MY175402A - Polishing composition - Google Patents

Polishing composition

Info

Publication number
MY175402A
MY175402A MYPI2015000977A MYPI2015000977A MY175402A MY 175402 A MY175402 A MY 175402A MY PI2015000977 A MYPI2015000977 A MY PI2015000977A MY PI2015000977 A MYPI2015000977 A MY PI2015000977A MY 175402 A MY175402 A MY 175402A
Authority
MY
Malaysia
Prior art keywords
silica abrasives
polishing composition
dmin1
average
aspect ratio
Prior art date
Application number
MYPI2015000977A
Inventor
Matsunami Yasushi
Oohashi Masanori
Yokomichi Noritaka
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY175402A publication Critical patent/MY175402A/en

Links

Abstract

A polishing composition includes first silica abrasives having an average aspect ratio, As1, and second silica abrasives having an average aspect ratio, As2, larger than the average aspect ratio of the first silica abrasives. The first silica abrasives have an average minor axis length, Dmin1, of 30 nm or more and 60 nm or less, and the relation between the average minor axis length, Dmin1, of the first silica abrasives and the average minor axis length, Dmin2, of the second silica abrasives satisfies 1 <(Dmin2/Dmin1) < 3. The most illustrative drawing: Figure 1
MYPI2015000977A 2014-04-16 2015-04-14 Polishing composition MY175402A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014085047A JP6412714B2 (en) 2014-04-16 2014-04-16 Polishing composition

Publications (1)

Publication Number Publication Date
MY175402A true MY175402A (en) 2020-06-24

Family

ID=54596758

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015000977A MY175402A (en) 2014-04-16 2015-04-14 Polishing composition

Country Status (2)

Country Link
JP (1) JP6412714B2 (en)
MY (1) MY175402A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6487308B2 (en) * 2014-10-20 2019-03-20 大阪ガスケミカル株式会社 Polyester poly (meth) acrylate having fluorene skeleton, curable composition and cured product thereof, and production method thereof
JP6584935B2 (en) * 2015-11-30 2019-10-02 花王株式会社 Polishing liquid composition for magnetic disk substrate
JP6637816B2 (en) * 2016-03-31 2020-01-29 株式会社フジミインコーポレーテッド Polishing composition, substrate polishing method and substrate manufacturing method
JP6679386B2 (en) * 2016-03-31 2020-04-15 株式会社フジミインコーポレーテッド Polishing composition, substrate manufacturing method and polishing method
JP6775453B2 (en) * 2017-03-23 2020-10-28 山口精研工業株式会社 Abrasive composition for magnetic disk substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005108407A (en) * 2003-09-12 2005-04-21 Univ Waseda Magnetic recording medium and substrate for magnetic recording medium
JP6305674B2 (en) * 2012-02-17 2018-04-04 株式会社フジミインコーポレーテッド Polishing composition and method for producing semiconductor substrate

Also Published As

Publication number Publication date
JP2015203108A (en) 2015-11-16
JP6412714B2 (en) 2018-10-24

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