MD1653F1 - Process for thin-filmed heterostructures obtaining - Google Patents

Process for thin-filmed heterostructures obtaining

Info

Publication number
MD1653F1
MD1653F1 MD990249A MD990249A MD1653F1 MD 1653 F1 MD1653 F1 MD 1653F1 MD 990249 A MD990249 A MD 990249A MD 990249 A MD990249 A MD 990249A MD 1653 F1 MD1653 F1 MD 1653F1
Authority
MD
Moldova
Prior art keywords
heterostructures
filmed
compounds
obtaining
thin
Prior art date
Application number
MD990249A
Other languages
Romanian (ro)
Other versions
MD1653G2 (en
Inventor
Lidia Ghimpu
Original Assignee
Univ De Stat Din Moldova
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ De Stat Din Moldova filed Critical Univ De Stat Din Moldova
Priority to MD99-0249A priority Critical patent/MD1653G2/en
Publication of MD1653F1 publication Critical patent/MD1653F1/en
Publication of MD1653G2 publication Critical patent/MD1653G2/en

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

The invention refers to the radio electronic engineering and may be used for obtaining thin-filmed heterostructures of the AIIBVI binary compounds for photoresistors and phototransformers manufacturing. A process for obtaining thin-filmed heterostructures on the AIIBVI binary compounds basis includes vacuum deposition on the support at presence of the temperature gradient between the evaporator and the support, of a compounds stratum with a narrow-band component by means of evaporation in the quasi-closed volume at further heat and chemical treatment and of a compounds stratum with wide-band component by means of discrete evaporation.Claims: 1Fig.: 3
MD99-0249A 1999-10-12 1999-10-12 Process for thin-filmed heterostructures obtaining MD1653G2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MD99-0249A MD1653G2 (en) 1999-10-12 1999-10-12 Process for thin-filmed heterostructures obtaining

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MD99-0249A MD1653G2 (en) 1999-10-12 1999-10-12 Process for thin-filmed heterostructures obtaining

Publications (2)

Publication Number Publication Date
MD1653F1 true MD1653F1 (en) 2001-04-30
MD1653G2 MD1653G2 (en) 2001-11-30

Family

ID=19739477

Family Applications (1)

Application Number Title Priority Date Filing Date
MD99-0249A MD1653G2 (en) 1999-10-12 1999-10-12 Process for thin-filmed heterostructures obtaining

Country Status (1)

Country Link
MD (1) MD1653G2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD3112G2 (en) * 2005-06-16 2007-02-28 Государственный Университет Молд0 Thin-layer solar cell

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD1308G2 (en) * 1997-07-17 2000-02-29 Государственный Университет Молд0 Process for obtaining the thin-filmed heterostructures

Also Published As

Publication number Publication date
MD1653G2 (en) 2001-11-30

Similar Documents

Publication Publication Date Title
WO2006091588A3 (en) Etching chamber with subchamber
GB2368726B (en) Selective epitaxial growth method in semiconductor device
AU2002367102A1 (en) Method for making an article comprising a sheet and at least an element directly mounted thereon
GB2354762A (en) Tantalum amide precursors for deposition of tantalum nitride on a substrate
EP2400530A3 (en) Diamond semiconductor element and process for producing the same
AU2003282750A1 (en) Metal coated nanocrystalline silicon as an active surface enhanced raman spectroscopy (sers) substrate
WO2007040587A3 (en) Method for forming a multiple layer passivation film and a deice
WO2005067634A3 (en) Advanced multi-pressure worpiece processing
WO2005057630A3 (en) Manufacturable low-temperature silicon carbide deposition technology
EP1676812A3 (en) Process for producing boron nitride
MXPA02008722A (en) Novel aryl fructose 1,6 bisphosphatase inhibitors.
WO2002073646A3 (en) Field electron emission materials and devices
WO2005007936A3 (en) Ultrahard diamonds and method of making thereof
TW200724572A (en) Semiconductor device including a coupled dielectric layer and metal layer, method of fabrication thereof, and material for coupling a dielectric layer and a metal layer in a semiconductor device
EP1559809A3 (en) Apparatus and method for coating substrate
DE50213554D1 (en) Pressurizer with Disconnect Membrane and Method of Making the Same
EP1298110A4 (en) Porous silicon nitride article and method for production thereof
EP1209321A3 (en) Thermally-stabilized thermal barrier coating and process therefor
MD1653F1 (en) Process for thin-filmed heterostructures obtaining
WO2007038710A3 (en) Intra-cavity gettering of nitrogen in sic crystal growth
EP1390157A4 (en) Method and apparatus for temperature controlled vapor deposition on a substrate
WO2009078121A1 (en) Semiconductor substrate supporting jig and method for manufacturing the same
TW200623256A (en) Method and system for treating a substrate using a supercritical fluid
EP1610394A4 (en) Semiconductor device, process for producing the same and process for producing metal compound thin film
WO1999058733A3 (en) Method and device for the heat treatment of substrates