NL173898B - DEVICE FOR LITHOGRAPHY USING AN ELECTRON BEAM. - Google Patents

DEVICE FOR LITHOGRAPHY USING AN ELECTRON BEAM.

Info

Publication number
NL173898B
NL173898B NLAANVRAGE7811577,A NL7811577A NL173898B NL 173898 B NL173898 B NL 173898B NL 7811577 A NL7811577 A NL 7811577A NL 173898 B NL173898 B NL 173898B
Authority
NL
Netherlands
Prior art keywords
lithography
electron beam
electron
Prior art date
Application number
NLAANVRAGE7811577,A
Other languages
Dutch (nl)
Other versions
NL173898C (en
NL7811577A (en
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of NL7811577A publication Critical patent/NL7811577A/en
Publication of NL173898B publication Critical patent/NL173898B/en
Application granted granted Critical
Publication of NL173898C publication Critical patent/NL173898C/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
NLAANVRAGE7811577,A 1977-11-24 1978-11-24 DEVICE FOR LITHOGRAPHY USING AN ELECTRON BEAM. NL173898C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13994177A JPS5472980A (en) 1977-11-24 1977-11-24 Electron-beam drawing unit

Publications (3)

Publication Number Publication Date
NL7811577A NL7811577A (en) 1979-05-28
NL173898B true NL173898B (en) 1983-10-17
NL173898C NL173898C (en) 1984-03-16

Family

ID=15257230

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7811577,A NL173898C (en) 1977-11-24 1978-11-24 DEVICE FOR LITHOGRAPHY USING AN ELECTRON BEAM.

Country Status (7)

Country Link
US (1) US4199688A (en)
JP (1) JPS5472980A (en)
CA (1) CA1103813A (en)
DE (1) DE2850991A1 (en)
FR (1) FR2410362A1 (en)
GB (1) GB2011125B (en)
NL (1) NL173898C (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5621321A (en) * 1979-07-27 1981-02-27 Fujitsu Ltd Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
US4415851A (en) * 1981-05-26 1983-11-15 International Business Machines Corporation System for contactless testing of multi-layer ceramics
US4417203A (en) * 1981-05-26 1983-11-22 International Business Machines Corporation System for contactless electrical property testing of multi-layer ceramics
US4568861A (en) * 1983-06-27 1986-02-04 International Business Machines Corporation Method and apparatus for controlling alignment and brightness of an electron beam
NL8304217A (en) * 1983-12-07 1985-07-01 Philips Nv AUTOMATICALLY ADJUSTABLE ELECTRON MICROSCOPE.
NL8702874A (en) * 1987-12-01 1989-07-03 Philips Nv INSPECTION DEVICE WITH DIGITALIZED ELECTRON DETECTION.
CA1308203C (en) * 1989-06-01 1992-09-29 Nanoquest (Canada) Inc. Magnification compensation apparatus
JPH11191529A (en) * 1997-12-25 1999-07-13 Nikon Corp Charge beam exposure
JP3946899B2 (en) * 1999-03-26 2007-07-18 株式会社東芝 Method for adjusting optical system in energy beam apparatus
US6781680B1 (en) 1999-03-26 2004-08-24 Kabushiki Kaisha Toshiba Optical system adjusting method for energy beam apparatus
JP3508622B2 (en) * 1999-05-20 2004-03-22 株式会社日立製作所 Electron beam drawing apparatus and drawing method using electron beam
NL1015155C2 (en) * 2000-05-11 2001-11-13 Tno Electron beam lithography.
US7095484B1 (en) * 2001-06-27 2006-08-22 University Of South Florida Method and apparatus for maskless photolithography
US6998219B2 (en) * 2001-06-27 2006-02-14 University Of South Florida Maskless photolithography for etching and deposition
US7049049B2 (en) * 2001-06-27 2006-05-23 University Of South Florida Maskless photolithography for using photoreactive agents
US6764796B2 (en) * 2001-06-27 2004-07-20 University Of South Florida Maskless photolithography using plasma displays
US8421035B2 (en) * 2006-08-11 2013-04-16 The Regents Of The University Of California High-resolution microscope using optical amplification

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3576438A (en) * 1969-04-28 1971-04-27 Bell Telephone Labor Inc Focus monitor for electron microscope including an auxiliary electron gun and focusing lens
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam

Also Published As

Publication number Publication date
CA1103813A (en) 1981-06-23
NL173898C (en) 1984-03-16
FR2410362B1 (en) 1981-05-29
JPS5616536B2 (en) 1981-04-16
NL7811577A (en) 1979-05-28
FR2410362A1 (en) 1979-06-22
GB2011125A (en) 1979-07-04
DE2850991A1 (en) 1979-05-31
JPS5472980A (en) 1979-06-11
GB2011125B (en) 1982-02-24
US4199688A (en) 1980-04-22

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Legal Events

Date Code Title Description
A1A A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
V4 Discontinued because of reaching the maximum lifetime of a patent

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