NL183425C - POSITIVE PHOTO AND ELECTRON RESISTANT AND METHOD FOR PRODUCING AN IMAGE ON A CARRIER. - Google Patents

POSITIVE PHOTO AND ELECTRON RESISTANT AND METHOD FOR PRODUCING AN IMAGE ON A CARRIER.

Info

Publication number
NL183425C
NL183425C NL8000312A NL8000312A NL183425C NL 183425 C NL183425 C NL 183425C NL 8000312 A NL8000312 A NL 8000312A NL 8000312 A NL8000312 A NL 8000312A NL 183425 C NL183425 C NL 183425C
Authority
NL
Netherlands
Prior art keywords
carrier
producing
image
positive photo
electron
Prior art date
Application number
NL8000312A
Other languages
Dutch (nl)
Other versions
NL183425B (en
NL8000312A (en
Original Assignee
Inst Chimii Akademii Nauk Sssr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inst Chimii Akademii Nauk Sssr filed Critical Inst Chimii Akademii Nauk Sssr
Priority to NL8000312A priority Critical patent/NL183425C/en
Publication of NL8000312A publication Critical patent/NL8000312A/en
Publication of NL183425B publication Critical patent/NL183425B/en
Application granted granted Critical
Publication of NL183425C publication Critical patent/NL183425C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL8000312A 1980-01-17 1980-01-17 POSITIVE PHOTO AND ELECTRON RESISTANT AND METHOD FOR PRODUCING AN IMAGE ON A CARRIER. NL183425C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL8000312A NL183425C (en) 1980-01-17 1980-01-17 POSITIVE PHOTO AND ELECTRON RESISTANT AND METHOD FOR PRODUCING AN IMAGE ON A CARRIER.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8000312 1980-01-17
NL8000312A NL183425C (en) 1980-01-17 1980-01-17 POSITIVE PHOTO AND ELECTRON RESISTANT AND METHOD FOR PRODUCING AN IMAGE ON A CARRIER.

Publications (3)

Publication Number Publication Date
NL8000312A NL8000312A (en) 1981-08-17
NL183425B NL183425B (en) 1988-05-16
NL183425C true NL183425C (en) 1988-10-17

Family

ID=19834695

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8000312A NL183425C (en) 1980-01-17 1980-01-17 POSITIVE PHOTO AND ELECTRON RESISTANT AND METHOD FOR PRODUCING AN IMAGE ON A CARRIER.

Country Status (1)

Country Link
NL (1) NL183425C (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58502169A (en) * 1981-12-21 1983-12-15 インステイテユ−ト　ヒミイ　アカデミイ　ナウク　エスエスエスア−ル Photo- and electron beam resist
JPH083628B2 (en) * 1986-10-13 1996-01-17 三菱電機株式会社 Non-chargeable resist

Also Published As

Publication number Publication date
NL183425B (en) 1988-05-16
NL8000312A (en) 1981-08-17

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Legal Events

Date Code Title Description
A1B A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
V1 Lapsed because of non-payment of the annual fee