of infrared optics, light-emitting diode (LED) substrates, photoelectric displays, military industry, lenses, and the like.
Description
TECHNICAL FIELD The present disclosure relates to a vitrification method for enhancing transmittance of surface-unpolished sapphire, and specifically to surface vitrification of unpolished sapphire, which reduces a manufacture cost and greatly improves the optical transmittance of sapphire, so that sapphire becomes an indispensable key component in industrial automation production lines and is suitable for infrared optics, light-emitting diode (LED) substrates, photoelectric displays, military industry, optical lenses, electronic devices, heat-resistant parts, and other fields. The present disclosure belongs to the technical field of functional materials.
BACKGROUND Sapphire is a crystalline material whose hardness is second only to diamond in the world. Sapphire has high strength and hardness (Mohs hardness: 9), strong resistance to high temperature (melting point up to 2,050°C), abrasion and corrosion, and stable chemical properties, that is, sapphire will not be corroded by acids and can only be eroded at high temperature by hydrofluoric acid (HF), phosphoric acid (H2PO4) and molten potassium hydroxide (KOH). Moreover, sapphire also has a series of characteristics such as high compatibility with semiconductor materials such as gallium nitride, prominent light transmission performance, and excellent electrical insulation performance. Sapphire single crystal is an excellent wave-transparent material, exhibiting high transmittance in ultraviolet (UV), visible light, infrared bands, and microwaves, and can meet the requirements of multi-mode compound guidance (TV, infrared imaging, radar, etc.). Therefore, sapphire is used as a window material and fairing part in the military industry and as an important window material in the field of optoelectronic communication. A large-size single crystal can be grown from a Sapphire material, which has few internal defects, no scattering sources such as grain boundaries and pores, little strength loss, and high wave transmission rate and thus is currently the first choice for wave-transmitting parts. In addition, with electrical insulation, transparency, prominent thermal conductivity, and high hardness, sapphire can be used as a substrate material for integrated circuits and can be widely used in LEDs and microelectronic circuits, which can replace expensive silicon nitride substrates in the manufacture of ultra-high-speed integrated circuits. Sapphire can also be made into optical sensors and other optical communication and optical waveguide devices, such as an observation window for a high-temperature and high-pressure or vacuum container, a heat sink for a liquid crystal display (LCD) projector, a window for a harmful gas detector or a fire monitor, and an optical fiber communication connector box. However, there are still major problems in the downstream processing of sapphire in China. Due to the high hardness and abrasion-resistance of sapphire, a high cost is required for sapphire polishing. In view of the problem of difficult polishing, the present disclosure is mainly intended to provide a novel processing method, namely, sapphire surface vitrification.
SUMMARY The present disclosure is intended to provide a method for greatly improving an optical transmittance of unpolished sapphire by sapphire surface vitrification. In the sapphire surface vitrification method of the present disclosure, the optical transmittance of sapphire can be greatly increased only by preparing glass components in proportion, then incubating at a specified temperature, and slowly cooling in a furnace, which reduces the high cost of traditional mechanical polishing and improve the traditional glass preparation process to a large extent. In the present disclosure, RE20: (RE = Y, La, Gd, and Ce) and SiO: systems are adopted as raw materials required for vitrification, and unpolished sapphire is adopted as a substrate material. A composition formula of glass will be adjusted to achieve the purpose of the present disclosure by process steps of spreading, melting, annealing, inspection, and performance testing of glass raw materials. The vitrification method for enhancing transmittance of unpolished sapphire in the present disclosure is characterized in that Al>Os required in a glass phase is totally provided by the adopted unpolished sapphire substrate material, and in the vitrification, the following glass components are added, in molar percentage: 10% to 30% of RE20: and 70% to 90% of SiOz.
The vitrification method for enhancing transmittance of unpolished sapphire includes the following steps: a) preparation of a glass batch required for the vitrification thoroughly mixing the raw materials based on the contents described above to obtain a glass batch, and uniformly spreading the glass batch on the unpolished sapphire, with a thickness above 1 mm; and b) melting of the glass batch subjecting the sapphire substrate with the glass batch prepared in step a) to thermal treatment in a furnace at 1,400°C to 1,600°C for more than 2 h, naturally cooling the sapphire substrate with the furnace body, and taking the sapphire out from the furnace for test to obtain the sapphire substrate with greatly-improved optical transparency in the present disclosure.
Compared with the existing mechanical polishing, the method for enhancing an optical transmittance of sapphire by subjecting the sapphire to surface vitrification in the present disclosure has the advantages of simple process, low cost and the like. The sapphire with high optical transmittance in the present disclosure can be used in fields of infrared optics, LED substrates, photoelectric displays, military industry, optical lenses, electronic devices, heat-resistant parts, and the like.
The above process requires no clarifying agents such as As20:3 and Sb203, thus resulting in no environmental pollution.
BRIEF DESCRIPTION OF DRAWINGS FIG. 1 shows the transmittance of the samples in Examples 1 to 4 and a one-side- polished sapphire sample, where, the illustration in FIG. 1 shows the pictures of the sapphire substrate samples before and after vitrification.
