NL2024938A - Device manufacturing method and computer program - Google Patents
Device manufacturing method and computer program Download PDFInfo
- Publication number
- NL2024938A NL2024938A NL2024938A NL2024938A NL2024938A NL 2024938 A NL2024938 A NL 2024938A NL 2024938 A NL2024938 A NL 2024938A NL 2024938 A NL2024938 A NL 2024938A NL 2024938 A NL2024938 A NL 2024938A
- Authority
- NL
- Netherlands
- Prior art keywords
- liquid
- substrate
- immersion
- route
- locations
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 19
- 238000004590 computer program Methods 0.000 title description 10
- 239000000758 substrate Substances 0.000 claims abstract description 130
- 239000007788 liquid Substances 0.000 abstract description 176
- 238000007654 immersion Methods 0.000 abstract description 69
- 230000007547 defect Effects 0.000 abstract description 58
- 238000012986 modification Methods 0.000 abstract description 45
- 230000004048 modification Effects 0.000 abstract description 45
- 238000000034 method Methods 0.000 abstract description 36
- 238000012360 testing method Methods 0.000 abstract description 16
- 230000005855 radiation Effects 0.000 description 26
- 239000010410 layer Substances 0.000 description 22
- 238000000059 patterning Methods 0.000 description 19
- 238000011084 recovery Methods 0.000 description 18
- 230000008569 process Effects 0.000 description 10
- 239000012530 fluid Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 230000005499 meniscus Effects 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 230000005514 two-phase flow Effects 0.000 description 4
- 230000000295 complement effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000000671 immersion lithography Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000002372 labelling Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Claims (1)
- CONCLUSIE1. Een inrichting ingericht voor het belichten van een substraat.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2024938A NL2024938A (en) | 2020-02-18 | 2020-02-18 | Device manufacturing method and computer program |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2024938A NL2024938A (en) | 2020-02-18 | 2020-02-18 | Device manufacturing method and computer program |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2024938A true NL2024938A (en) | 2020-04-24 |
Family
ID=70412417
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2024938A NL2024938A (en) | 2020-02-18 | 2020-02-18 | Device manufacturing method and computer program |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL2024938A (nl) |
-
2020
- 2020-02-18 NL NL2024938A patent/NL2024938A/en unknown
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