NL129161C - - Google Patents
Info
- Publication number
- NL129161C NL129161C NL129161DA NL129161C NL 129161 C NL129161 C NL 129161C NL 129161D A NL129161D A NL 129161DA NL 129161 C NL129161 C NL 129161C
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK36720A DE1124817B (de) | 1959-01-14 | 1959-01-14 | Kopierschichten fuer Druckformen aus Naphthochinon-(1, 2)-diazidsulfonsaeureestern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL129161C true NL129161C (US08124317-20120228-C00026.png) |
Family
ID=7220776
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL247299D NL247299A (US08124317-20120228-C00026.png) | 1959-01-14 | ||
| NL129161D NL129161C (US08124317-20120228-C00026.png) | 1959-01-14 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL247299D NL247299A (US08124317-20120228-C00026.png) | 1959-01-14 |
Country Status (7)
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL131386C (US08124317-20120228-C00026.png) * | 1959-08-29 | |||
| NL255517A (US08124317-20120228-C00026.png) * | 1959-09-04 | |||
| US3149972A (en) * | 1960-08-16 | 1964-09-22 | Gen Aniline & Film Corp | Diazo and resinous coupler printing plates for photomechanical reproduction |
| NL132291C (US08124317-20120228-C00026.png) * | 1961-01-25 | |||
| BE620660A (US08124317-20120228-C00026.png) * | 1961-07-28 | |||
| DE2331377C2 (de) * | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
| US4189320A (en) * | 1975-04-29 | 1980-02-19 | American Hoechst Corporation | Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures |
| US4174222A (en) * | 1975-05-24 | 1979-11-13 | Tokyo Ohka Kogyo Kabushiki Kaisha | Positive-type O-quinone diazide containing photoresist compositions |
| DE2547905C2 (de) * | 1975-10-25 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Aufzeichnungsmaterial |
| IT1169682B (it) * | 1983-11-08 | 1987-06-03 | I M G Ind Materiali Grafici Sp | Composizione per fotoriproduzioni |
| DE3635303A1 (de) | 1986-10-17 | 1988-04-28 | Hoechst Ag | Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten |
| DE3718416A1 (de) * | 1987-06-02 | 1988-12-15 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung |
| DE3729035A1 (de) * | 1987-08-31 | 1989-03-09 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial |
| US4853315A (en) * | 1988-01-15 | 1989-08-01 | International Business Machines Corporation | O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists |
| DE69029104T2 (de) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxane und positiv arbeitende Resistmasse |
| US5273856A (en) * | 1990-10-31 | 1993-12-28 | International Business Machines Corporation | Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation |
| GB9326150D0 (en) * | 1993-12-22 | 1994-02-23 | Alcan Int Ltd | Electrochemical roughening method |
| JPH0876380A (ja) | 1994-09-06 | 1996-03-22 | Fuji Photo Film Co Ltd | ポジ型印刷版組成物 |
| JP3278306B2 (ja) | 1994-10-31 | 2002-04-30 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| ATE183136T1 (de) | 1996-04-23 | 1999-08-15 | Kodak Polychrome Graphics Co | Vorläufer einer lithographischen druckform und ihre verwendung bei der bebilderung durch wärme |
| US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| GB9622657D0 (en) | 1996-10-31 | 1997-01-08 | Horsell Graphic Ind Ltd | Direct positive lithographic plate |
| US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| BR9810668A (pt) | 1997-07-05 | 2001-09-04 | Kodak Polychrome Graphics Co | Processos para formação de moldes e materiais sensìveis a radiação |
| US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6045963A (en) * | 1998-03-17 | 2000-04-04 | Kodak Polychrome Graphics Llc | Negative-working dry planographic printing plate |
| US6296982B1 (en) | 1999-11-19 | 2001-10-02 | Kodak Polychrome Graphics Llc | Imaging articles |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE907739C (de) * | 1949-07-23 | 1954-02-18 | Kalle & Co Ag | Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares lichtempfindliches Material |
| NL185407B (nl) * | 1953-03-11 | Mitsui Petrochemical Ind | Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze. | |
| DE938233C (de) * | 1953-03-11 | 1956-01-26 | Kalle & Co Ag | Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen |
-
0
- NL NL247299D patent/NL247299A/xx unknown
- NL NL129161D patent/NL129161C/xx active
-
1959
- 1959-01-14 DE DEK36720A patent/DE1124817B/de active Pending
-
1960
- 1960-01-07 GB GB606/60A patent/GB937121A/en not_active Expired
- 1960-01-07 US US935A patent/US3061430A/en not_active Expired - Lifetime
- 1960-01-12 CH CH27760A patent/CH388777A/de unknown
- 1960-01-14 FR FR815623A patent/FR1245266A/fr not_active Expired
- 1960-01-14 BE BE586559A patent/BE586559A/fr unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE1124817B (de) | 1962-03-01 |
| BE586559A (fr) | 1960-07-14 |
| US3061430A (en) | 1962-10-30 |
| NL247299A (US08124317-20120228-C00026.png) | |
| CH388777A (de) | 1965-02-28 |
| GB937121A (en) | 1963-09-18 |
| FR1245266A (fr) | 1960-11-04 |
