LU56200A1 - - Google Patents

Info

Publication number
LU56200A1
LU56200A1 LU56200DA LU56200A1 LU 56200 A1 LU56200 A1 LU 56200A1 LU 56200D A LU56200D A LU 56200DA LU 56200 A1 LU56200 A1 LU 56200A1
Authority
LU
Luxembourg
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of LU56200A1 publication Critical patent/LU56200A1/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
LU56200D 1967-06-05 1968-06-04 LU56200A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US643405A US3373095A (en) 1967-06-05 1967-06-05 Electroplating of copper

Publications (1)

Publication Number Publication Date
LU56200A1 true LU56200A1 (en) 1968-09-16

Family

ID=24580675

Family Applications (1)

Application Number Title Priority Date Filing Date
LU56200D LU56200A1 (en) 1967-06-05 1968-06-04

Country Status (10)

Country Link
US (1) US3373095A (en)
AT (1) AT278464B (en)
BE (1) BE716104A (en)
DE (1) DE1771447C2 (en)
ES (1) ES354519A1 (en)
FR (1) FR1569546A (en)
LU (1) LU56200A1 (en)
NL (1) NL6807883A (en)
NO (1) NO120960B (en)
SE (1) SE345879B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4009087A (en) * 1974-11-21 1977-02-22 M&T Chemicals Inc. Electrodeposition of copper
CN111593375A (en) * 2020-05-15 2020-08-28 电子科技大学 Leveling agent for electronic circuit copper electroplating pore filling and copper electroplating bath

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2424887A (en) * 1941-10-11 1947-07-29 Houdaille Hershey Corp Method and electrolyte for the electrodeposition of metals
US2805194A (en) * 1955-07-18 1957-09-03 Dayton Bright Copper Company Bright copper plating
US2931760A (en) * 1957-09-25 1960-04-05 Leon R Westbrook Acid copper plating
DE1133610B (en) * 1959-06-06 1962-07-19 Dehydag Gmbh Acid galvanic copper baths
NL291575A (en) * 1962-04-16
US3252987A (en) * 1964-03-09 1966-05-24 Eastman Kodak Co Tetrazolium compound electroplating leveling agent and method of preparation

Also Published As

Publication number Publication date
FR1569546A (en) 1969-05-30
DE1771447B1 (en) 1972-05-04
AT278464B (en) 1970-02-10
NO120960B (en) 1970-12-28
ES354519A1 (en) 1970-01-01
DE1771447C2 (en) 1974-08-22
NL6807883A (en) 1968-12-06
US3373095A (en) 1968-03-12
SE345879B (en) 1972-06-12
BE716104A (en) 1968-11-04

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