DETAILED DESCRIPTION The present disclosure is described in further detail below with reference to examples and accompanying draws. The components, process parameters and performance parameters for Examples 1 to 4 of the present disclosure are shown in the following table.
Component Technical | Example 1 | Example 2 | Example 3 | Example 4 TT | Te RE20:; Molar 10% 15% 30% 30% Ve mn S102 Molar 90% 85% 70% 70% ee Sapphire Size R=15mm, | R=15mm, | R=15mm, R=15mm, Total Molar 100% 100% 100% 100% ee Melting 1,400 1,500 1,500 1,600 (°C) Forming Room Room Room Room pen | rn rene or (°C) Transmittance More than | More than | More than More than in UV and 90% 90% 90% 90% visible light The present disclosure adopted the process of slowly cooling in a furnace, and the manufacturing processes for the above examples were basically the same except for the selection system.
In the above examples, melting was conducted in a high-temperature muffle furnace, and cooling forming was also completed in the furnace.
The melting was conducted at 1,400°C to 1,600°C, the temperature was slowly decreased with the furnace, and finally a formed product was taken out.
The inherent quality of the sapphire substrate was observed, and then a sample was collected for transmittance test.
Finally, it is necessary to explain here: The above examples are only used to further describe the technical solutions of the present disclosure in detail and cannot be understood as limiting the protection scope of the present disclosure.
Some non-essential improvements and adjustments made by those skilled in the art based on the above content of the present disclosure shall fall within the protection scope of the present disclosure.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL2028094A NL2028094B1 (en) | 2021-04-29 | 2021-04-29 | Vitrification method for enhancing transmittance of surface-unpolished sapphire |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL2028094A NL2028094B1 (en) | 2021-04-29 | 2021-04-29 | Vitrification method for enhancing transmittance of surface-unpolished sapphire |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2028094B1 true NL2028094B1 (en) | 2022-11-10 |
Family
ID=84046022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2028094A NL2028094B1 (en) | 2021-04-29 | 2021-04-29 | Vitrification method for enhancing transmittance of surface-unpolished sapphire |
Country Status (1)
Country | Link |
---|---|
NL (1) | NL2028094B1 (en) |
-
2021
- 2021-04-29 NL NL2028094A patent/NL2028094B1/en active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2006523600A (en) | Lamp reflector substrate, glass, glass-ceramic material and method for manufacturing the same | |
US20230295035A1 (en) | Microcrystalline glass, and microcrystalline glass product and manufacturing method therefor | |
FR2990690A1 (en) | QUARTZ-BETA VITROCERAMICS, TRANSPARENT, ESSENTIALLY COLORLESS AND NON-DIFFUSING; ARTICLES THEREOF VITROCERAMIC; PRECURSOR GLASSES | |
JP2010018470A (en) | High-purity molten quartz glass, method of producing the same, member using the same and apparatus | |
CN109721250A (en) | The method for preparing luminescent glass ceramic with glass powder with low melting point | |
CN107651858B (en) | Nano-diamond/tellurium germanate composite glass with NV color center luminescence and preparation method thereof | |
Tohge et al. | Coating Films of 20B2O3· 80SiO2 by the Sol‐Gel Method | |
Kang et al. | Effect of Y2O3 content on the crystallization behaviors and physical properties of glasses based on MgO-Al2O3-SiO2 system | |
NL2028094B1 (en) | Vitrification method for enhancing transmittance of surface-unpolished sapphire | |
JP2009040675A (en) | Method for manufacturing silicate glass, mixed raw material for silicate glass melting and glass article for electronic material | |
CN105601102A (en) | High-alkaline silico-aluminate glass, light guide plate, backlight module, liquid crystal display panel, liquid crystal display terminal and glass preparation method | |
CN108863439B (en) | Vitrification treatment method for increasing transmittance of unpolished sapphire on surface | |
WO2024139237A1 (en) | Oled glass with good optical performance | |
JP2013541485A (en) | Surface nucleation glass ceramic for TV cover glass | |
CN110156326B (en) | Fluorescent glass ceramic based on low-melting-point glass powder and preparation method thereof | |
CN1884167A (en) | Selenium-base chalcohalide glass and method for preparing same | |
CN104045221B (en) | A kind of preparation method of flexible ultra-thin glass | |
TW201902846A (en) | Alkali-free glass substrate | |
KR20150040838A (en) | Glass powder material and method for producing porous glassy film | |
Lak et al. | Optical characterization of BK7 borosilicate glasses containing different amounts of CeO2 | |
Horii et al. | Promoting vitreous silica devitrification by placement on a NaCl grain at 800 C–1150 C | |
CN116573860B (en) | Transparent microcrystalline glass containing calcium tantalate nanocrystalline and preparation method and application thereof | |
JP2010018471A (en) | Quartz glass, method of producing the same, member using the same and apparatus | |
Skroznikova et al. | Transparent hydrophobic sol–gel silica coatings on glass | |
CN109231818A (en) | The production method of oxynitride glass and oxynitride glass |