MXPA06011036A - Coating process and apparatus - Google Patents

Abstract

A web coating process and apparatus employing a coating applicator, dryer or curing station and web-handling equipment for conveying the web (14) past the coating applicator and through the dryer. The web (14) is enclosed from at least the coating applicator to the dryer or curing station in a close-coupled enclosure (72) or series of close-coupled enclosures supplied with one or more streams of conditioned gas flowing at a rate sufficient to reduce materially the particle count or change materially a physical property of interest in a close-coupled enclosure.

Description

PROCESS AND APPARATUS OF COATING FIELD OF THE INVENTION This invention relates to coating processes and equipment for treating mobile substrates of indefinite length. BACKGROUND OF THE INVENTION Mobile substrates of indefinite length (ie, movable frames) can be coated in controlled environments when ordinary ambient air conditions could alter the coating process or pose a safety risk. Typical controlled environments include clean spaces and the use of saturated atmospheres or with a low oxygen content, inert. Clean spaces and special atmospheres require expensive auxiliary equipment and large volumes of filtered air or specialty gases. For example, an operation in a clean, typical space may require many thousands of liters per minute of filtered air. Conventional practices for the removal and recovery of components during the drying of coated webs generally utilize drying units or furnaces. The covers or openings of collection are used in both open and closed drying systems to collect solvent vapors emitted from the weft or coating. Vapor collection systems, Ref. 176074, open, conventional, generally use air handling systems that are unable to selectively extract mainly the components in the gas phase, desired, without extracting a significant flow of environmental atmosphere. Closed vapor collection systems typically introduce an inert gas circulation system to assist in purging the enclosed volume. In any system, the introduction of ambient air or inert gas dilutes the concentration of the components of the gas phase. Accordingly, the subsequent separation of the vapors from the diluted vapor stream can be difficult and inefficient. Additionally, the thermodynamic characteristics associated with conventional vapor collection systems often allow undesirable condensation of the vapor in or near the web or coating. The condensate can then fall on the web or coating and adversely affect either the appearance or the functional aspects of the finished product. In industrial environments, the environmental conditions surrounding the process and the processing equipment may include foreign matter. In large volume drying units, foreign matter can be extracted into the collection system by the large volumetric flows of conventional drying systems.

BRIEF DESCRIPTION OF THE INVENTION The disclosed invention includes a process and apparatus for coating a mobile substrate of indefinite length in a controlled environment using low volumes of filtered air or specialty gases. The process and apparatus described utilize a coupled closure receptacle that wraps the moving substrate from at least one coating applicator to a dryer or curing station, the enclosed receptacle for closing is supplied with one or more flowing conditioned gas streams. at a speed sufficient to materially reduce the particle count of the enclosed receptacle for closure. The invention thus provides in one aspect, a process for coating a mobile substrate of undefined length which comprises transporting the substrate once a coating applicator has been passed and to a dryer or curing station in a receptacle coupled for closing or series of interconnected coupled coupling receptacles, while one or more streams of conditioned gas are supplied to the receptacle or series of receptacles which flow at a sufficient rate to materially reduce the particle count (s) in a receptacle coupled for closing. The invention provides in another aspect an apparatus for coating a mobile substrate of undefined length comprising a coating applicator., a dryer or curing station and substrate handling equipment for transporting the substrate once the coating applicator has been passed through and through the curing or drying station, the substrate is wrapped from at least one coating applicator to the dryer or curing station in a coupled receptacle for closing or series of receptacles coupled for closing, supplied with one or more streams of a conditioned gas flowing at a sufficient velocity to materially reduce the particle count (s) in a receptacle coupled for closing. The invention provides in still another aspect a process for coating a mobile substrate of indefinite length which comprises transporting the substrate once a coating applicator has been passed and to a dryer or curing station in a receptacle coupled for closing or a series of interconnected coupled coupling receptacles, while being supplied to the receptacle or series of receptacles with one or more conditioned gas streams flowing at a sufficient rate to cause a change of the material in a physical property of interest to the atmosphere in a receptacle coupled for closing.

The invention provides in yet another aspect, an apparatus for coating a mobile substrate of undefined length comprising a coating applicator, a dryer or curing station, and equipment for handling the substrate for transporting the substrate once it has been passed. the coating applicator and through the dryer or curing station, the substrate is wrapped from at least the coating applicator to the dryer or curing station in a receptacle coupled for closing or series of receptacles coupled for closing supplied with one or more conditioned gas streams flowing at a sufficient rate to cause a change of the material in a physical property of interest to the atmosphere in a receptacle coupled for closure BRIEF DESCRIPTION OF THE FIGURES The foregoing, as well as other advantages of the described invention will come to be evident to those experts in the art from the following and detailed description when considered in view of the accompanying figures, in which: Figure 1 is a schematic side sectional view of a controlled environment coating apparatus, described. Figure 2 is a schematic cross-sectional view of a dryer with holes.

Figure 3 is a schematic side sectional view of a receptacle coupled for closure, described. Figure 4 is a perspective view of a described distribution manifold. Fig. 5 is a partial, partial schematic cross-sectional view of the distribution manifold of Fig. 4 and the associated supply of conditioned gas and gas extraction components. Figure 6 is a schematic cross-sectional view of a transport roller and the distribution manifold. Figure 7 is a schematic side sectional view of another receptacle coupled for closure, described. Figure 8 is a schematic cross-sectional view of the enclosed receptacle for the closure of Figure 7. Figure 9 is a schematic side sectional view of another receptacle coupled for closure, described. Fig. 10 is a schematic plan view of the superimposed control surface in Fig. 9. Fig. 11 is a graph showing the count of particles against pressure in a receptacle coupled for closure, described. Figure 12 is a graph showing the level of oxygen against pressure in a receptacle coupled for closure, described. Figure 13 is a graph showing the count of particles against pressure in a receptacle coupled for closure, described. Figure 14 is a graph showing pressures at varying positions within a receptacle coupled for closure, described. Figure 15 is a graph showing the pressures in various positions inside and outside a conventional oven. Figure 16 is a graph showing the pressure against the height of the weft slot for a receptacle coupled for closure, described. Figure 17 is a graph showing the counts of particles against the height of the weft slot for a receptacle coupled for closure, described. Figure 18 is a graph showing the counting of the particles against the speed of the weft at various pressures for a receptacle coupled for closure, described. Similar reference symbols in the various figures indicate similar elements. The elements in the figures are not to scale. DETAILED DESCRIPTION OF THE INVENTION When used with respect to a moving substrate or an apparatus for coating such substrates, the words "downstream" and "upstream" refer respectively to the direction of movement of the substrate and its opposite direction. When used with respect to an apparatus for coating a moving substrate or a component or station in such an apparatus, the words "front" and "rear" refer respectively to regions in which the substrate is introduced or leaves the apparatus, component or station described. When used with respect to a moving substrate or an apparatus for coating such substrates, the word "width" refers to the length perpendicular to the direction of movement of the substrate and in the plane of the substrate. When used with respect to an apparatus for coating a moving substrate or a component or station in such an apparatus, the phrase "coating applicator" refers to a device that applies a continuous or discontinuous layer of a coating composition to the substrate. . When used with respect to an apparatus for coating a moving substrate or a component or station in such an apparatus, the word "dryer" refers to a device that uses heat or other energy to remove one or more volatile liquids from a coating composition. When used with respect to an enclosed apparatus for coating a moving substrate or a component or station enclosed in such an apparatus, the phrase "appreciable drying" refers to drying sufficient to render a coating detectably less sensitive to contamination of the carried particles. by air. When used with respect to a moving substrate or an apparatus for coating such substrates, the word "solidification" refers to hardening, curing, crosslinking or other alteration in the coating, sufficient to cause an appreciable phase change in at least a portion of the coating. When used with respect to an apparatus for coating a moving substrate or a component or station in such an apparatus, the phrase "curing station" refers to a device employing heat, light, microwave, an electronic beam or other source of energy to effect the solidification of a coating composition. When used with respect to an enclosed apparatus for the coating of a moving substrate or a component or station enclosed in such an apparatus, the phrase "appreciable cure" refers to a cure sufficient to render a coating detectably less sensitive to contamination of the particulate materials carried by the air. When used with respect to an apparatus for coating a moving substrate or a component or station in such an apparatus, the phrase "frame handling equipment" refers to a device or devices that transport the substrate through the apparatus. When used with respect to an enclosed apparatus for coating a moving substrate or a component or station enclosed in such an apparatus, the phrase "control surface" refers to a surface that is generally parallel to a major surface of the substrate and located sufficiently close to the substrate so that an atmosphere that can affect the quality of the coating is present between the control surface and the substrate. A control surface may include, for example, a receptacle housing, a separate plate, the walls of a groove, or another surface having an appreciable area generally parallel to the main surface of the substrate. When used with respect to an enclosed apparatus for the coating of one or both sides of a moving substrate or an enclosed component or station, in such an apparatus, the word "upper space" refers to the distance from the substrate with respect to a Near control surface measured on the coated side perpendicular to the substrate. When used with respect to an enclosed apparatus for coating one side of a moving substrate or a component or station enclosed in such an apparatus, the word "lower space" refers to the distance from the substrate to a nearby control surface, measured on the uncoated side perpendicular to the substrate. When used with respect to an enclosed apparatus for coating a moving substrate or a component or station enclosed in such an apparatus, the phrase "receptacle coupled for closure" refers to a receptacle whose average top space plus the average bottom end-to-end space of the receptacle is not greater than about 30 cm and which at its upstream or downstream end is sealed with with respect to the substrate or connected to a box, enclosed component, enclosed station or other receptacle. When used with respect to an enclosed apparatus for coating one side of a moving substrate or a component or station enclosed in such an apparatus, the word "overlay" refers to an apparatus, component or station on the coated or going side. to be coated on the substrate. When used with respect to an enclosed apparatus for coating one side of a moving substrate or a component or station enclosed in such an apparatus, the word "underlying" refers to an apparatus, component or station on the uncoated side of the substrate. . When used with respect to an enclosed apparatus for coating a moving substrate or a component or station enclosed in such an apparatus, the phrase "conditioned gas" refers to a gas that is different from the ambient air surrounding the apparatus in at least a property of interest. When used with respect to an enclosed apparatus for the coating of a moving substrate or a component or station enclosed in such an apparatus, the phrase "particle count" refers to the number of particles of 0. 5 μm or larger in a volume of 28.3 liters. When used with respect to a physical property of interest (eg, particle counting) for the atmosphere in a device enclosed for the coating of a moving substrate or a component or station enclosed in such an apparatus, the word "material" is used. refers to at least a 50% reduction or increase in the property of interest compared to the ambient air surrounding the apparatus, component or station. When used with respect to an enclosed apparatus for coating a moving substrate or a component or station enclosed in such an apparatus, the phrase "negative pressure" refers to a pressure below that of the ambient air surrounding the apparatus, component or station, and the phrase "positive pressure" refers to a pressure above that of the ambient air surrounding the apparatus, component or station. When used with respect to an apparatus for coating a moving substrate or a component or station in such an apparatus, the phrase "pressure gradient" refers to a difference in pressure between an interior portion of the apparatus, component or station and that of the ambient air surrounding the apparatus, component or station. A line of the weft 1 employs an end-to-end implementation, close to the receptacle coupled for closure as shown in Figure 1. The unwinding reel 10 and the reel spool 154 are located within the boxes 12 and 156 Boxes 12 and 156 typically do not benefit from the use of a receptacle coupled for closure, and instead desirably have sufficient space and a non-clustered interior to accommodate the coated or uncoated web rolls and to allow transportation and the change of a roller, in a facilitated way. Boxes 12 and 156 can be non-ventilated, ventilated with ambient air, or provided with a suitable gas conditioning stream when desirable. The uncoated web 14 passes from the unwinding reel 10 on the transport roller 16 and towards a first receptacle coupled for the closure 18 whose operation is explained in greater detail later. The receptacle 18 coupled for the closure includes an underlying control surface 20 and the superimposed control surface 22 which each lie in close proximity to the major surfaces of the weft 14. The weft 14 then passes to the cleaning apparatus 24 of the plot. Apparatus 24 can employ any of a variety of methods that will be familiar to those skilled in the art (eg, plasma treatment or rollers that provide adhesion) to remove unwanted debris, surface oils or other contaminants from at least a surface of the weft 14. The apparatus 24 can be non-ventilated or supplied with a suitable gas-conditioning stream, as desired. In the latter case, the conditioned gas can flow upstream or downstream into nearby receptacles. The web 14 then passes from the cleaning apparatus 24 through a second receptacle 28 coupled for the closure whose underlying control surface 30 and the superimposed control surface 32 lie in close proximity to the major surfaces of the web 14, and to the primer apparatus 34. The primer apparatus 34 may employ any of a variety of methods that will be familiar to those skilled in the art (e.g., treatment with a crown arc) to fabricate at least one surface of the weft 14 that is receptive to a coating applied consecutively. The apparatus 34 can be non-ventilated or provided with a suitable gas conditioning stream, as desired. In the latter case, the conditioned gas can flow upstream or downstream into the nearby receptacles. The weft cleaned and treated with a corona arc 14 then passes from the treatment apparatus with a crown arc 34 through the third receptacle 38 engaged for closingwhose underlying control surface 40 and the superimposed control surface 42 lie in close proximity to the main surfaces of the weft 14. The receptacle 38 coupled for closure can be supplied with a stream of conditioned gas 44 flowing towards it. receptacle 38 coupled for closing through the downstream inlet 46 and exits through the upstream outlet 48. The conditioned gas stream 44 differs from the ambient air in at least one property of interest, eg, a different chemical composition due to the absence or presence of one or more gases (including humidity), a different particle count (for example, lower), or a different temperature. For example, the humidifier / dehumidifier 45 may be used to alter the moisture content of the conditioned gas stream 44 and to add or remove moisture to or from the web 14. The