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Application filed by Fujimi IncfiledCriticalFujimi Inc
Publication of MY139372ApublicationCriticalpatent/MY139372A/en
Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices
(AREA)
Abstract
A POLISHING COMPOSITION TO BE USED FOR POLISHING A MAGNETIC DISK SUBSTRATE, WHICH COMPRISES (A) AT LEAST ONE MEMBER SELECTED FROM THE GROUP CONSISTING OF FORMIC ACID, ACETIC ACID, SUCCINIC ACID, MALIC ACID, MALEIC ACID, MALONIC ACID, BUTYRIC ACID, OXALIC ACID, IMINODIACETIC ACID, DL-MANDELIC ACID AND 1-GLUTAMIC ACID SALT, (B) SILICA AND (C) WATER, AND CONTAINS NO (D) AN OXIDANT
Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, kit for chemical mechanical polishing, and kit for preparing aqueous dispersion for chemical mechanical polishing