LU91635B1 - Method and apparatus for production of rotatable sputtering targets - Google Patents
Method and apparatus for production of rotatable sputtering targetsInfo
- Publication number
- LU91635B1 LU91635B1 LU91635A LU91635A LU91635B1 LU 91635 B1 LU91635 B1 LU 91635B1 LU 91635 A LU91635 A LU 91635A LU 91635 A LU91635 A LU 91635A LU 91635 B1 LU91635 B1 LU 91635B1
- Authority
- LU
- Luxembourg
- Prior art keywords
- production
- sputtering targets
- rotatable sputtering
- rotatable
- targets
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D19/00—Casting in, on, or around objects which form part of the product
- B22D19/16—Casting in, on, or around objects which form part of the product for making compound objects cast of two or more different metals, e.g. for making rolls for rolling mills
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
LU91635A LU91635B1 (en) | 2009-12-30 | 2009-12-30 | Method and apparatus for production of rotatable sputtering targets |
US13/501,358 US8408277B2 (en) | 2009-10-12 | 2010-10-12 | Method and apparatus for production of rotatable sputtering targets |
PCT/EP2010/065257 WO2011045304A1 (en) | 2009-10-12 | 2010-10-12 | Method and apparatus for production of rotatable sputtering targets |
EP10768461.5A EP2488677B1 (en) | 2009-10-12 | 2010-10-12 | Method and apparatus for production of rotatable sputtering targets |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
LU91635A LU91635B1 (en) | 2009-12-30 | 2009-12-30 | Method and apparatus for production of rotatable sputtering targets |
Publications (1)
Publication Number | Publication Date |
---|---|
LU91635B1 true LU91635B1 (en) | 2011-07-01 |
Family
ID=42173452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
LU91635A LU91635B1 (en) | 2009-10-12 | 2009-12-30 | Method and apparatus for production of rotatable sputtering targets |
Country Status (1)
Country | Link |
---|---|
LU (1) | LU91635B1 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1186682A2 (en) * | 2000-09-05 | 2002-03-13 | Unaxis Materials Deutschland GmbH | Cylindrical sputtering target and process for its manufacture |
US6719034B2 (en) * | 2000-12-19 | 2004-04-13 | W. C. Heraeus Gmbh & Co. Kg | Process for producing a tube-shaped cathode sputtering target |
-
2009
- 2009-12-30 LU LU91635A patent/LU91635B1/en active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1186682A2 (en) * | 2000-09-05 | 2002-03-13 | Unaxis Materials Deutschland GmbH | Cylindrical sputtering target and process for its manufacture |
US6719034B2 (en) * | 2000-12-19 | 2004-04-13 | W. C. Heraeus Gmbh & Co. Kg | Process for producing a tube-shaped cathode sputtering target |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2402482A4 (en) | Sputtering target and process for production thereof | |
EP2396805A4 (en) | Apparatus and method of photo-fragmentation | |
EP2703519A4 (en) | Sputtering target and method for producing same | |
GB2467049B (en) | Methods of and apparatus for processing graphics | |
EP2500170A4 (en) | Electroconductive laminate and process for production thereof | |
EP2420590A4 (en) | Cu-Ga ALLOY SPUTTERING TARGET AND PROCESS FOR MANUFACTURE THEREOF | |
EP2548993A4 (en) | Sputtering target and manufacturing method therefor | |
EP2548868A4 (en) | Method and process for preparation and production of deuterated -diphenylurea | |
EP2553833A4 (en) | Method and apparatus to adjust received signal | |
MY156716A (en) | Sputtering target for magnetic recording film and process for production thereof | |
EP2424457A4 (en) | Method and apparatus for rf anastomosis | |
GB2469572B (en) | Freezing microtrome and method for producing microscopable thin sections | |
PL2427590T3 (en) | Apparatus and methods for forming modified metal coatings | |
PL2412460T3 (en) | Apparatus and method for production of metal elongated products | |
EP2784173A4 (en) | Sputtering target and method for producing same | |
PL2280407T3 (en) | Sputtering apparatus including cathode with rotatable targets, and related method | |
IL223754B (en) | Sputtering target and/or coil and process for producing same | |
EP2612952A4 (en) | Indium target and method for producing same | |
EP2450182A4 (en) | Metal laminate structure and process for production of metal laminate structure | |
IL208051A (en) | Process and apparatus for coating frozen products | |
EP2700735A4 (en) | Sputtering target and method for producing same | |
EP2628815A4 (en) | Method for producing metal material and metal material | |
LU91635B1 (en) | Method and apparatus for production of rotatable sputtering targets | |
GB0919074D0 (en) | Crystallisation process and apparatus | |
PT2539738E (en) | Method and apparatus for identifying changes of course and/or changes of speed of a target |