web 14 is then moved once it has been moved. past seal 52 and into a fourth receptacle 54 engaged for closure. The receptacle 54 coupled for closure is in part joined by the seal 52, the backing roller 56 and the upper and lower clamshell-shaped housings 58, 60, whereby they form a die receptacle system. Additional details regarding the die receptacle systems can be found in U.S. Pat. No. 6,117,237 (Yapel et al.), The description of which is incorporated herein for reference. The coating die 62 applies one or more layers of coating material 64 to one main side of the weft 14. The other main side of the weave 14 contacts the backing roller 56. The backing roller 56 can be heated using an appropriate temperature control system (not shown in Figure 1), to provide, for example, the improved quality of the applied coating or an improved control of the solidification. The receptacle 54 coupled for closing is supplied with a stream of conditioned gas 66, 68. The use of a vacuum (not shown in Figure 1) upstream from the coating die 62 in addition to the gas-conditioning stream 66, can help stabilize the applied coating. An inspection or measurement station 70 located downstream of the cover die 62 (for example, at or near the trailing edge of the back housing 60) may be in the form of a transparent observation window and a lighting device for the operator to check the quality of the coating, or it can be a number of other devices or instruments that will be familiar to those skilled in the art. Following the deposition of the coating, the coating will undergo wetting, dispersion and eventual solidification. The solidification can be brought about, for example, by the measurements including cooling, heating, reaction, or drying. Proper control of these processes and the way to avoid contamination or alteration of the coating can be facilitated by the use of one or more additional coupled receptacles for closure. For example, the web 14 can pass from the backing roller 56 to the transport roller 77 by means of a fifth receptacle 72 coupled for closing, whose underlying control surface 74 and the superimposed control surface 76 lie in a close proximity. with respect to the main surfaces of the frame 14 in an arrangement with gaps, "flat". The coupled receptacle for closing 72 may be provided with a separate, conditioned gas stream (not shown in Figure 1) flowing toward the receptacle coupled for closing 72 through an inlet (not shown in Figure 1). A separate, conditioned gas stream may not be necessary in a receptacle coupled for closure 72. For example, the receptacle coupled for closure 72 may simply receive a portion of the conditioned gas stream 68 that moves between the weft. and the housing 60 in the direction of movement of the weft 14. The receptacle engaged for the closure 72 may be, for example, a leveling zone that allows a non-uniformly applied coating to disperse and self-level. Operating conditions in such a leveling zone will typically be set to minimize the drying rate by minimizing the transfer of the mass from the coating surface to the enclosed receptacle for the surrounding closure (e.g., by the control of the speed of the conditioned gas, the humidity or the temperature). This acts to keep the viscosity of the coating low and provides assistance in leveling the disuniformities in the coated film. In some processes, it may be desirable to carry out the solidification as quickly as possible before flow-induced disuniformities can be formed. In such processes, the operating conditions of the enclosed receptacle area for closing downstream of the coating apparatus can be set for high drying rates. The receptacle 72 coupled for the closure can also be configured to add an additional component or layer to the coating, or to provide a dry environment that can discourage the formation of "bluish color" in the coating. Additional controlled drying or recovery of the solvent can be effected using the sixth and seventh enclosed coupling receptacles 78, 84, whose respective underlying control surfaces 80, 86, and superimposed control surfaces 82, 88, lie in close proximity. with the main surfaces of the web 14. The enclosed receptacles for the closure 78, 84 may be hollow drying systems such as those described in US Pat. Nos. 4,980,697, 5,581,905, 5,694,701, 5,813,133, 6,047,151 and 6,134,808. When the receptacles coupled for closure 78, 84, are drying systems with holes, then condensed solvent streams 90, 92, can be collected at the lower ends of the receptacles coupled for closure 78, 84. Figure 2 shows a schematic cross-sectional view of the hole dryer 200. The dryer 200 has a hot plate 202 and a cold plate 204 separated by a small gap G. The web 206 carrying the coating 208 can be dried by passing it over the hot plate 202 which supplies energy to evaporate the solvents of the coating 208. The cold plate 204 provides a driving force for the condensation and transport of the solvent vapor through the gap G. The cold plate 204 is provided with a structured surface 210 (e.g. , with notches) that prevents the condensed solvent liquid from dripping backwards on the coated surface. Instead, the streams of condensed solvents 212 are "pumped" out of the cold plate 204 and into the collection trays 214, which can be connected to a solvent recovery system (not shown in Figure 2). Accordingly, both drying and recovery of solvents can occur simultaneously when the web 206 is transported through the gap G. The transport of a web through a vacuum drying system can be facilitated by employing the floating of the web. the rounded plate as described in the US patent No. 6,511,708 (Kolb et al.). Filtering the weft onto the rounded plates can provide a scratch-free and controllable system for supporting and heating a moving substrate while minimizing (eg, up to 4 mm or less) the lower space. Referring again to Figure 1, the weft 14 leaves the closure 84 engaged for closure and passes from the transport roller 94 to the transport roller 116 by means of the conventional drying oven 96 where the heat is transferred to the weft. and the solidification of its coating can be effected, for example, by one or more of the convection, conduction or radiation. If desired, the multiple temperature zones and controls may be employed in a furnace 96 to enable the synchronized temperature adjustment of the web 14 and its coating. The web 14 then passes through a transition zone in the form of an eighth receptacle coupled for closure 98. The receptacle coupled for closure 98 has an underlying control surface 100 and an overlapping control surface 102 that lie in close proximity to the main surfaces of the frame 14 in an arrangement of flat holes. The weft 14 leaves the receptacle coupled for closure 98 and passes over the transport roller 116. Some coated substrates require drying, curing or a combination of both drying and curing. Curing can be effected using a variety of mechanisms and curing stations that will be familiar to those skilled in the art (e.g., using UV radiation to cure a coating composition at 100% solids or carrying a solvent (e.g. , transported by water)). Curing may be effected in a ninth enclosed closure receptacle 120 whose underlying control surface 122 and superimposed control surface 124 lie in close proximity to the main surfaces of the weft 14. UV lamps 126 are integrated at the superimposed control surface 124. If required, the receptacle coupled for the closure 120 can be supplied with an inert gas stream 128 through the inlet 130. If required, the temperature control during curing can be performed by appropriate selection or control of the heat transfer properties of the components in the coupled receptacle for closure 120 such as the underlying control surface 122. Curing may also be carried out prior to drying in a oven 96 or in other locations within the process of handling the described plot, or, depending on the nature of the composition of the coverage, distributed completely. The drying could similarly depend on the nature of the coating composition, which is to be completely distributed. The web 14 then passes over the transport rollers 132, 144, through a tenth coupling receptacle for the closure 134 whose underlying control surface 136 and the superimposed control surface 138 lie in close proximity to the main surfaces of the frame 14. A light source 140 and a camera or measuring instrument 142 (or other measuring or inspection devices that will be familiar to those skilled in the art) are respectively integrated into the underlying control surface 136 and the superimposed control surface 138. The weft 14 can be passed over the transport rollers 144, 152, through an eleventh coupled closure receptacle 146 whose underlying control surface 148 and the superimposed control surface 150 lie in close proximity to the major surfaces of the frame 14. The enclosed receptacle for the closure 146 can serve as a balance zone for adjusting the web 14 and its solidified coating to one or more desirable conditions (eg, temperature, humidity or web tension) prior to the formation of the roller in the winding reel 154. The process and apparatus described do not need employing all of the enclosed receptacles for closure shown in Figure 1, and can employ different processes or receptacles coupled for closure than those shown or more receptacles or processes coupled to the closure than those shown. Two or more of the enclosed coupling receptacles, described, can be interconnected in series in a frame process whereby multiple successive zones or applications are created. Each receptacle coupled for the closure, individual, can be operated at different pressures, temperatures and gaps of the upper space or the lower space to solve the variants of process and materials. The individual enclosed receptacles for closing can have none, one or more than one inlet for the conditioned gas or gas removal devices. A positive pressure could be maintained or established in some receptacles coupled for closing and a negative pressure in other receptacles coupled for closing. The use of coupled, interconnected closure receptacles is recommending from at least the point of application of the coating (e.g., from the trailing edge of the rim). of coating when a coating die is employed) to at least one station in which appreciable drying or appreciable curing occurs. Such interconnection can provide a continuous protection that can discourage contamination of the non-solidified coating and facilitate control of particle counting in the atmosphere immediately surrounding the coated substrate while using only small volumes of conditioned gases. Additional control of the coating conditions can be achieved by employing a receptacle coupled for closing from at least the point of application of the coating through at least one station in which appreciable drying or appreciable curing occurs. Additional control of the coating conditions can be achieved by employing a receptacle coupled for closing from at least the point of application of the coating to at least the drying or curing station in the process. Additional control can also be achieved by employing a receptacle coupled for closing from a pre-coating station (e.g., a cleaning or priming station) to the point of coating application. In an exemplary embodiment, the coated substrate is not exposed to ambient air from at least the time in which the coating is applied until after the coating has solidified. The apparatus described may also include one or more sections that do not represent a receptacle coupled for closure, but desirably the number, total volume and gas flow configurations of such sections is such that undesirable contamination of the substrate does not arise.

