LU70729A1 - - Google Patents

Info

Publication number
LU70729A1
LU70729A1 LU70729A LU70729A LU70729A1 LU 70729 A1 LU70729 A1 LU 70729A1 LU 70729 A LU70729 A LU 70729A LU 70729 A LU70729 A LU 70729A LU 70729 A1 LU70729 A1 LU 70729A1
Authority
LU
Luxembourg
Application number
LU70729A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of LU70729A1 publication Critical patent/LU70729A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Weting (AREA)
LU70729A 1973-08-13 1974-08-13 LU70729A1 (cg-RX-API-DMAC7.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732340961 DE2340961A1 (de) 1973-08-13 1973-08-13 Vorrichtung zum herstellen von graphischen mustern

Publications (1)

Publication Number Publication Date
LU70729A1 true LU70729A1 (cg-RX-API-DMAC7.html) 1974-12-10

Family

ID=5889638

Family Applications (1)

Application Number Title Priority Date Filing Date
LU70729A LU70729A1 (cg-RX-API-DMAC7.html) 1973-08-13 1974-08-13

Country Status (18)

Country Link
US (1) US3973847A (cg-RX-API-DMAC7.html)
JP (1) JPS5046134A (cg-RX-API-DMAC7.html)
AU (1) AU7218474A (cg-RX-API-DMAC7.html)
BE (1) BE818654A (cg-RX-API-DMAC7.html)
CA (1) CA1004776A (cg-RX-API-DMAC7.html)
CH (1) CH589312A5 (cg-RX-API-DMAC7.html)
DE (1) DE2340961A1 (cg-RX-API-DMAC7.html)
DK (1) DK427174A (cg-RX-API-DMAC7.html)
ES (1) ES428461A1 (cg-RX-API-DMAC7.html)
FI (1) FI237274A7 (cg-RX-API-DMAC7.html)
FR (1) FR2241098A1 (cg-RX-API-DMAC7.html)
GB (1) GB1468446A (cg-RX-API-DMAC7.html)
IT (1) IT1019922B (cg-RX-API-DMAC7.html)
LU (1) LU70729A1 (cg-RX-API-DMAC7.html)
NL (1) NL7409331A (cg-RX-API-DMAC7.html)
NO (1) NO742890L (cg-RX-API-DMAC7.html)
SE (1) SE7410270L (cg-RX-API-DMAC7.html)
ZA (1) ZA744464B (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197000A (en) * 1978-05-23 1980-04-08 Fsi Corporation Positive developing method and apparatus
US4286541A (en) * 1979-07-26 1981-09-01 Fsi Corporation Applying photoresist onto silicon wafers
US4536085A (en) * 1984-01-27 1985-08-20 Teaneck Graphics Corp. Multiple vacuum frame unit
DE3734097A1 (de) * 1987-10-09 1989-04-27 Du Pont Deutschland Verfahren und vorrichtung zum behandeln eines photographischen aufzeichnungsmaterials
DE102004049131A1 (de) * 2004-10-07 2006-04-13 Wahrig, Johannes Blasinstrumente

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3528358A (en) * 1966-04-19 1970-09-15 Ball Corp Printing plate processing apparatus
US3751164A (en) * 1969-06-06 1973-08-07 Grace W R & Co Automated apparatus for photocomposing

Also Published As

Publication number Publication date
US3973847A (en) 1976-08-10
NO742890L (cg-RX-API-DMAC7.html) 1975-03-10
IT1019922B (it) 1977-11-30
ZA744464B (en) 1975-07-30
AU7218474A (en) 1976-02-12
ES428461A1 (es) 1976-08-16
JPS5046134A (cg-RX-API-DMAC7.html) 1975-04-24
SE7410270L (cg-RX-API-DMAC7.html) 1975-02-14
GB1468446A (en) 1977-03-23
DK427174A (cg-RX-API-DMAC7.html) 1975-04-14
NL7409331A (nl) 1975-02-17
CH589312A5 (cg-RX-API-DMAC7.html) 1977-06-30
FI237274A7 (cg-RX-API-DMAC7.html) 1975-02-14
BE818654A (fr) 1974-12-02
CA1004776A (en) 1977-02-01
FR2241098A1 (cg-RX-API-DMAC7.html) 1975-03-14
DE2340961A1 (de) 1975-02-27

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