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Priority claimed from JP2005099729Aexternal-prioritypatent/JP4779405B2/en
Application filed by Toyo Seikan Kaisha LtdfiledCriticalToyo Seikan Kaisha Ltd
Publication of MY141015ApublicationCriticalpatent/MY141015A/en
Manufacture Of Macromolecular Shaped Articles
(AREA)
Abstract
A GAS-BARRIER MATERIAL IN WHICH CARBOXYL GROUPS ARE IONICALLY CROSSLINKED IN AN AMOUNT CORRESPONDING TO AN ACID VALUC OF AT LEAST 330 MGKOH/G OF A RESIN THAT HAS THE CARBOXYL GROUPS IN AN AMOUNT CORRESPONDING TO AN ACID VALUE OF NOT SMALLER THAN 580 MGKOH/G. THE GAS-BARRIER MATERIAL EXHIBITS EXCELLENT GAS-BARRIER PROPERTY, RETORT RESISTANCE AND FLEXIBILITY UNDER HIGHLY HUMID CONDITIONS, ENABLES THE FILM TO BE CURED AT A LOW TEMPERATURE IN A SHORT PERIOD OF TIME, AND CAN BE FAVORABLY PRODUCED.
MYPI200614332005-03-302006-03-30Gas-barrier material and a method of producing the same
MY141015A
(en)
Process for producing resin composition with partial-discharge resistance, resin composition with partial-discharge resistance, and insulating material with partial-discharge resistance