MXPA97005346A - Composition of fotoprotect layer - Google Patents
Composition of fotoprotect layerInfo
- Publication number
- MXPA97005346A MXPA97005346A MXPA/A/1997/005346A MX9705346A MXPA97005346A MX PA97005346 A MXPA97005346 A MX PA97005346A MX 9705346 A MX9705346 A MX 9705346A MX PA97005346 A MXPA97005346 A MX PA97005346A
- Authority
- MX
- Mexico
- Prior art keywords
- layer composition
- salt
- photoprotective layer
- diazido
- photosensitive agent
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 35
- 230000003711 photoprotective Effects 0.000 claims abstract description 41
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 26
- 229920000642 polymer Polymers 0.000 claims abstract description 13
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N disodium Chemical class [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- KEAYESYHFKHZAL-UHFFFAOYSA-N sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000011734 sodium Substances 0.000 claims abstract description 5
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 5
- BGTOWKSIORTVQH-UHFFFAOYSA-N Cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims abstract description 4
- 150000008054 sulfonate salts Chemical class 0.000 claims abstract description 4
- TWXTWZIUMCFMSG-UHFFFAOYSA-N nitride(3-) Chemical compound [N-3] TWXTWZIUMCFMSG-UHFFFAOYSA-N 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 7
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 7
- 239000011780 sodium chloride Substances 0.000 claims description 6
- HYYYTIDWAIQGHI-UHFFFAOYSA-L disodium;5-azido-2-[2-(4-azido-2-sulfonatophenyl)ethenyl]benzenesulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C1=CC(N=[N+]=[N-])=CC=C1C=CC1=CC=C(N=[N+]=[N-])C=C1S([O-])(=O)=O HYYYTIDWAIQGHI-UHFFFAOYSA-L 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- DIJASSSJLUFMDV-UHFFFAOYSA-L N(=[N+]=[N-])C1=CC(C(C=C1)C=CC1=CC=C(C=C1)N=[N+]=[N-])(S(=O)(=O)[O-])S(=O)(=O)[O-].[Na+].[Na+] Chemical compound N(=[N+]=[N-])C1=CC(C(C=C1)C=CC1=CC=C(C=C1)N=[N+]=[N-])(S(=O)(=O)[O-])S(=O)(=O)[O-].[Na+].[Na+] DIJASSSJLUFMDV-UHFFFAOYSA-L 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 13
- XHPWRTXYJFNZAW-UHFFFAOYSA-L 5-azido-2-[2-(4-azido-2-sulfonatophenyl)ethenyl]benzenesulfonate Chemical class [O-]S(=O)(=O)C1=CC(N=[N+]=[N-])=CC=C1C=CC1=CC=C(N=[N+]=[N-])C=C1S([O-])(=O)=O XHPWRTXYJFNZAW-UHFFFAOYSA-L 0.000 abstract 1
- 239000011159 matrix material Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 241000048284 Potato virus P Species 0.000 description 5
- 239000004615 ingredient Substances 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- XBGNERSKEKDZDS-UHFFFAOYSA-N N-[2-(dimethylamino)ethyl]acridine-4-carboxamide Chemical compound C1=CC=C2N=C3C(C(=O)NCCN(C)C)=CC=CC3=CC2=C1 XBGNERSKEKDZDS-UHFFFAOYSA-N 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- OSERBNFKJRAKLA-UHFFFAOYSA-N 5-azido-2-[[3-[(4-azido-2-sulfophenyl)methylidene]-2-oxocyclopentylidene]methyl]benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC(N=[N+]=[N-])=CC=C1C=C(CC1)C(=O)C1=CC1=CC=C(N=[N+]=[N-])C=C1S(O)(=O)=O OSERBNFKJRAKLA-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 239000003638 reducing agent Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Abstract
A photoprotective layer composition containing a photocurable polymer and a photosensitive agent is described, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2'-stilbenedisulfonate salt of sodium, disodium salt of 4,4'-diazo-2,2'-dibenzalacetone disulfonate, disodium salt of 2,5-bis (4-azido-2-sulfobenzilidene) cyclopentanone and sulfonate salt of 4,4 ' -diazido-2,2'-dicinnamilidenacetona. By carrying out a lithographic process using the photoprotective layer composition, the exposure time can be shortened, thereby improving the performance of the products
Description
BACKGROUND OF THE INVENTION The present invention relates to a photoprotective layer composition and more particularly to a photoprotective layer composition which can be used to form a black matrix geometric shape or configuration for a lightning tube. cathode through the use of a lithographic process and which can obtain a hardening effect sufficient even in a short exposure time. In general, on the screen of a color cathode ray tube, geometrical figures or phosphor configurations of green, blue and red emission are regularly arranged in a dot or band form. Also, in order to improve the contrast and the purity of the color of the screen, a black matpz is formed between the respective phosphor geometric figures. The black matrix is formed in general by using a lithographic procedure, as in the formation of geometric phosphor figures. The lithographic process consists of the stages of coating, exposure and development of the photoprotective layer. Here, the photoprotective layer is divided into a positive type and a negative type, which is used selectively in consideration of the required sensitivity, the shape and resolution to be formed and the coherence of a substrate. In more detail, in the case of using a positive photoprotective layer, a suspension or paste of the photoprotective and irafito layer is first manufactured. Next, the suspension is coated on the inner surface of a
REF: 24951 cathode ray tube panel, a shadow mask is provided and then the suspension is exposed and revealed to form a black matrix geometric figure. However, in the case of using a negative photoprotective layer, if the same method is used as in the case of the positive photoprotective layer, the geometric figure of black matrix can be formed in the portion where the geometric figures of phosphorus are removed to form. Therefore, a process different from that which uses a positive photoprotective layer to form the geometrical form of the black matrix must be adopted. In other words, a negative photoprotective layer composition containing no graphite is coated on the inner surface of a CRT (cathode ray tube) panel and then exposed and developed to form a resin geometric figure in the portions exposed in FIG. where the geometric figures of phosphorus are going to form. The graphite is coated on the surface formed with the geometric figure of resin and then the geometric figure of resin is attacked with sulfuric acid, to form by this the geometric figure of the black matrix. The negative photoprotective layer composition contains a photo-curable polymer resin and a photosensitive agent dissolved in an organic solvent. As the photosensitive agent, a salt of sodium 4-4'-diazido-2,2'-stilbenedisulfonate (DAS) is used primarily. The photosensitive agent is sensitive to light and functions as a crosslinking agent. If the negative photoprotective layer is coated and then light is irradiated for a predetermined time, the photoprotective layer is cured by the crosslinking reaction of the polymer with the photosensitive agent. Here, in order to reduce the time of the lithographic process, it is necessary to shorten the exposure time. For this purpose, it is necessary to reveal a photoprotective layer that has excellent photoreactivity.
BRIEF DESCRIPTION OF THE INVENTION It is an object of the present invention to provide a photoprotective layer composition having excellent photoreactivity, to provide a sufficient crosslinking reaction in a short exposure time, which makes it easy for the photoprotective layer composition to go to a lithographic procedure. To carry out the object of the present invention, a photoprotective layer composition containing a photo-curable polymer and a photosensitive agent is provided., wherein the photosensitive agent comprises at least two compounds selected from the group consisting of sodium 4,4'-diazido-2,2'-stilbenedisulfonate salt, disodium disulfonate salt of 4,4'-diazo-2 , 2'-dibenzalketone, disodium salt of 2,5-bis (4-azido-2-sulfobenzylidene) cyclopentanone and sulfonate salt of 4,4'-diazido-2,2'-dicinamylidene ketone. Preferably, the content of the photosensitive agent is 1-20% by weight based on the weight of the photo-curable polymer.
BRIEF DESCRIPTION OF THE DRAWINGS The above objects and advantages of the present invention will become more apparent when describing in detail preferred embodiments thereof, with reference to the accompanying drawings in which: Figure 1 is a graph showing peaks of light absorbed by the widely adopted photosensitive agents and the peaks of light radiated from a mercury lamp.
