MY175402A - Polishing composition - Google Patents

Polishing composition

Info

Publication number
MY175402A
MY175402A MYPI2015000977A MYPI2015000977A MY175402A MY 175402 A MY175402 A MY 175402A MY PI2015000977 A MYPI2015000977 A MY PI2015000977A MY PI2015000977 A MYPI2015000977 A MY PI2015000977A MY 175402 A MY175402 A MY 175402A
Authority
MY
Malaysia
Prior art keywords
silica abrasives
polishing composition
dmin1
average
aspect ratio
Prior art date
Application number
MYPI2015000977A
Inventor
Matsunami Yasushi
Oohashi Masanori
Yokomichi Noritaka
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY175402A publication Critical patent/MY175402A/en

Links

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

A polishing composition includes first silica abrasives having an average aspect ratio, As1, and second silica abrasives having an average aspect ratio, As2, larger than the average aspect ratio of the first silica abrasives. The first silica abrasives have an average minor axis length, Dmin1, of 30 nm or more and 60 nm or less, and the relation between the average minor axis length, Dmin1, of the first silica abrasives and the average minor axis length, Dmin2, of the second silica abrasives satisfies 1 <(Dmin2/Dmin1) < 3. The most illustrative drawing: Figure 1
MYPI2015000977A 2014-04-16 2015-04-14 Polishing composition MY175402A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014085047A JP6412714B2 (en) 2014-04-16 2014-04-16 Polishing composition

Publications (1)

Publication Number Publication Date
MY175402A true MY175402A (en) 2020-06-24

Family

ID=54596758

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015000977A MY175402A (en) 2014-04-16 2015-04-14 Polishing composition

Country Status (2)

Country Link
JP (1) JP6412714B2 (en)
MY (1) MY175402A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6487308B2 (en) * 2014-10-20 2019-03-20 大阪ガスケミカル株式会社 Polyester poly (meth) acrylate having fluorene skeleton, curable composition and cured product thereof, and production method thereof
JP6584935B2 (en) * 2015-11-30 2019-10-02 花王株式会社 Polishing liquid composition for magnetic disk substrate
JP6679386B2 (en) * 2016-03-31 2020-04-15 株式会社フジミインコーポレーテッド Polishing composition, substrate manufacturing method and polishing method
JP6637816B2 (en) * 2016-03-31 2020-01-29 株式会社フジミインコーポレーテッド Polishing composition, substrate polishing method and substrate manufacturing method
JP6775453B2 (en) * 2017-03-23 2020-10-28 山口精研工業株式会社 Abrasive composition for magnetic disk substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005108407A (en) * 2003-09-12 2005-04-21 Univ Waseda Magnetic recording medium and substrate for magnetic recording medium
JP6305674B2 (en) * 2012-02-17 2018-04-04 株式会社フジミインコーポレーテッド Polishing composition and method for producing semiconductor substrate

Also Published As

Publication number Publication date
JP2015203108A (en) 2015-11-16
JP6412714B2 (en) 2018-10-24

Similar Documents

Publication Publication Date Title
WO2018109170A3 (en) Il-11ra antibodies
MY175402A (en) Polishing composition
EP4285923A3 (en) Antibody molecules to april and uses thereof
SG10201808259TA (en) Anti-jagged1 antibodies and methods of use
SG10201808835QA (en) Anti-siglec-8 antibodies and methods of use thereof
WO2014152157A8 (en) Methods and compositions for the generation and use of conformation-specific antibodies
WO2015200902A8 (en) Endophytes, associated compositions, and methods of use thereof
WO2016044463A3 (en) Mk2 inhibitors and uses thereof
EP3092207A4 (en) High aspect boron nitride, methods, and composition containing the same
EP3119432A4 (en) Antibodies against immunogenic glycopeptides, composition comprising the same and use thereof
PH12015502117A1 (en) High cleaning silica with low abrasion and method for making same
EP4279762A3 (en) Eddy current brake configurations
PH12018502137A1 (en) Anti-complement factor bb antibodies and uses thereof
MX2019007496A (en) Novel cannabinoid compositions and methods of treating pediatric epilepsy.
PH12018501067A1 (en) Optical element
WO2017087912A3 (en) Ratiometric biosensors and non-geometrically modulated fret
MY183434A (en) Novel (per)fluoropolyether polymers
WO2020127145A3 (en) Materials for electronic devices
MY182267A (en) Polishing composition and polishing method
PH12018502233A1 (en) ErbB INHIBITORS AND USES THEREOF
MX2018005785A (en) Anti-cd22 antibody-maytansine conjugates and methods of use thereof.
MX2021003159A (en) Microemulsions carrying antioxidants.
WO2014151358A3 (en) Anaerobic curable compositions
MX2017012640A (en) Coil spring.
WO2011014288A3 (en) Articles having low coefficients of friction, methods of making the same, and methods of use