NL165566C - METHOD FOR ETCHING AN OXIDE LAYER APPLIED ON A SEMI-CONDUCTOR PLATE ACCORDING TO A PRE-DEFINED PATTERN - Google Patents

METHOD FOR ETCHING AN OXIDE LAYER APPLIED ON A SEMI-CONDUCTOR PLATE ACCORDING TO A PRE-DEFINED PATTERN

Info

Publication number
NL165566C
NL165566C NL6908662A NL6908662A NL165566C NL 165566 C NL165566 C NL 165566C NL 6908662 A NL6908662 A NL 6908662A NL 6908662 A NL6908662 A NL 6908662A NL 165566 C NL165566 C NL 165566C
Authority
NL
Netherlands
Prior art keywords
etching
semi
oxide layer
plate according
conductor plate
Prior art date
Application number
NL6908662A
Other languages
Dutch (nl)
Other versions
NL165566B (en
NL6908662A (en
Original Assignee
Bosch Gmbh Robert
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bosch Gmbh Robert filed Critical Bosch Gmbh Robert
Publication of NL6908662A publication Critical patent/NL6908662A/xx
Publication of NL165566B publication Critical patent/NL165566B/en
Application granted granted Critical
Publication of NL165566C publication Critical patent/NL165566C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/02—Exposure apparatus for contact printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL6908662A 1968-06-08 1969-06-06 METHOD FOR ETCHING AN OXIDE LAYER APPLIED ON A SEMI-CONDUCTOR PLATE ACCORDING TO A PRE-DEFINED PATTERN NL165566C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681764456 DE1764456C3 (en) 1968-06-08 1968-06-08 Process for the imaging of a pattern on a photoresist layer

Publications (3)

Publication Number Publication Date
NL6908662A NL6908662A (en) 1969-12-10
NL165566B NL165566B (en) 1980-11-17
NL165566C true NL165566C (en) 1981-04-15

Family

ID=5697997

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6908662A NL165566C (en) 1968-06-08 1969-06-06 METHOD FOR ETCHING AN OXIDE LAYER APPLIED ON A SEMI-CONDUCTOR PLATE ACCORDING TO A PRE-DEFINED PATTERN

Country Status (4)

Country Link
DE (1) DE1764456C3 (en)
FR (1) FR2010439A1 (en)
GB (1) GB1248819A (en)
NL (1) NL165566C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA8244B (en) * 1981-01-16 1982-11-24 Grace W R & Co Method and apparatus for making printed circuit boards

Also Published As

Publication number Publication date
FR2010439A1 (en) 1970-02-13
DE1764456B2 (en) 1979-02-08
NL165566B (en) 1980-11-17
DE1764456C3 (en) 1979-10-11
DE1764456A1 (en) 1971-07-22
NL6908662A (en) 1969-12-10
GB1248819A (en) 1971-10-06

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee