Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/20—Exposure; Apparatus therefor
  • G03F7/24—Curved surfaces

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• Preparing Plates And Mask In Photomechanical Process (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=20297693

Family Applications (1)

Country Status (8)

• 1970
  • 1970-10-08 SE SE1361770A patent/SE351304B/xx unknown
• 1971
  • 1971-09-23 GB GB4441271A patent/GB1376610A/en not_active Expired
  • 1971-10-04 NL NL7113586A patent/NL7113586A/xx unknown
  • 1971-10-05 DE DE19712149687 patent/DE2149687A1/de active Pending
  • 1971-10-06 LU LU64019D patent/LU64019A1/xx unknown
  • 1971-10-07 FR FR7136096A patent/FR2111098A5/fr not_active Expired
  • 1971-10-08 AT AT872871A patent/AT315212B/de not_active IP Right Cessation
  • 1971-10-08 BE BE773716A patent/BE773716A/xx unknown

Also Published As

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