NL2024976A - Substrate support, substrate table and method - Google Patents
Substrate support, substrate table and method Download PDFInfo
- Publication number
- NL2024976A NL2024976A NL2024976A NL2024976A NL2024976A NL 2024976 A NL2024976 A NL 2024976A NL 2024976 A NL2024976 A NL 2024976A NL 2024976 A NL2024976 A NL 2024976A NL 2024976 A NL2024976 A NL 2024976A
- Authority
- NL
- Netherlands
- Prior art keywords
- substrate
- support
- main body
- support body
- immersion
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 337
- 238000000034 method Methods 0.000 title description 15
- 239000012530 fluid Substances 0.000 abstract description 97
- 238000000605 extraction Methods 0.000 abstract description 47
- 230000002093 peripheral effect Effects 0.000 abstract description 13
- 238000007654 immersion Methods 0.000 description 90
- 239000007788 liquid Substances 0.000 description 90
- 230000005855 radiation Effects 0.000 description 23
- 230000003750 conditioning effect Effects 0.000 description 16
- 238000000059 patterning Methods 0.000 description 14
- 230000007246 mechanism Effects 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000011084 recovery Methods 0.000 description 8
- 238000004891 communication Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000013461 design Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 239000011324 bead Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000284 extract Substances 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 238000000671 immersion lithography Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 206010000496 acne Diseases 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000005514 two-phase flow Effects 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Claims (1)
- CONCLUSIE1, Een inrichting ingericht voor het belichten van een substraat.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2024976A NL2024976A (en) | 2020-02-24 | 2020-02-24 | Substrate support, substrate table and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2024976A NL2024976A (en) | 2020-02-24 | 2020-02-24 | Substrate support, substrate table and method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2024976A true NL2024976A (en) | 2020-04-24 |
Family
ID=70412420
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2024976A NL2024976A (en) | 2020-02-24 | 2020-02-24 | Substrate support, substrate table and method |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL2024976A (nl) |
-
2020
- 2020-02-24 NL NL2024976A patent/NL2024976A/en unknown
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