If desired, the conditioned gas streams could be injected (or the gas could be extracted) into a greater or lesser number of locations along the line of the grid 1 that are shown in figure 1. In an exemplary embodiment , a stream of conditioned gas could be injected into the first of several interconnecting closed coupling receptacles, and the conditioned gas could be carried in the company of the mobile substrate to the receptacles coupled for downstream closure or pushed to a receptacle or process Upstream. In another exemplary embodiment, the conditioned gas streams could be injected anywhere that is necessary to maintain or establish a light positive pressure in each of several interlocked coupled coupling receptacles. In yet another exemplary embodiment, the conditioned gas streams could be injected where necessary to maintain or establish a light positive pressure in some of the various coupled, interconnected receptacles, and a zero pressure or a light negative pressure could be maintained or established in other receptacles coupled for closure, interconnected. In yet another exemplary embodiment, the conditioned gas streams could be injected into each of several interlocked coupled coupling receptacles.

A clean space could optionally surround the line of the plot 1. However, this could be a much lower classification and a volume much smaller than that which could be used typically in our days. For example, the clean room could be a portable model that uses flexible hanging panel materials. Such a clean room could be used in addition to, or in place of, boxes 12 and 156 in Figure 1. Those skilled in the art will appreciate that the described apparatus could easily be adapted to coat both major surfaces of a moving substrate. Those skilled in the art will also appreciate that a variety of coating devices can be used, including roller coaters, slide coaters, submersion coaters, spray coaters, fluid-bearing coaters and the like. Also, a variety of frame support systems that will be familiar to those skilled in the art can be employed in the described process and apparatus, including porous pneumatic tubes, pneumatic bars, and pneumatic blades. In addition to, or in lieu of, the cleaning or priming operations shown in Figure 1, a variety of other drying converting operations can be employed in the described apparatus and processes, such as the dry conversion operations described in the application. of US patent copendiente No. (proxy registration number 55752US019), filed on the same date with the same and entitled "DRY CONVERTING PROCESS AND APPARATUS". In one embodiment of the described process, a mobile substrate of undefined length has at least one major surface with an adjacent gas phase. The substrate is treated with an apparatus having a control surface in close proximity to a surface of the substrate to define a control gap between the substrate and the control surface. The control gap can be referred to as the "top space" for a control gap between a coated (or to be coated) side of a substrate and a control surface, and as the "bottom space" for a gap of control between an uncoated side of a substrate and a control surface. A first chamber can be placed near a control surface, with the first chamber having a gas introduction device. A second chamber can be placed close to a control surface, the second chamber has a gas extraction device. The control surface and the chambers together define a region where the adjacent gas phases have a mass amount. At least a portion of the mass of the adjacent gas phases is conveyed through the gas removal device by the induction of a flow through the region. The mass flow can be segmented into the following components: Ml means the average mass flow over time, net, total, per unit width of the substrate inside or outside the region that results from the pressure gradients, MI 'means the net, total, mass, average time of a gas per unit width in the region through the first chamber from the gas introduction device, M2 means the average mass flow over time of the conditioned gas per unit width from or to at least one major surface of the substrate or coating, to or from the region, M3 means the net mass flow over time, net, total, per unit width in the region resulting from the movement of the material, and M4 means the average speed over time of mass transport through the gas removal device per unit width, where "average mass flow over time" is represented by the equation MI - - [measure, where MI is the average mass flow in time in kg / second, t is the time in seconds, and mi is the instantaneous mass flow in kg / second. The mass flow in the gas phase is represented by the equation: Ml + MI '+ M2 + M3 = M4 (Equation A). Ml, MI ', M2, M3 and M4 are further illustrated in Figure 3. Figure 3 is a schematic side sectional view of a receptacle coupled for closure 300. A substrate 312 has at least one major surface 314 with one phase adjacent gas (not shown in Figure 3). The substrate 312 is moving in the direction of the arrow "V" under a control surface 315, thus defining a control gap "Gc". A first chamber 317 having a gas introduction device 318 is positioned near the control surface 315. The exact shape of the gas introduction device 318 may vary, and devices such as a gas-operated blade, a curtain gas, or a gas collector, can be used. Although the illustrated embodiment shows the first chamber 317 in the form of a plenum chamber, it is not necessary for the gas introduction device 318 to be positioned to remove it from the level of the control surface 315. A second chamber 319 is also placed close by. of the control surface 315, and has a gas extraction device 320. Again, although the embodiment illustrated shows the second chamber 319 in the form of a plenum chamber, it is not necessary for the gas extraction device 320 to be placed at the level of the control surface 315. In an exemplary embodiment, the first chamber 317 and the second chamber 319 will be at opposite ends of the control surface 315 as shown in Figure 3. The first chamber 317 defines a first recess Gl between the first chamber 317 and the substrate 312. The second chamber 319 defines a second gap G2 between the second chamber 319 and the substrate 312. In some embodiments, the The first recess Gl, the second recess G2, and the control recess Gc are all of equal height, however in other embodiments, at least one of the first recess Gl or the second recess G2 has a different height than the control recess Gc. The best results seem to be achieved when the first gap, the second gap and the control gap are all 10 cm or smaller. In some exemplary embodiments, the first gap, the second gap, and the control gap are all 5 cm or less, 3 cm or less, or even smaller values, for example, 2 cm or less, 1.5 cm or less, or 0.75 cm or smaller. The flow of air required to achieve a desirable low particle count may vary in part with the square of the upper space and the lower space combined, and accordingly, the holes described desirably have relatively small values. Similarly, the best results appear to be achieved when the total of the average upper space and the lower average space is 10 cm or less, 5 cm or less, 3 cm or less, or even smaller values, for example 2 cm or smaller, 1.5 cm or smaller, or 0.75 cm or smaller. In addition to the gaps Gc, Gl and G2, the dilution of the vapor component can also be minimized using the mechanical characteristics, such as extensions 323 and 325 in FIG. 3. Extensions 323 and 325, which have gaps G3 and G4, can be added to one or both of the ends upstream or downstream of the apparatus. Those skilled in the art will recognize that the extensions can be attached to the various elements of the apparatus or provided with alternative forms depending on the specific modality selected for a particular purpose. The dilution will generally be reduced as the area of the substrate "covered" by the increments of the extensions. The adjacent gas phase between the control surface 315, the first chamber 317, the second chamber 319 and the surface 314 of the substrate 312 define a region having a mass amount. Extensions 323 and 325 may further define the region under the control surface that has an adjacent gas phase that has a mass amount. The mass in the region is generally in a gas phase. However, those skilled in the art will recognize that the region may also contain a mass that is either in the liquid or solid phase, or combinations of all three phases. Figure 3 shows the various flow streams found in the receptacle coupled for closing 300 when the described process is practiced. Ml is the mass flow average in time, net, total, per unit width inside or outside the region that results from pressure gradients. Ml is a designated number, negative when it represents a small external flow from the region shown in the figure, and positive when it represents a small internal flow in the region, opposite to the arrows shown. The positive values of Ml essentially represent a dilution stream and the possible source of contaminants which desirably are reduced and more desirably become negative for the total portion of the apparatus which constitutes interconnected coupled coupling receptacles. MI 'is the net, total, average, mass flow of the conditioned gas per unit width within the region of the gas introduction device 318. If it is brought to a sufficient level, MI' reduces the particle count in the receptacle coupled for closing. MI 'can provide sufficient improvement in the cleaning of the main surface 314 so that the dilution Ml' involved can be tolerated. Excessively high MI 'flows are desirably avoided to limit the alteration of coating 314. M2 is the average mass flow over time per unit width from or to at least one major surface of the substrate or coating within the region and through the camera. M2 essentially represents the evolution of the solvent or other material in the receptacle 300 coupled for closure. M3 is the mass flow average in time, net, total, per unit width within the region and through the chamber, which results from the movement of the substrate. M3 essentially represents the gas displaced in the company of the substrate in its movement. M4 is the average speed in time of the mass transported per unit width through the gas removal device 320. M4 represents the sum of Ml + MI '+ M2 + M3. Mass flow through a receptacle coupled for closure can be aided by employing a suitable seal with respect to the moving substrate (i.e., a "mobile substrate seal") at an upstream or downstream inlet or outlet of a coupled receptacle for the closure or a connected chain of the receptacles coupled for closing. The seal can function as a sweeping element to prevent gas from entering or exiting the enclosed receptacles for closing. A coating head can provide an integrated liquid seal wherein the coating edge contacts the substrate. The seal could also include for example a forced seal with gas, a mechanical seal or a retractable mechanical seal such as those shown in U.S. Pat. No. 6,553,689, or a pair of opposed compression rolls. A retracted mechanical sealing mechanism can allow the passage of fairly thick coatings, joints and other adjustment conditions. It may be desirable to briefly increase one or more of the flow velocities of the next conditioned gas (or reduce or change one or more of the near gas extraction rates) to maintain the desired atmosphere near the seal. A pair of opposed compression rollers may be located, for