LU91635B1 - Method and apparatus for production of rotatable sputtering targets - Google Patents

Method and apparatus for production of rotatable sputtering targets

Info

Publication number
LU91635B1
LU91635B1 LU91635A LU91635A LU91635B1 LU 91635 B1 LU91635 B1 LU 91635B1 LU 91635 A LU91635 A LU 91635A LU 91635 A LU91635 A LU 91635A LU 91635 B1 LU91635 B1 LU 91635B1
Authority
LU
Luxembourg
Prior art keywords
production
sputtering targets
rotatable sputtering
rotatable
targets
Prior art date
Application number
LU91635A
Inventor
Anthony Mendel
George E Whalen
Original Assignee
Gradel Sarl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gradel Sarl filed Critical Gradel Sarl
Priority to LU91635A priority Critical patent/LU91635B1/en
Priority to US13/501,358 priority patent/US8408277B2/en
Priority to PCT/EP2010/065257 priority patent/WO2011045304A1/en
Priority to EP10768461.5A priority patent/EP2488677B1/en
Application granted granted Critical
Publication of LU91635B1 publication Critical patent/LU91635B1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
    • B22D19/00—Casting in, on, or around objects which form part of the product
    • B22D19/16—Casting in, on, or around objects which form part of the product for making compound objects cast of two or more different metals, e.g. for making rolls for rolling mills
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
LU91635A 2009-10-12 2009-12-30 Method and apparatus for production of rotatable sputtering targets LU91635B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
LU91635A LU91635B1 (en) 2009-12-30 2009-12-30 Method and apparatus for production of rotatable sputtering targets
US13/501,358 US8408277B2 (en) 2009-10-12 2010-10-12 Method and apparatus for production of rotatable sputtering targets
PCT/EP2010/065257 WO2011045304A1 (en) 2009-10-12 2010-10-12 Method and apparatus for production of rotatable sputtering targets
EP10768461.5A EP2488677B1 (en) 2009-10-12 2010-10-12 Method and apparatus for production of rotatable sputtering targets

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU91635A LU91635B1 (en) 2009-12-30 2009-12-30 Method and apparatus for production of rotatable sputtering targets

Publications (1)

Publication Number Publication Date
LU91635B1 true LU91635B1 (en) 2011-07-01

Family

ID=42173452

Family Applications (1)

Application Number Title Priority Date Filing Date
LU91635A LU91635B1 (en) 2009-10-12 2009-12-30 Method and apparatus for production of rotatable sputtering targets

Country Status (1)

Country Link
LU (1) LU91635B1 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1186682A2 (en) * 2000-09-05 2002-03-13 Unaxis Materials Deutschland GmbH Cylindrical sputtering target and process for its manufacture
US6719034B2 (en) * 2000-12-19 2004-04-13 W. C. Heraeus Gmbh & Co. Kg Process for producing a tube-shaped cathode sputtering target

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1186682A2 (en) * 2000-09-05 2002-03-13 Unaxis Materials Deutschland GmbH Cylindrical sputtering target and process for its manufacture
US6719034B2 (en) * 2000-12-19 2004-04-13 W. C. Heraeus Gmbh & Co. Kg Process for producing a tube-shaped cathode sputtering target

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