NL178700B - Apparatus for depositing a thin layer on a substrate. - Google Patents
Apparatus for depositing a thin layer on a substrate.Info
- Publication number
- NL178700B NL178700B NLAANVRAGE7404173,A NL7404173A NL178700B NL 178700 B NL178700 B NL 178700B NL 7404173 A NL7404173 A NL 7404173A NL 178700 B NL178700 B NL 178700B
- Authority
- NL
- Netherlands
- Prior art keywords
- depositing
- substrate
- thin layer
- thin
- layer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3471—Introduction of auxiliary energy into the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BE129306A BE797385R (en) | 1971-04-27 | 1973-03-27 | Thin mineral film deposition appts - using plasma excited by rf induction |
Publications (3)
Publication Number | Publication Date |
---|---|
NL7404173A NL7404173A (en) | 1974-10-01 |
NL178700B true NL178700B (en) | 1985-12-02 |
NL178700C NL178700C (en) | 1986-05-01 |
Family
ID=3841811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NLAANVRAGE7404173,A NL178700C (en) | 1973-03-27 | 1974-03-27 | Apparatus for depositing a thin layer on a substrate. |
Country Status (7)
Country | Link |
---|---|
US (1) | US3922214A (en) |
JP (1) | JPS5026778A (en) |
CH (1) | CH581198A5 (en) |
DE (1) | DE2412928A1 (en) |
GB (2) | GB1356769A (en) |
IT (1) | IT1007402B (en) |
NL (1) | NL178700C (en) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2324755A1 (en) * | 1975-09-19 | 1977-04-15 | Anvar | HIGH SPEED OF DEPOSIT CATHODIC SPRAY DEVICE |
JPS5435178A (en) * | 1977-08-23 | 1979-03-15 | Matsushita Electric Ind Co Ltd | Ultrafine particle depositing apparatus |
DE2849240C2 (en) * | 1978-11-13 | 1983-01-13 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | CVD coating device for small parts and their use |
DE2941908C2 (en) * | 1979-10-17 | 1986-07-03 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Method for producing a solar cell having a silicon layer |
FR2480552A1 (en) * | 1980-04-10 | 1981-10-16 | Anvar | PLASMA GENERATOR |
GB2085482B (en) * | 1980-10-06 | 1985-03-06 | Optical Coating Laboratory Inc | Forming thin film oxide layers using reactive evaporation techniques |
DE3117070A1 (en) * | 1981-04-29 | 1982-11-18 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | METHOD FOR PRODUCING A SEMICONDUCTOR LAYER SOLAR CELL |
US4895765A (en) * | 1985-09-30 | 1990-01-23 | Union Carbide Corporation | Titanium nitride and zirconium nitride coating compositions, coated articles and methods of manufacture |
US4839245A (en) * | 1985-09-30 | 1989-06-13 | Union Carbide Corporation | Zirconium nitride coated article and method for making same |
US4929322A (en) * | 1985-09-30 | 1990-05-29 | Union Carbide Corporation | Apparatus and process for arc vapor depositing a coating in an evacuated chamber |
US5037522B1 (en) * | 1990-07-24 | 1996-07-02 | Vergason Technology Inc | Electric arc vapor deposition device |
CA2065581C (en) | 1991-04-22 | 2002-03-12 | Andal Corp. | Plasma enhancement apparatus and method for physical vapor deposition |
DE19635669C1 (en) * | 1996-09-03 | 1997-07-24 | Fraunhofer Ges Forschung | Coating large area substrate by gas flow sputtering |
DE59702419D1 (en) | 1997-07-15 | 2000-11-09 | Unaxis Trading Ag Truebbach | Sputter coating method and apparatus |
IT1310029B1 (en) * | 1999-02-26 | 2002-02-05 | Ist Naz Fisica Della Materia | PULSED MICROPLASMA VAPORIZER. |
US20120048723A1 (en) * | 2010-08-24 | 2012-03-01 | Varian Semiconductor Equipment Associates, Inc. | Sputter target feed system |
EP3064416B1 (en) | 2013-10-30 | 2018-09-19 | Toyota Jidosha Kabushiki Kaisha | Vehicle, and method of manufacturing same |
JP6124020B2 (en) | 2014-08-29 | 2017-05-10 | トヨタ自動車株式会社 | Charged charge reduction device for vehicles |
JP6128093B2 (en) | 2014-10-16 | 2017-05-17 | トヨタ自動車株式会社 | Vehicle intake system |
JP6160603B2 (en) | 2014-12-19 | 2017-07-12 | トヨタ自動車株式会社 | Vehicle cooling device |
JP6201980B2 (en) | 2014-12-25 | 2017-09-27 | トヨタ自動車株式会社 | Vehicle intake system |
JP6115559B2 (en) | 2014-12-26 | 2017-04-19 | トヨタ自動車株式会社 | Vehicle exhaust system |
JP6183383B2 (en) | 2015-01-13 | 2017-08-23 | トヨタ自動車株式会社 | vehicle |
JP6365316B2 (en) | 2015-01-19 | 2018-08-01 | トヨタ自動車株式会社 | Lubricating oil or fuel supply device for vehicles |
EP3048017B1 (en) | 2015-01-23 | 2017-11-08 | Toyota Jidosha Kabushiki Kaisha | Damping force generation device for vehicle |
JP6281501B2 (en) | 2015-01-29 | 2018-02-21 | トヨタ自動車株式会社 | Vehicle wheel support device |
JP6248962B2 (en) | 2015-02-10 | 2017-12-20 | トヨタ自動車株式会社 | Vehicle braking force generator |
US11257663B2 (en) * | 2017-09-11 | 2022-02-22 | Agency For Science, Technology And Research | Sputtering system and method |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3408283A (en) * | 1966-09-15 | 1968-10-29 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode positioned in the low pressure region |
US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
BE766345A (en) * | 1971-04-27 | 1971-09-16 | Universitaire De L Etat A Mons | DEVICE FOR MANUFACTURING THIN LAYERS OF MINERAL SUBSTANCES. |
-
1972
- 1972-04-27 GB GB1954472A patent/GB1356769A/en not_active Expired
-
1974
- 1974-03-13 CH CH348974A patent/CH581198A5/xx not_active IP Right Cessation
- 1974-03-18 DE DE2412928A patent/DE2412928A1/en not_active Withdrawn
- 1974-03-26 GB GB1337874A patent/GB1419239A/en not_active Expired
- 1974-03-26 JP JP49033156A patent/JPS5026778A/ja active Pending
- 1974-03-27 NL NLAANVRAGE7404173,A patent/NL178700C/en not_active IP Right Cessation
- 1974-03-27 US US455097A patent/US3922214A/en not_active Expired - Lifetime
- 1974-04-08 IT IT20536/74A patent/IT1007402B/en active
Also Published As
Publication number | Publication date |
---|---|
IT1007402B (en) | 1976-10-30 |
GB1356769A (en) | 1974-06-12 |
US3922214A (en) | 1975-11-25 |
NL178700C (en) | 1986-05-01 |
NL7404173A (en) | 1974-10-01 |
DE2412928A1 (en) | 1974-10-03 |
CH581198A5 (en) | 1976-10-29 |
GB1419239A (en) | 1975-12-24 |
JPS5026778A (en) | 1975-03-19 |
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Legal Events
Date | Code | Title | Description |
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BA | A request for search or an international-type search has been filed | ||
BA | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
V1 | Lapsed because of non-payment of the annual fee |