MY177657A - Variable flow resistance system with circulation inducing structure therein to variably resist flow in a subterranean well - Google Patents

Variable flow resistance system with circulation inducing structure therein to variably resist flow in a subterranean well

Info

Publication number
MY177657A
MY177657A MYPI2013000132A MYPI2013000132A MY177657A MY 177657 A MY177657 A MY 177657A MY PI2013000132 A MYPI2013000132 A MY PI2013000132A MY PI2013000132 A MYPI2013000132 A MY PI2013000132A MY 177657 A MY177657 A MY 177657A
Authority
MY
Malaysia
Prior art keywords
flow
port
end surfaces
chamber
subterranean well
Prior art date
Application number
MYPI2013000132A
Inventor
D Dykstra Jason
L Fripp Michael
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/351,035 external-priority patent/US8905144B2/en
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MY177657A publication Critical patent/MY177657A/en

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  • Filling Or Emptying Of Bunkers, Hoppers, And Tanks (AREA)

Abstract

A flow control device can include a surface that defines a chamber (84) and includes a side perimeter (110) and opposing end surfaces (98, 100), a greatest distance between the opposing end surfaces being smaller than a largest dimension of the opposing end surfaces, a first port (40) through one of the end surfaces, and a second port (86) through the surface and apart from the first port, the side perimeter surface being operable to direct flow from the second port to rotate about the first port. Another device can include a cylindroidal chamber (84) for receiving flow through an inlet (86, 88) and directing the flow to an outlet (40), a greatest axial dimension of the cylindroidal chamber being smaller than a greatest diametric dimension of the cylindroidal chamber, the cylindroidal chamber promoting rotation of the flow based on a characteristic of the inflow through the inlet. The device can have a flow path structure (94) in the cylindroidal chamber.
MYPI2013000132A 2012-01-16 2013-01-15 Variable flow resistance system with circulation inducing structure therein to variably resist flow in a subterranean well MY177657A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/351,035 US8905144B2 (en) 2009-08-18 2012-01-16 Variable flow resistance system with circulation inducing structure therein to variably resist flow in a subterranean well

Publications (1)

Publication Number Publication Date
MY177657A true MY177657A (en) 2020-09-23

Family

ID=79170489

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2013000132A MY177657A (en) 2012-01-16 2013-01-15 Variable flow resistance system with circulation inducing structure therein to variably resist flow in a subterranean well

Country Status (1)

Country Link
MY (1) MY177657A (en)

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