example, upstream of the coating device or downstream from the point at which the coating has solidified to support (or benefit from) compression of the compression rollers. By using a control surface in close proximity to the surface of the substrate, a supply of conditioned gas and a positive or negative pressure gradient, a reduction in the particle count of the material can be obtained within a receptacle coupled for closure. The pressure gradient,? P, is defined as the difference between the pressure in the lower periphery of the chamber, ie, and the external pressure of the chamber, po, where? P = pe. Through appropriate use of the conditioned gas and adjustment of the pressure gradient, the reductions in particle count of, for example, 50% or more, 75% or more, 90% or more or even 99% or more, can be achieved. An exemplary pressure gradient is at least about -0.5 Pa or higher (i.e., a more positive value). Another exemplary pressure gradient is a positive pressure gradient. As a general guide, larger pressures can be tolerated at higher speeds of the moving substrate. Larger pressures may also be tolerated when the seals of the moving substrate are used at the upstream and downstream ends of a series of interconnected coupled coupling receptacles. Those skilled in the art will appreciate that the pressure (s) of the enclosed receptacle for closure can (are) be adjusted based on these and other factors to provide a desirably low particle count within the appropriate portions. of the disclosed apparatus while preventing undue alteration in the non-solidified coating. The described process and apparatus can also substantially reduce the flow of dilution gas, MI, transported through the chamber. The described process and apparatus can limit, for example, Ml to an absolute value no greater than 0.25 kg / second / meter. Ml can be, for example, less than zero (in other words, representative of the net external flow of the receptacle coupled for closing) and greater than -0.25 kg / second / meter. In another exemplary embodiment, Ml can be less than zero and greater than -0.1 kg / second / meter. As shown in the previous examples, small negative reservoir pressures (which may correspond to light positive Ml fluxes) may be tolerated. However, large negative receptacle pressures (which may correspond to large, positive Ml fluxes) can cause adverse effects including dilution of the mass in the adjacent gas phase, introduction of airborne particles and other pollutants, and the introduction of uncontrolled ingredients, temperatures or humidity. In an exemplary embodiment, a process is controlled by appropriately controlling MI 'and M4. A deliberate inflow of a conditioned gas stream (eg, an inert, clean gas, having a controlled humidity) can materially promote a controlled, clean atmosphere in the enclosed receptacle for closure without unduly increasing the dilution. Carefully controlling the volume and conditions under which MI 'is introduced and M4 is removed (and for example by maintaining a light positive pressure in the enclosed receptacle for closing), the flow Ml can be significantly reduced and the particle count of the receptacle coupled for closure can be significantly reduced. Additionally, the MI 'stream may contain reactive components or other components or at least optionally some recycled M4 components. The close proximity of the control surfaces in the receptacle coupled for closure with respect to the main surfaces of the substrate, and the relatively small pressure gradient, make it possible to transport the mass in the adjacent gas phase through the coupled receptacle to the closure with a minimum dilution. Therefore, lower flow rates at higher concentrations can be transported and collected. The described process is also suitable for transport and collection of relatively small amounts of mass located in the adjacent gas phase. The upper space or the lower space may be substantially uniform from the upstream end to the downstream end and through the width of the receptacle coupled for closure. The upper space or the lower space can also be varied or they can be non-uniform for specific applications. The enclosed receptacle for closing can have a wider width than the substrate and desirably will have closed sides which further reduce the average mass flow over time per unit width of the pressure gradients (Ml). The coupled receptacle for the closure can also be designed to conform to surfaces of the material of different geometry. For example, the receptacle coupled for closing may have a rounded periphery to conform to the surface of a cylinder. The enclosed receptacle for closing may also include one or more mechanisms for controlling the phase of the mass transported through the enclosed receptacle for closure thereby controlling the phase change of the components in the mass. For example, conventional temperature control devices may be incorporated in the enclosed receptacle for closure to prevent condensate from forming on the internal portions of the enclosed receptacle for closure. This can help to discourage the formation of blue color in the solidified coating. Non-limiting examples of suitable temperature control devices include heating coils, electric heaters, external heat sources and fluids for heat transfer. Optionally, depending on the composition of the gas phase, the extracted gas stream (M4) can be vented or filtered and vented after leaving the enclosed receptacle for closing. The described process can be used for the continuous collection of a gaseous phase composition. The gas phase composition can flow from one or more of the receptacles coupled for closure to a subsequent processing location, for example, without dilution. Subsequent processing may include optional steps such as, for example, the separation or destruction of one or more components in the gas phase. The vapor stream collected can also contain a mixture in liquid phase or particulate material that can be filtered prior to the separation process. The separation processing may also occur internally within the enclosed receptacle for closure in a controlled manner. Suitable separation processes will be familiar to those skilled in the art and include the concentration of the vapor composition in the gas stream; the direct condensation of the vapor composition diluted in the gas stream; the direct condensation of the concentrated vapor composition in the gas stream; direct condensation of two stages; the absorption of the vapor composition diluted in the gas stream using activated carbon or a synthetic absorption medium; the absorption of the vapor composition concentrated in the gas stream using activated carbon or a synthetic absorption medium; the absorption of the vapor phase component diluted in the gas stream using a medium with high absorbing properties; and the absorption of the vapor phase component, concentrate, into the gas stream using a medium with high absorbing properties. The high concentration and low volumetric flows of the vapor composition improve the overall efficiency of conventional separation practices. For example, at least a portion of the vapor component can be captured at sufficiently high concentrations to allow subsequent separation of the vapor component at a temperature of 0 ° C or higher. This temperature prevents the formation of frost during the separation process, and can provide advantages for both the equipment and the process. Suitable destruction processes will also be familiar to those skilled in the art and include conventional devices such as thermal oxidation devices. Depending on the composition of the specific gas phase, the receptacle coupled for closure may optionally include flame arrest capabilities. A flame arresting device positioned internally within the enclosed receptacle for closure allows gases to pass through, but extinguish, flames to prevent a large scale fire or explosion. A flame is a volume of gas in which an exothermic (self-sustaining) exothermic chemical reaction occurs. Flame arrest devices are generally necessary when the operating environment includes oxygen, elevated temperatures and a flammable gas mixed with oxygen in suitable proportions to create a combustible mixture. A flame arrest device works to remove one of the indicated elements. In an exemplary embodiment, the components of the gas phase pass through a narrow gap limited by heat-absorbing materials. The size of both the hole and the material depend on the specific composition of the steam. For example, the chamber can be filled with a heat-absorbing, expanded metal material, such as, for example, aluminum, contained in the lower part by a fine-mesh metal net with mesh openings sized according to the standards of the National Fire Protection Association. Optional separation devices and transport equipment that can be used in the described process and apparatus may also possess flame arrest capabilities. Those skilled in the art will be familiar with the proper flame arrest devices and techniques for use with such devices and equipment. Representative articles that can be made using the disclosed process and apparatus include, for example, coatings containing polymers, pigments, ceramics or pastes. The substrate can be, for example, a polymer, a woven or non-woven material, fibers, powder, paper, a food product, a pharmaceutical product or combinations thereof. The coating may include at least one evaporative component or it may be a coating composition at 100% solids. If present, the evaporative component can be any liquid or solid composition that is capable of vaporizing and separating from the coated substrate. Non-limiting examples could include organic compounds and inorganic compounds or combinations thereof, such as water or ethanol. Sufficient energy is supplied to the article to evaporate at least one evaporative component or to cure the coating, or both. The energy supplied may involve radiation, conduction, convection or combinations thereof. Heating by conduction, for example, could include passing the substrate or coating in close proximity with a flat hot plate, a curved hot plate or partially winding the substrate around a hot cylinder. Examples of convective heating may include directing hot air by means of nozzles, a spout or a plenum in the article. Electromagnetic radiation such as radiofrequency, microwaves, or infrared rays can be directed towards the substrate or coating and absorbed causing internal heating. The energy can be supplied to any or all surfaces of the substrate or coating. Additionally, the substrate or coating may be provided with sufficient internal energy, for example, a pre-heated substrate or an exothermic chemical reaction occurring in the substrate or coating. The various energy sources can be used individually or in combination. Those skilled in the art will recognize that the described energy can be supplied from a variety of sources, including electricity, fuel combustion, and other thermal sources. The energy can be supplied directly to the point of application, or indirectly through hot liquids such as water or oil, hot gases such as air or an inert gas or hot vapors such as steam or conventional heat transfer fluids. The total mass flow (M4) through the coupled receptacle for closure can be selected to equal or exceed the generation rate of the gas phase components from the substrate or coating (M2). This can help prevent either dilution or loss of steam components.

