NL161271C - METHOD FOR MAKING A XEROGRAPHIC PLATE. - Google Patents

METHOD FOR MAKING A XEROGRAPHIC PLATE.

Info

Publication number
NL161271C
NL161271C NL6812278.A NL6812278A NL161271C NL 161271 C NL161271 C NL 161271C NL 6812278 A NL6812278 A NL 6812278A NL 161271 C NL161271 C NL 161271C
Authority
NL
Netherlands
Prior art keywords
making
xerographic plate
xerographic
plate
Prior art date
Application number
NL6812278.A
Other languages
Dutch (nl)
Other versions
NL161271B (en
NL6812278A (en
Original Assignee
Rank Xerox Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rank Xerox Ltd filed Critical Rank Xerox Ltd
Publication of NL6812278A publication Critical patent/NL6812278A/xx
Publication of NL161271B publication Critical patent/NL161271B/en
Application granted granted Critical
Publication of NL161271C publication Critical patent/NL161271C/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/10—Preliminary treatment of the selenium or tellurium, its application to the foundation plate, or the subsequent treatment of the combination
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08207—Selenium-based
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02422—Non-crystalline insulating materials, e.g. glass, polymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02425—Conductive materials, e.g. metallic silicides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/0257—Doping during depositing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
NL6812278.A 1967-08-29 1968-08-29 METHOD FOR MAKING A XEROGRAPHIC PLATE. NL161271C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US66398167A 1967-08-29 1967-08-29

Publications (3)

Publication Number Publication Date
NL6812278A NL6812278A (en) 1969-03-04
NL161271B NL161271B (en) 1979-08-15
NL161271C true NL161271C (en) 1980-01-15

Family

ID=24664016

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6812278.A NL161271C (en) 1967-08-29 1968-08-29 METHOD FOR MAKING A XEROGRAPHIC PLATE.

Country Status (6)

Country Link
JP (1) JPS5522783B1 (en)
BE (1) BE719980A (en)
DE (1) DE1797162C3 (en)
FR (1) FR1598952A (en)
GB (1) GB1227546A (en)
NL (1) NL161271C (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2250689C3 (en) * 1972-10-16 1980-09-18 Siemens Ag, 1000 Berlin Und 8000 Muenchen Electrophotographic X-ray imaging process
JPS5457434A (en) * 1977-10-18 1979-05-09 Stanley Electric Co Ltd Vacuum depositing method for selenium
JPS5492241A (en) * 1977-12-28 1979-07-21 Canon Inc Electrophotographic photoreceptor
JPS55159445A (en) * 1979-05-31 1980-12-11 Ricoh Co Ltd Electrophotographic receptor

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2654853A (en) * 1949-02-28 1953-10-06 Rca Corp Photoelectric apparatus
DE1672153U (en) * 1951-12-24 1954-02-18 Zeiss Ikon Ag RADIATION-SENSITIVE SEMI-CONDUCTOR LAYER MADE OF AMORPHEMIC SELENIUM
DE898641C (en) * 1951-12-25 1953-12-03 Zeiss Ikon Ag Resistance layer made of amorphous selenium
US2970906A (en) * 1955-08-05 1961-02-07 Haloid Xerox Inc Xerographic plate and a process of copy-making
DE1250737B (en) * 1963-07-08
GB1193348A (en) * 1966-10-03 1970-05-28 Rank Xerox Ltd Xerographic Process and Apparatus

Also Published As

Publication number Publication date
DE1797162B2 (en) 1979-09-20
GB1227546A (en) 1971-04-07
FR1598952A (en) 1970-07-15
BE719980A (en) 1969-02-26
NL161271B (en) 1979-08-15
NL6812278A (en) 1969-03-04
DE1797162A1 (en) 1971-07-29
DE1797162C3 (en) 1985-10-10
JPS5522783B1 (en) 1980-06-19

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee
NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: RANK XEROX