DETAILED DESCRIPTION OF THE INVENTION In order to solve the problems caused by using a single photosensitive agent, which requires a long exposure time, various classes of photosensitive agents are used in combination in the present invention. The photosensitive agent adopts a mixture of at least two compounds selected from the group consisting of sodium 4,4'-diazido-2,2'-stilbenedisulfonate (DAS) salt, 4,4'-disulfonate disodium salt. diazo-2,2'-dibenzalacetone (DAB), disodium salt of 2,5-bis (4-azido-2-sulfobenzilidene) cyclopentanone (DAP) or sulfonate salt of 4,4, -diazido-2,2 ' -dicinamilidenaceto-na (DACA). Figure 1 is a graph showing the peaks of the light absorbed by the photosensitive agents mentioned above and the peaks of the irradiated light of a mercury lamp. In Figure 1, the curves a, b and c indicate the absorption of light from the DAS, DAB and DAP salts which have the different wavelength regions of light absorption, although the respective absorption capacity of the light It's similar. Also, the four bars indicate the largest peaks of the light radiated from a mercury lamp, where the intensity at the wavelengths of 335 nm, 365 nm and 405 nm are compared to that at the wavelengths of 436 nm. As can be seen from figure 1, the irradiated light from a light source can not be used efficiently with only a photosensitive agent. Therefore, in the present invention, a photoprotective layer composition containing various classes of photosensitive agents is provided to absorb the various wavelength regions, such that the light is efficiently used to shorten the exposure time. In the present invention, there is no special restriction on the photo-curable polymer which can be used for the photoprotective layer composition. However, polyvinyl pyrrolidone or poly (acrylamide-co-diacetone-acrylamide) is preferred. In this case, the weight ratio of the photo-curable polymer and the preferred photosensitive agent will be from 1: 0.01 to 1: 0.20. According to the present invention, it is preferable that the photosensitive agent in the composition of the photoprotective layer is essentially composed of sodium 4,4'-diazido-2,2'-stilbenedisulfonate salt and that it also contains at least one of the other photosensitive agents. In this case, the sodium 4,4'-diazido-2,2'-stilbenedisulfonate salt is preferably 10-90% by weight, based on the total weight of the photosensitive agent. It is also preferable that a metal nitride be included in the photoprotective layer composition according to the present invention. The metal nitride functions as a reducing agent and prevents oxidation of the photo-curable polymer. Thus, if the metal nitride is contained in the photoprotective layer composition, it is possible to solve the problem of the gradual decrease of the viscosity and the sensitivity of the photoprotective layer composition with the passage of time. In the present invention, the content of the metal nitride is preferably 0.1-20% by weight, based on the weight of the photo-curable polymer and more preferably 0.5-5% by weight. If the content of the metal nitride is less than 0.1% by weight, the effect preventing the oxidation of the photo-curable polymer is poor. If the content of the metal nitride is greater than 20% by weight, it is difficult to form a good geometrical figure of the black matrix. As the metal nitride, it is preferable to adopt sodium nitride, potassium nitride, ammonium nitride or magnesium nitride. Hereinafter, the effect of the present invention will be explained in detail with reference to the illustrative examples, but the present invention is not limited thereto.
Example 1 The following ingredients were mixed and stirred for two hours to prepare a photoprotective layer composition.
Composition of photoprotective layer PVP 2.7 g DAS 0.405 g DAB 0.216 g Silane coupling agent (A1120) 0.027 g Pure water 96.68 g
The prepared composition is coated by centrifugation on a 35.5 cm (14 inch) panel and dried to form a thin film and a dot mask of 0.028 is installed thereon and then the thin film is exposed to light for 13 seconds. when using an ultra high pressure mercury lamp. Then, the resulting film is developed with pure water to remove the unexposed portion thereof, to thereby form a geometric figure of resin. Subsequently, the graphite is coated by centrifugation on the panel where the geometric figure of the resin was formed and the resulting structure is dried, immersed in 6% aqueous sulfuric acid for one minute and then developed using pure water under high pressure . As a result of taking a microscopic electronic scanning photograph (SEM) with respect to the panel plane, a strong black matrix of 110 micron points is formed.
EXAMPLE 2 The following ingredients were used in this example and the same procedure was used as in Example 1, except that the exposure was carried out for 11 seconds, to thereby form a strong black matrix of 110 micron points.
Composition of photo-protective canister PVP 2.7 g DAS 0.405 g DAP 0.216 g Silane coupling agent (A1120) 0.027 g Pure water 96.68 g
Example 3 The following ingredients were used in this example and the same procedure as that in Example 1 was carried out, except that the exposure was carried out for 11 seconds, to thereby form a strong black matrix of 110 micron points. .