It is desirable to avoid air flow configurations that could alter the uncured coating and cause "mottling" or other defects. Figure 4 is a perspective view of a distribution manifold 400 described that can help to provide a uniform flow of the supplied conditioned gas (MI '). The manifold 400 has a housing 402, and mounting projections 404 that flank the slot 406. Additional details with respect to the manifold 400 are shown in FIG. 5, which is a partial, schematic cross-sectional view of the manifold 400. and an associated gas conditioning system. The gas source 502 supplies a suitable gas (eg, nitrogen or an inert gas) to a gas conditioning system 508 via line 504 and valve 506. The system 508 is optionally supplied with additional reactive species by means of of lines 510, 512 and 514 and valves 511, 513, and 515. System 508 supplies the desired conditioned gas stream to manifold 400 via line 520, valve 516 and flow sensor 518. The vacuum line 522 can be used to extract the gas from the manifold 400 by means of the flow sensor 524, the valve 526 and the vacuum pump 528. The presence of both a supply line and a vacuum line makes it possible for the manifold 400 is used as a device for introducing the conditioned gas or extracting the gas.

The gases that are introduced into the manifold 400 pass through the headspace 520, around the diverter plate 532, and through the distribution means 534 (made, for example, using a SCOTCHBRITE ™ nonwoven fabric, commercially available from 3M Co. ), and then passes them through a first perforated plate 536, the HEPA filter media 538 and a second perforated plate 540 before being inserted into the slot 406. The seal 542 helps to maintain a seal between the projections 404 and the perforated plate 540. The manifold 400 can help provide a substantially uniform flow of conditioned gas supplied through the width of a coupled receptacle for closure. The pressure drop laterally in the head space 520 is negligible in comparison to the pressure drop across the remaining components of the manifold 400. Those skilled in the art will appreciate that the dimensions or shape of the head space 520 and the pore size of the distribution means 534 may be adjusted as necessary to vary the flow rate through the length of the distribution manifold 400 and along the width of a receptacle coupled for closure. The flow rate along the length of the distribution manifold 400 can also be adjusted using an array of bolts or other suitable devices arranged to lean against the diverter plate 532 and compress the distribution means 534, whereby it is varied the pressure drop is adjusted along the length of the distribution manifold 400. FIG. 6 shows a receptacle coupled for closing in the form of a transition zone 600 coupled at its upstream end to a dryer 602 with recesses, which it has the underlying control surface 604 and the superimposed control surface 606. The downstream end of the transition zone 600 is coupled to the process 608 operating at a pressure pB. The seals 610 provide a seal at each end of the transition zone 600 and allow the removal of the control surfaces, superimposed or underlying, for example, for cleaning or for loading up the weft. The transition zone 600 has a fixed, superimposed control surface, 611 and an overlapping, positionable control surface, 612 (shown with interrupted strokes in its raised position 613), which can be manually or automatically operated to provide upper space values from h2a, h2b and values between them. The upper distribution manifold 614 can be used to supply the conditioned gas stream Ml'u- The underlying side of the transition zone 600 has the transport roller 616 inside the housing 618, and the underlying control surface 620. The collector Lower distribution 622 can be used to supply the Ml'L gas conditioning stream. The transition zone 600 may be useful to pnt speckle or other defects because they discourage large gas flows between adjacent connected processes that involve a difference in material at the respective operating pressures. For example, there may be a pressure difference of two times or greater, five times or greater or even ten times or greater between a receptacle coupled for the closure described at an upstream or downstream end of an area of transition and a conventional furnace at the other end of the transition zone. Figure 7 and Figure 8 respectively show a schematic sectional view and a cross-sectional view of a receptacle coupled for the closure 700 having the superimposed control surface 702, the underlying control surface 704 and the sides 706 and 708. The coupled receptacle for closure 700 has length l and width e. The weft 14 has a width, and is conveyed through the receptacle coupled for the closure 700 at the velocity V. The seals 709 provide a seal on the sides of the superimposed control surface 702 and allow adjustment of their height or removal (for example, for cleaning or to load up the frame). The superimposed control surface 702 and the underlying control surface 704 are spaced far apart at a distance? The underlying control surface 704 is spaced from the substrate 14 at a distance he2- These distances may vary in the upstream or downstream directions. The upstream transition zone 710 has slot pieces 711 and 712 for the underlying and overlapping weft. These slot pieces for the frame are spaced far apart at a distance h, and have the length li. The part of the slot 711 for the underlying frame is spaced away from the frame 14 at a hit distance, - an upstream process (not shown in Figure 7 or Figure 8) is in direct gaseous communication with transition zone 710 and has pressure PA. The transition zone downstream 714 has the pieces of the slots 716 and 718 for the underlying and superposed plot. These slot pieces for the frame are spaced apart at a distance h2a and have a length 12. The part of the slot 716 for the underlying frame is remote from the frame 14 at a distance h2b-a downstream process (not shown in FIG. Figure 7 or Figure 8) is in direct gaseous communication with transition zone 714 and has pressure PB. When an upstream or downstream process is required to operate at a large pressure difference from a receptacle such as a receptacle coupled for closure 700, the transition zone between the upstream or downstream process and the receptacle coupled for closure they can use additional dilution (or exhaust) streams to reduce the difference in pressure between the process and the enclosed receptacle for closure. For example, convection ovens often operate at large negative pressures (-25 Pa is common), inducing large gas flows. The upper or lower manifolds 720 and 722 respectively can provide gas flows in or out of the upstream end of the enclosed receptacle for closure 700 (eg, MIO and M1'L conditioned gas streams). The upper and lower manifolds 724 and 726 respectively can provide gas flows in or out of the upstream end of the receptacle coupled for closing 700 (eg, the extracted gas streams M40 and M4L). The pressures inside the receptacle can be characterized by Pi, P2, Pi3, P23, P3 and P4. The ambient air pressure outside the receptacle coupled for closing 700 is provided by Patm. The process and apparatus described will typically use a frame management system to transport a moving substrate of indefinite length through the apparatus. Those skilled in the art will be familiar with the appropriate material handling systems and devices.

In operation, exemplary embodiments of the described apparatus can significantly reduce the particle count in the surrounding atmosphere of a coated, movable frame. Exemplary embodiments of the disclosed apparatus may also capture at least a portion of a vapor component from a solidified or uncured coating (if present) without substantial dilution and without condensation of the vapor component in a drying system. The supplied conditioning gas can significantly reduce the introduction of particulate materials into the portions of the apparatus surrounding the coating and can therefore reduce or prevent product quality problems in the finished product. The relatively low air flow can significantly reduce the alterations for the coating and thus can reduce or prevent product quality problems. The collection of a vapor component at high concentrations can allow efficient recovery of the vapor component. The absence of, or reduction in, the condensation in a drying system, may further reduce or prevent problems in product quality caused by the condensate falling on the coating. Example 1 A single coupled closure receptacle was constructed to illustrate the effect of certain variables. Figure 9 shows a schematic side sectional view of a receptacle coupled for the closure 900. The receptacle coupled for the closure 900 has the superimposed control surface 902, the underlying control surface 904 and the side 906 equipped with the openings for the sample A, B and C, for measuring the pressure, particle count and oxygen levels within the coupled receptacle for the closure 900. The superimposed control surface 902 and the underlying control surface 904 are spaced apart at a distance - The underlying control surface 904 is spaced apart from the substrate 14 at a distance he2. The upstream transition zone 908 has parts of the slot 910 and 912 for the frame, underlying and superimposed. These slot pieces for the frame are spaced apart at a distance h? A, and have a length l. The part of the slot 910 for the underlying frame is spaced away from the frame 14 at a distance hlb. The downstream transition zone 914 has slot pieces 916 and 918 for the underlying and overlapping weft. These slot pieces for the frame are spaced apart at a distance h2a, and have the length 12. The slot piece 916 for the underlying frame is spaced away from the frame 14 at a distance h2b. The upper and lower distribution manifolds 920 and 922 respectively provide the conditioned gas streams Ml'u and Ml'L at the upstream end of the receptacle coupled for the closure 900. The web 14 is transported through the receptacle coupled to the container. closing 900 at the speed V. The downstream process 924 has the underlying control surface 926 mobile, the superimposed control surface 928 equipped with an inlet 930 for the ambient gas and the vacuum outlet 932, and parts of the slot 926 and 928 for the plot, underlying and superimposed. These slot pieces for the frame are spaced apart at a distance hB? - The slot piece 926 for the underlying frame is spaced away from the frame 14 at a distance hB2. These slot pieces for the frame have the length 13. By means of appropriate regulation of the flows through the inlet 930 and the outlet 932, the process 924 can simulate a variety of devices, for example, a conventional oven. For purposes of this example, the receptacle coupled for closure 900 was used with an uncoated web and was not connected to its ends either upstream or downstream with another receptacle coupled for closure. Accordingly, the surrounding space, with a defined ambient pressure of zero, lies upstream from transition zone 908 and downstream from process 924. The ambient air temperature was approximately 20 ° C.

