NL2025433A - Apparatus for and method of controlling droplet formation - Google Patents

Apparatus for and method of controlling droplet formation Download PDF

Info

Publication number
NL2025433A
NL2025433A NL2025433A NL2025433A NL2025433A NL 2025433 A NL2025433 A NL 2025433A NL 2025433 A NL2025433 A NL 2025433A NL 2025433 A NL2025433 A NL 2025433A NL 2025433 A NL2025433 A NL 2025433A
Authority
NL
Netherlands
Prior art keywords
capillary
source material
electro
frequency
droplets
Prior art date
Application number
NL2025433A
Other languages
English (en)
Dutch (nl)
Inventor
Mark Lukens Joshua
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2025433A publication Critical patent/NL2025433A/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2025433A 2019-05-06 2020-04-28 Apparatus for and method of controlling droplet formation NL2025433A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201962843712P 2019-05-06 2019-05-06

Publications (1)

Publication Number Publication Date
NL2025433A true NL2025433A (en) 2020-11-23

Family

ID=70480253

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2025433A NL2025433A (en) 2019-05-06 2020-04-28 Apparatus for and method of controlling droplet formation

Country Status (4)

Country Link
KR (1) KR20220003531A (fr)
CN (1) CN113812214A (fr)
NL (1) NL2025433A (fr)
WO (1) WO2020225015A1 (fr)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7897947B2 (en) 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US8513629B2 (en) 2011-05-13 2013-08-20 Cymer, Llc Droplet generator with actuator induced nozzle cleaning
WO2013029902A1 (fr) * 2011-09-02 2013-03-07 Asml Netherlands B.V. Source de rayonnement et appareil lithographique
WO2014082811A1 (fr) * 2012-11-30 2014-06-05 Asml Netherlands B.V. Générateur de gouttelettes, source de rayonnement en ultraviolet extrême (uve), appareil lithographique, procédé de génération de gouttelettes et procédé de fabrication de dispositif
NL2018004A (en) * 2015-12-17 2017-06-26 Asml Netherlands Bv Droplet generator for lithographic apparatus, euv source and lithographic apparatus

Also Published As

Publication number Publication date
KR20220003531A (ko) 2022-01-10
CN113812214A (zh) 2021-12-17
WO2020225015A1 (fr) 2020-11-12

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