MY158622A - 2-benzyl-4-(2,4-dichlorophenyl)-5-methylimidazole compound - Google Patents
2-benzyl-4-(2,4-dichlorophenyl)-5-methylimidazole compoundInfo
- Publication number
- MY158622A MY158622A MYPI2011000845A MYPI20110845A MY158622A MY 158622 A MY158622 A MY 158622A MY PI2011000845 A MYPI2011000845 A MY PI2011000845A MY PI20110845 A MYPI20110845 A MY PI20110845A MY 158622 A MY158622 A MY 158622A
- Authority
- MY
- Malaysia
- Prior art keywords
- compound
- benzyl
- dichlorophenyl
- methylimidazole
- methylimidazole compound
- Prior art date
Links
- -1 2-benzyl-4-(2,4-dichlorophenyl)-5-methylimidazole compound Chemical class 0.000 title abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 abstract 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 abstract 1
- 239000003905 agrochemical Substances 0.000 abstract 1
- 239000003963 antioxidant agent Substances 0.000 abstract 1
- 230000003078 antioxidant effect Effects 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 239000003814 drug Substances 0.000 abstract 1
- 239000003822 epoxy resin Substances 0.000 abstract 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 229920000647 polyepoxide Polymers 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3615—N-compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/48—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
- C23C22/52—Treatment of copper or alloys based thereon
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Anti-Oxidant Or Stabilizer Compositions (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
AN OBJECT IS TO PROVIDE A 2-BENZYL-4-(2,4- DICHIOROPHENYL)-5-METHYLIMIDAZOLE COMPOUND USEFUL AS AN ANTIOXIDANT FOR COPPER SURFACE, A CURING AGENT FOR EPOXY RESINS, OR AN INTERMEDIATE FOR MEDICAMENTS AND AGRICULTURAL CHEMICALS. A 2-BENZYL--4- (2,4-DICHLOROPHENYL)-5-METHYLIMIDAZOLE COMPOUND REPRESENTED BY THE FORMULA (I).THE COMPOUND CAN BE SYNTHESIZED BY REACTING A 2-HALOGENATED 2?,4?- DICHLOROPROPIOPHENONE COMPOUND WITH AN ARYLACETAMIDINE COMPOUND UNDER HEATING IN THE PRESENCE OF A DEHYDROHALOGENATING AGENT IN AN ORGANIC SOLVENT WHEREIN X1 AND X2 ARE THE SAME OR DIFFERENT AND REPRESENT A HYDROGEN ATOM, A CHLORINE ATOM, OR A BROMINE ATOM.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008259661 | 2008-10-06 | ||
JP2009138853 | 2009-06-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY158622A true MY158622A (en) | 2016-10-31 |
Family
ID=41323529
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2011000845A MY158622A (en) | 2008-10-06 | 2009-09-29 | 2-benzyl-4-(2,4-dichlorophenyl)-5-methylimidazole compound |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5368241B2 (en) |
KR (1) | KR101602985B1 (en) |
CN (1) | CN102171382B (en) |
MY (1) | MY158622A (en) |
TW (1) | TWI435870B (en) |
WO (1) | WO2010041614A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5260357B2 (en) * | 2008-09-17 | 2013-08-14 | 四国化成工業株式会社 | 2- (2,4-dichlorobenzyl) -4-phenyl-5-alkylimidazole compound |
JP5260367B2 (en) * | 2008-09-26 | 2013-08-14 | 四国化成工業株式会社 | 2- (Chlorobenzyl) -4-phenylimidazole compound |
CN115436507B (en) * | 2022-08-18 | 2024-08-30 | 山东京博生物科技有限公司 | Method for detecting content of 3, 4' -dichlorophenone acetone |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW270944B (en) * | 1993-05-10 | 1996-02-21 | Shikoku Kakoki Co Ltd | |
JP3277025B2 (en) * | 1993-05-10 | 2002-04-22 | 四国化成工業株式会社 | Copper and copper alloy surface treatment agent |
JPH06329635A (en) * | 1993-05-24 | 1994-11-29 | Shikoku Chem Corp | New imidazole compound |
JP3311858B2 (en) * | 1994-03-08 | 2002-08-05 | 四国化成工業株式会社 | Copper and copper alloy surface treatment agent |
AR024077A1 (en) * | 1999-05-25 | 2002-09-04 | Smithkline Beecham Corp | ANTIBACTERIAL COMPOUNDS |
FR2825926A1 (en) * | 2001-06-14 | 2002-12-20 | Sod Conseils Rech Applic | Use of new and known imidazole derivatives as sodium channel modulators used for treating e.g. pain, epilepsy, cardiac rhythm disorders, neurodegeneration, depression, irritable bowel syndrome, and diabetic retinopathies |
CN1761773B (en) * | 2003-03-19 | 2010-05-05 | 四国化成工业株式会社 | Novel imidazole compound and usage thereof |
WO2005080346A1 (en) * | 2004-02-12 | 2005-09-01 | Transtech Pharma, Inc. | Substituted azole derivatives, compositions, and methods of use |
-
2009
- 2009-09-29 KR KR1020117007967A patent/KR101602985B1/en active IP Right Grant
- 2009-09-29 CN CN2009801386957A patent/CN102171382B/en active Active
- 2009-09-29 WO PCT/JP2009/067308 patent/WO2010041614A1/en active Application Filing
- 2009-09-29 MY MYPI2011000845A patent/MY158622A/en unknown
- 2009-10-02 JP JP2009230515A patent/JP5368241B2/en active Active
- 2009-10-06 TW TW098133818A patent/TWI435870B/en active
Also Published As
Publication number | Publication date |
---|---|
WO2010041614A1 (en) | 2010-04-15 |
JP5368241B2 (en) | 2013-12-18 |
KR101602985B1 (en) | 2016-03-11 |
TW201014828A (en) | 2010-04-16 |
JP2011016785A (en) | 2011-01-27 |
CN102171382B (en) | 2013-08-14 |
CN102171382A (en) | 2011-08-31 |
TWI435870B (en) | 2014-05-01 |
KR20110073498A (en) | 2011-06-29 |
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