Figure 10 shows a plan view of the superimposed control surface 902. The surface 902 has the length le and the width we and contains 5 rows of 3 numbered holes each having a diameter of 9.78 mm and an area of 0.75 cm2, with the lowest numbered holes located at the upstream end of the control surface 902. The holes can be used as sampling openings for measuring pressure, particle counting and oxygen levels in different locations within the receptacle and also they may be open to the left or closed with plugs to vary the open draft area of the coupled receptacle for the closure 900. The particle counts were measured using a MET laser beam particle counter model 200L-1-115-1. ONE ™ (commercially available from Met One Instruments, Inc.), to determine the number of particles of 0.5 μm or larger in a volume of 28.3 liters at a flow rate of 28.3 liters / minute. The pressures were measured using a model IC40D icromanometer (commercially available from Air-Neotronics Ltd.). Oxygen levels were measured using a model 4601 gas detector from IST-AIM ™ (commercially available from Imaging and Sensing Technology Corporation). Gas velocities were evaluated using a 490 Series Mini Anemometer (commercially available from Kurz Instruments, Inc.). The upper and lower distribution manifolds 920 and 922 were connected to a supply of nitrogen and flow rates adjusted using flow meters model RMB-56-SSV from DWYER ™ (commercially available from Dwyer Instruments Inc.). Vacuum outlet 932 was connected to a NORTEC ™ model 7 compressed air vacuum pump (commercially available from Nortee Industries, Inc.). The flow rate was adjusted using a pressure regulator and a flow meter model RMB-106 from DWYER (commercially available from Dwyer Instruments, Inc.). The receptacle coupled for the closure 900 was adjusted so that it = 156.2 cm, we = 38.1 cm, hel = 4.45 cm, he2 = 0.95 cm, hia = 0.46 cm, hib = 0.23 cm, l? = 7.62 cm, h2a = 1.27 cm, h2b = 0.13 cm, 12 = 3.8 cm, hB? = 0.46 cm, hB2 = 0.23 cm, 13 = 2.54 cm and V = 0. The pressure of the receptacle was adjusted by varying the flow velocities Ml'a and M1'L and the gas extraction velocity at outlet 932, using the sampling aperture B (see Figure 9) to verify the pressure. The hole 11 (see Figure 10) was used to verify the particle count and the sampling aperture C (see Figure 9) was used to verify the oxygen level. The inlet 930, the remaining holes in the control surface 902 and the sampling aperture A were closed with plugs, thereby providing a minimum open shot area in the receptacle coupled for the closure 900. The results are shown in the figure 11 (which uses a logarithmic scale of particle counting) and figure 12 (which uses a linear scale of oxygen concentration) and show that for a stationary frame, reductions in particle count of the material were obtained, a, for example, pressures greater than or equal to about -0.5 Pa. At positive receptacle pressures, the particle counts were at or below the detection threshold of the instrument. The curves for the particle count and the oxygen level were similar to each other. Example 2 Example 1 was repeated using a frame speed V of 18 m / minute. The results of the particle counting are shown in Figure 13 (which uses a logarithmic particle counting scale). Figure 13 shows that for a mobile frame, reductions in material particle count were obtained, at, for example, pressures greater than -0.5 Pa. Example 3 Using the method of Example 1, a pressure of -0.5 Pa of the receptacle was obtained in the receptacle coupled for the closure 900 by adjusting the flow velocities Ml'u and Ml'L to 24 liters / minute and adjusting the extraction speed of the gas at the outlet 932 to 94 liters / minute. In a separate run, a +0.5 Pa receptacle pressure was obtained by adjusting the Ml'u and Ml'L flow rates to 122 liters / minute and by adjusting the exhaust gas velocity at outlet 932 to 94 liters /minute. The respective particle counts were 107,889 at -0.5 Pa and only 1 at +0.5 Pa. For each run, the pressure of the receptacle above the substrate was measured at several points along the length of the receptacle coupled for closure 900 using the holes 2, 5, 8, 11 and 14 (see Figure 10). As shown in Figure 14, the pressure of the receptacle above the substrate was very stable for each run and does not vary in a measurable manner along the length of the receptacle coupled for closure 900. Similar measurements were made below the plot using openings A, B and C. No variation in pressure was observed in any of these measurements. In a comparison run, pressure measurements were made at variable points inside and outside of a TEC ™ air flotation oven (manufactured by Thermal Eguipment Corp.) equipped with a HEPA filter air supply adjustment to maintain A pressure of the receptacle of -0.5 Pa. The pressures of the lower and upper flotation pneumatic bar were set at 250 Pa. The compound air flowed at 51,000 liters / minutes (equivalent to approximately 7.5 air changes / minute for a capacity of 6800 liter oven, not taking into account the equipment inside the oven). The air particle count of the environmental space was 48,467. The particle count measured approximately 80 centimeters inside the furnace was 35,481. The counts of particles in various other positions were measured as shown in Figure 15. Figure 15 shows that the pressure of the receptacle varies considerably at several measurement points, and exhibited additional variation due to the action of the pressure regulator of the oven. Example 4 Using the general method of example 1, the flow rates Ml'a and M1'L were set at 122 liters / minute and the speed of gas removal at outlet 932 was set at 94 liters / minute. The height hia of the slot for the frame was adjusted to the values of 0, 0.46, 0.91, 1.27, 2.54, and 3.81 cm. The particle count of the ambient air was 111,175. Figure 16 and Figure 17 (both of which use linear scales of the vertical axis) respectively showed the pressure and counting of particles within the receptacle at various heights of the groove for the weft.

In all cases, a reduction in the particle count of the material was obtained (compared to the counting of ambient air particles). Example 5 Using the general method of Example 1 and a substrate of a 23 cm wide polyester film moving at 0, 6 or 18 m / min, the flow velocities Ml's and M1'L and the extraction speed of the gas at outlet 932 were adjusted to obtain varying reservoir pressures. The particle count of the ambient air was 111,175. The particle count of the receptacle was measured as a function of the velocity of the weft and the pressure of the receptacle. The results are shown in Figure 18 (which uses a logarithmic scale of counting the particles). Figure 18 demonstrates that reductions in the counting of the material particles were obtained for all measured substrate rates, for example, at pressures greater than -0.5 Pa. From the above description of the general principles of the invention described and the description. In the above detailed, those skilled in the art will readily understand the various modifications to which the described invention is susceptible. Therefore, the scope of the invention may be limited only by the following claims and equivalents thereof. It is noted that in relation to this date, the best method known to the applicant to carry out the aforementioned invention, is that which is clear from the present description of the invention.

Claims (53)

