MX9605668A - Stilbazolium salt, and preparation and use thereof. - Google Patents
Stilbazolium salt, and preparation and use thereof.Info
- Publication number
- MX9605668A MX9605668A MX9605668A MX9605668A MX9605668A MX 9605668 A MX9605668 A MX 9605668A MX 9605668 A MX9605668 A MX 9605668A MX 9605668 A MX9605668 A MX 9605668A MX 9605668 A MX9605668 A MX 9605668A
- Authority
- MX
- Mexico
- Prior art keywords
- preparation
- stilbazolium salt
- stilbazolium
- salt
- terephthalaldehydemonodialkylacetal
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/24—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D213/28—Radicals substituted by singly-bound oxygen or sulphur atoms
- C07D213/30—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/12—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D215/14—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/44—Preparation of metal salts or ammonium salts
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Abstract
The present invention relates to a stilbazolium salt represented by formula (1) or (1A), wherein R1, R2 and X- are as defined in claim 1; a process for preparing thereof by using terephthalaldehydemonodialkylacetal; and use of thus prepared stilbazolium salt for preparation of a photosensitive resin.
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950005821 | 1995-03-20 | ||
KR955822 | 1995-03-20 | ||
KR1019950005821A KR0148718B1 (en) | 1995-03-20 | 1995-03-20 | Process for the preparation of stilbazium |
KR1019950005822A KR960035150A (en) | 1995-03-20 | 1995-03-20 | Method of producing photosensitive resin |
KR5822/1995 | 1995-03-20 | ||
KR5821/1995 | 1995-03-20 | ||
PCT/KR1996/000035 WO1996029312A1 (en) | 1995-03-20 | 1996-03-20 | Stilbazolium salt, and preparation and use thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
MX9605668A true MX9605668A (en) | 1998-05-31 |
MXPA96005668A MXPA96005668A (en) | 1998-10-23 |
Family
ID=
Also Published As
Publication number | Publication date |
---|---|
WO1996029312A1 (en) | 1996-09-26 |
CN1148850A (en) | 1997-04-30 |
EP0759906A1 (en) | 1997-03-05 |
JPH09510739A (en) | 1997-10-28 |
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