NL132072C - - Google Patents
Info
- Publication number
- NL132072C NL132072C NL132072DA NL132072C NL 132072 C NL132072 C NL 132072C NL 132072D A NL132072D A NL 132072DA NL 132072 C NL132072 C NL 132072C
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D177/00—Coating compositions based on polyamides obtained by reactions forming a carboxylic amide link in the main chain; Coating compositions based on derivatives of such polymers
- C09D177/06—Polyamides derived from polyamines and polycarboxylic acids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polyamides (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK0038815 | 1959-10-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL132072C true NL132072C (ja) |
Family
ID=7221513
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL132072D NL132072C (ja) | 1959-10-02 | ||
| NL256407D NL256407A (ja) | 1959-10-02 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL256407D NL256407A (ja) | 1959-10-02 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3143416A (ja) |
| BE (1) | BE595627A (ja) |
| CH (1) | CH390057A (ja) |
| DE (1) | DE1622764B1 (ja) |
| GB (1) | GB942824A (ja) |
| NL (2) | NL256407A (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3420732A (en) * | 1965-10-23 | 1969-01-07 | Minnesota Mining & Mfg | Transfer film and process of using same |
| US3507651A (en) * | 1966-12-29 | 1970-04-21 | Corning Glass Works | Stencil screen and method |
| US3790382A (en) * | 1971-04-16 | 1974-02-05 | Minnesota Mining & Mfg | Fluorinated polyamide-diazo resin coating composition |
| EP0353666A3 (en) * | 1988-08-03 | 1990-05-23 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL56638C (ja) * | 1939-09-25 | |||
| US2412993A (en) * | 1943-07-19 | 1946-12-24 | Du Pont | Polymeric materials |
| BE468087A (ja) * | 1944-02-09 | |||
| BE559609A (ja) * | 1954-04-05 | |||
| NL198070A (ja) * | 1954-06-19 | |||
| US2972540A (en) * | 1958-08-05 | 1961-02-21 | Du Pont | Photopolymerizable compositions and elements |
-
0
- NL NL132072D patent/NL132072C/xx active
- NL NL256407D patent/NL256407A/xx unknown
- BE BE595627D patent/BE595627A/xx unknown
-
1959
- 1959-10-02 DE DE19591622764D patent/DE1622764B1/de active Pending
-
1960
- 1960-09-21 US US57414A patent/US3143416A/en not_active Expired - Lifetime
- 1960-09-27 GB GB33169/60A patent/GB942824A/en not_active Expired
- 1960-09-29 CH CH1098060A patent/CH390057A/de unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NL256407A (ja) | |
| BE595627A (ja) | |
| DE1622764B1 (de) | 1970-05-27 |
| CH390057A (de) | 1965-03-31 |
| US3143416A (en) | 1964-08-04 |
| GB942824A (en) | 1963-11-27 |