1. CLAIMS Having described the invention as above, the content of the following claims is claimed as property. A process for coating a mobile substrate of indefinite length, characterized by comprising transporting the substrate once a coating applicator has been passed and a dryer or curing station in a receptacle coupled for closing or a series of interconnected closure coupled receptacles while supplying the receptacle or series of receptacles with one or more conditioned gas streams flowing at a sufficient rate to materially reduce the count of particles in a receptacle coupled for closure. A process according to claim 1, characterized in that it comprises transporting the substrate from the coating applicator through the dryer or curing station into a receptacle coupled for closing or a series of receptacles coupled for closing. A process according to claim 1, characterized in that it comprises transporting the substrate from the coating applicator through the dryer and the curing station into a receptacle coupled for closing or a series of receptacles coupled for closing. 4. A process according to claim 1, characterized in that it comprises transporting the substrate in a receptacle coupled by the closure or a series of receptacles coupled for closing from a pre-coating station to the coating applicator. A process according to claim 1, characterized in that it comprises transporting the substrate in a receptacle coupled for closing or a series of receptacles coupled for closing from a pre-coating station through the dryer or curing station. A process according to claim 1, characterized in that it comprises transporting the substrate in a receptacle coupled for closing or a series of receptacles coupled for closing from a box containing an unwinding reel to a box containing a reel of winding. 7. A process according to claim 1, characterized in that it comprises coating the substrate and protecting it from contamination of particulate materials until the coating can solidify. 8. A process according to claim 1, characterized in that it comprises coating the substrate and not exposing it to ambient air at least during the time in which the coating is applied until the coating solidifies. 9. A process according to claim 1, characterized in that at least two receptacles coupled for closure have different pressures, temperatures, upper averaged spaces, or lower half spaces. A process according to claim 1, characterized in that it comprises maintaining or establishing a positive pressure in at least one receptacle coupled for closing and maintaining or establishing a negative pressure in at least one other receptacle coupled for closing. 11. A process according to claim 1, characterized in that it comprises supplying a stream of conditioned gas to at least the first of a series of coupled receptacles for closure, interconnected, whereby the conditioned gas is transported in the company of the mobile substrate until a receptacle coupled for closing, downstream, or pushed to a process or receptacle upstream. 12. A process according to claim 1, characterized in that it comprises supplying the conditioned gas streams to a plurality of receptacles coupled for closing and extracting the gas from a plurality of receptacles coupled for closing. 13. A process according to claim 1, characterized in that it comprises supplying the conditioned gas streams to each of a series of receptacles coupled for closing, interconnected. A process according to claim 1, characterized in that it comprises sealing the moving substrate at the upstream and downstream ends of a series of interconnected coupled coupling receptacles. 15. A process according to claim 1, characterized in that it comprises maintaining a pressure gradient of at least about -0.5 Pa or higher in a receptacle coupled for closing. 16. A process according to claim 1, characterized in that it comprises maintaining a positive pressure gradient in a receptacle coupled for closing. 17. A process in accordance with the claim 1, characterized in that it comprises connecting the first and second receptacles having a difference of the material in their respective operating pressures by means of a receptacle coupled for the closure comprising a transition zone. 18. A process according to claim 17, characterized in that the first receptacle comprises a receptacle coupled for closing, the second receptacle comprises an oven, and there is a pressure difference of ten times or greater between the atmospheres in the container. first and second receptacles. 19. A process according to claim 1, characterized in that the total of the average upper space and the average lower space in a receptacle coupled for the closure is 10 cm or smaller. 20. A process according to claim 1, characterized in that the total of the average upper space and the average lower space in a receptacle coupled for the closure is 5 cm or less. 21. A process in accordance with the claim 1, characterized in that the total of the average upper space and the average lower space in any receptacle coupled for the closure is 3 cm or less. 22. A process according to claim 1, characterized in that a first chamber having a gas introduction device is positioned near a control surface, a second chamber having a gas extraction device is placed close to the surface The control surface, the control surface and the first and second chambers jointly define a region in which the adjacent gas phases have a mass amount, at least a portion of the mass of the adjacent gas phases is transported through the gas extraction device. gas by the induction of a flow through the region, and the mass flow can be segmented into the following components: Ml means the average mass flow in time, net, total, per unit width of the substrate inside or outside the region that results from the pressure gradients, MI 'means the average mass flow in time, net, total, of a gas per width a In the region through the first chamber from the gas introduction device, M2 means the mass flow of the average time of the conditioned gas per unit width from or to at least one major surface of the substrate or coating to or from the region, M3 means the mass flow average in time, net, total, per unit width in the region resulting from the movement of the material, and M4 means the average speed in time of mass transport through the gas removal device per unit width . 23. A process according to claim 22, characterized in that Ml has a value less than zero and greater than -0.25 kg / second / meter. 24. A process according to claim 22, characterized in that Ml has a value less than zero and greater than -0.10 kg / second / meter. 25. A process according to claim 1, characterized in that it comprises flowing a stream of conditioned gas at a sufficient velocity to reduce a particle count of the receptacle coupled for closure by 75% or a higher value. 26. A process in accordance with the claim 1, characterized in that it comprises flowing the conditioned gas streams at a speed sufficient to reduce a particle count of the receptacle coupled for closing by 90% or a higher value. 27. An apparatus for the coating of a mobile substrate of indefinite length, characterized in that it comprises a coating applicator, a dryer or curing station and a device for handling the substrate, to transport the substrate once the applicator has been passed. of coating and through the dryer or curing station, the substrate is wrapped from at least the coating applicator to the dryer or curing station in a receptacle coupled for closing or a series of coupled receptacles for closure supplied with a or more streams of the conditioned gas flowing at a rate sufficient to materially reduce the count of particles in a receptacle coupled for closure. 28. An apparatus according to claim 27, characterized in that the substrate is wrapped from the coating applicator to the dryer or curing station in a receptacle coupled for closing or a series of receptacles coupled for closing. 29. An apparatus according to claim 27, characterized in that the substrate is wrapped from the coating applicator to the dryer and the curing station in a receptacle coupled for closing or a series of receptacles coupled for closing. 30. An apparatus according to claim 27, characterized in that the substrate is wrapped in a receptacle coupled for closing or a series of receptacles coupled for closing from a precoating station to the coating applicator. 31. An apparatus according to claim 27, characterized in that the substrate is wrapped in a receptacle coupled for closure or a series of receptacles coupled for closing from a pre-coating station to the dryer or curing station. 32. An apparatus according to claim 27, characterized in that the substrate is wrapped in a receptacle coupled for closing or a series of receptacles coupled for closing from a box containing an unwinding reel to a box containing a reel of winding. 33. An apparatus according to claim 27, characterized in that a coating not solidified on the substrate is protected from contamination of the particulate material until the coating can solidify. 34. An apparatus according to claim 27, characterized in that the substrate is coated and is not exposed to ambient air from at least the time in which the coating is applied until the coating solidifies. 35. An apparatus according to claim 27, characterized in that at least two receptacles coupled for closing have different average upper spaces or average lower spaces. 36. An apparatus according to claim 27, characterized in that a stream of conditioned gas is supplied at least in the first of a series of interconnected coupled coupling receptacles, and the conditioned gas is carried in the carrier of the mobile substrate to a receptacle coupled for closing, downstream, or pushed to an upstream process or receptacle. 37. An apparatus according to claim 27, characterized in that the conditioned gas streams are supplied to a plurality of receptacles coupled for closure and the gaseous streams are drawn from a plurality of receptacles coupled for closure. 38. An apparatus according to claim 27, characterized in that the conditioned gas streams are supplied to each of a series of interconnected coupled coupling receptacles. 39. An apparatus in accordance with the claim 27, characterized in that it has seals with respect to the moving substrate at the ends upstream and downstream of a series of interconnected coupled coupling receptacles. 40. An apparatus in accordance with the claim 27, characterized in that a receptacle coupled for closing has a pressure gradient of at least about -0.5 Pa or higher. 41. An apparatus according to claim 27, characterized in that a receptacle coupled for closing has a positive pressure gradient. 42. An apparatus according to claim 27, characterized by comprising first and second receptacles having a material difference in their respective operating pressures, connected by a receptacle coupled for closure comprising a transition zone between the first and second receptacles. . 43. An apparatus according to claim 42, characterized in that the first receptacle comprises a receptacle coupled for closing, the second receptacle comprises an oven and there is a difference in pressure of ten times or greater between the atmospheres in the first and second receptacles. 44. An apparatus according to claim 27, characterized in that the total of the average upper space and the average lower space in a receptacle coupled for the closure is 10 cm or less. 45. An apparatus according to claim 27, characterized in that the total of the average upper space and the average lower space in a receptacle coupled for the closure is 5 cm or less. 46. An apparatus according to claim 27, characterized in that the total of the average upper space and the average lower space in any receptacle coupled for the closure is 3 cm or less. 47. An apparatus according to claim 27, characterized in that a first chamber having a gas introduction device is placed near a control surface, a second chamber having a gas extraction device is placed close to the surface The control surface, the control surface and the first and second chambers jointly define a region where the adjacent gas phases have a mass amount, at least a portion of the mass of the adjacent gas phases can be transported through the extraction device of the gas by the induction of a flow through the region, and the mass flow can be segmented into the following components: Ml means the average mass flow in time, net, total, per unit width of the substrate inside or outside the the region that results from the pressure gradients, MI 'means the net, total, net average mass flow of a gas per unit width in the region through the first chamber from the gas introduction device, M2 means the mass flow of the average time of the conditioned gas per unit width from or to at least one major surface of the substrate or coating to or from the region, M3 means the net mass flow over time, net, total, per unit width in the region resulting from the movement of the material, and M4 means the average speed in time of mass transport through the gas removal device per unit width. 48. An apparatus according to claim 47, characterized in that Ml has a value less than zero and greater than -0.25 kg / second / meter. 49. An apparatus according to claim 47, characterized in that Ml has a value less than zero and greater than -0.10 kg / second / meter. 50. An apparatus according to claim 27, characterized in that a stream of conditioned gas flows at a sufficient rate to reduce a particle count of the receptacle coupled for closure by 75% or greater. 51. An apparatus according to claim 27, characterized in that the conditioned gas streams flow at a rate sufficient to reduce a particle count of the receptacle coupled for closure by 90% or a higher value. 52. A process for coating a mobile substrate of indefinite length, characterized in that it comprises transporting the substrate once a coating applicator has been passed and to a dryer or curing station in a receptacle coupled for closing or a series of interconnected coupled catch receptacles, while the receptacle or series of receptacles is supplied with one or more streams of conditioned gas flowing at a sufficient rate to cause a change of the material in a physical property of interest to the atmosphere in a receptacle trailer for closing. 53. An apparatus for coating a mobile substrate of indefinite length, characterized by a coating applicator, a dryer or curing station and equipment for handling the substrate, to transport the substrate once the applicator has been passed. coating and through the dryer or curing station, the substrate is wrapped from at least the coating applicator to the dryer or curing station in a receptacle coupled for closing or a series of receptacles coupled for closing, provided with a or more conditioned gas streams flowing at a sufficient rate to cause a change of material in a physical property of interest to the atmosphere in a receptacle coupled for closure.