Composition of photoprotective layer PVP 2.7 g DAS 0.405 g DACA 0.216 g S l ro coupling agent (A1120) 0.027 g Pure water 96.68 g
Example 4 The following ingredients were used in this example and the same procedure was carried out as in Example 1, except that the exposure was carried out for 9 seconds, to thereby form a matrix of black spots of 110 microns.
Composition of photo-protective canister PVP 2-7 g DAS 0.405 g DAB 0.216 g DAP 0.216 g Silane coupling agent (A1120) 0.027 g Pure water 96.464 g
Comparative Example The following ingredients were used in this example and the same procedure was used as in Example 1, except that the exposure was carried out for 10 seconds. As a result of taking a microscopic electronic scanning photograph (SEM) with respect to the plane of the panel, a black matrix was formed that has points of non-uniform size at 60-80 microns. This is because the photoprotective layer was not sufficiently crosslinked (or solidified) during the exposure process, so that a geometric figure of resin having the desired size and shape was not formed. Thus, the black matrix formed during this composition had small, non-uniform points.
Composition of photoprotective layer PVP 2.7 g DAS 0.405 g Silane coupling agent (A1120) 0.027 g Pure water 96.86 g When comparing the examples described above with the comparative example, it is clear that a long exposure time is required to form a black matrix that have the size and shape of desired points in the case of using a single photosensitive agent. As described above, the exposure time can be shortened by adopting a lithographic process using a photoprotective layer composition according to the present invention, thereby improving the performance of the products.
It is noted that in relation to this date, the best method known by the applicant to carry out the aforementioned invention, is the conventional one for the manufacture of the objects to which it relates.
Having described the invention, property is claimed as contained in the following
Claims (8)
- Claims 1. A photoprotective layer composition containing a photo-curable polymer and a photosensitive agent, characterized in that the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2 'salt. Sodium disilphonate, 4,4'-diazo-2,2'-dibenzalacetone disulfide salt, disodium salt of 2,5-bis (4-azido-2-sulfobenzilidene) cyclopentanone and 4-sulfonate salt , 4'-diazido-2,2'-dicinamylideneacetone.
- 2. A photoprotective layer composition according to claim 1, characterized in that the photo-curable polymer is selected from the group consisting of polyvinyl pyrrolidone and poly (acrylamide-co-diacetone-acrylamide).
- 3. A photoprotective layer composition according to claim 1, characterized in that the content of the photosensitive agent is 1 * 20% by weight based on the weight of the photo-curable polymer.
- 4. A photoprotective layer composition according to claim 1, characterized in that the photosensitive agent comprises sodium 4,4'-diazido-2,2-stilbenedisulfonate salt and at least one compound selected from the group consisting of disodium salt of 4,4'-diazo-2,2'-dibenzalacetone disulfonate, disodium salt of 2,5-bis (4-azido-2-sulfobenzilidene) cyclopentanone and sulfonate salt of 4,4'-diazido-2,2 '-dicinnamilidenacetone.
- 5. A photoprotective layer composition according to claim 4, characterized in that the content of sodium 4,4'-diazido-2,2'-stilbenedisulfonate salt is 10 * 00% by weight, based on the total weight of the product. photosensitive agent.
- 6. A photoprotective layer composition according to claim 1, characterized in that it also comprises a metal nitride.
- 7. A photoprotective layer composition according to claim 6, characterized in that the metal nitride is selected from the group consisting of sodium nitride, potassium nitride, ammonium nitride and magnesium nitride.
- 8. A photoprotective layer composition according to claim 6, characterized in that the content of the metal nitride comprises 0.W 20% by weight based on the weight of the photocurable polymer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MX9705346A MX9705346A (en) | 1997-07-15 | 1997-07-15 | Photoresist composition |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR9628854 | 1996-07-16 | ||
| KP96-28854 | 1996-07-16 | ||
| MX9705346A MX9705346A (en) | 1997-07-15 | 1997-07-15 | Photoresist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| MXPA97005346A true MXPA97005346A (en) | 1998-01-01 |
| MX9705346A MX9705346A (en) | 1998-01-31 |
Family
ID=39165632
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX9705346A MX9705346A (en) | 1997-07-15 | 1997-07-15 | Photoresist composition |
Country Status (1)
| Country | Link |
|---|---|
| MX (1) | MX9705346A (en) |
-
1997
- 1997-07-15 MX MX9705346A patent/MX9705346A/en unknown
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