LU46837A1 - - Google Patents
Info
- Publication number
- LU46837A1 LU46837A1 LU46837DA LU46837A1 LU 46837 A1 LU46837 A1 LU 46837A1 LU 46837D A LU46837D A LU 46837DA LU 46837 A1 LU46837 A1 LU 46837A1
- Authority
- LU
- Luxembourg
- Prior art keywords
- mirror
- film
- light
- thickness
- pulse
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 abstract 3
- XCAUINMIESBTBL-UHFFFAOYSA-N lead(ii) sulfide Chemical compound [Pb]=S XCAUINMIESBTBL-UHFFFAOYSA-N 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 238000004904 shortening Methods 0.000 abstract 1
- 230000011664 signaling Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0691—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of objects while moving
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02062—Active error reduction, i.e. varying with time
- G01B9/02064—Active error reduction, i.e. varying with time by particular adjustment of coherence gate, i.e. adjusting position of zero path difference in low coherence interferometry
- G01B9/02065—Active error reduction, i.e. varying with time by particular adjustment of coherence gate, i.e. adjusting position of zero path difference in low coherence interferometry using a second interferometer before or after measuring interferometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/45—Interferometric spectrometry
- G01J3/453—Interferometric spectrometry by correlation of the amplitudes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2/00—Demodulating light; Transferring the modulation of modulated light; Frequency-changing of light
- G02F2/002—Demodulating light; Transferring the modulation of modulated light; Frequency-changing of light using optical mixing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US304849A US3319515A (en) | 1963-08-27 | 1963-08-27 | Interferometric optical phase discrimination apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
LU46837A1 true LU46837A1 (de) | 1966-02-28 |
Family
ID=23178262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
LU46837D LU46837A1 (de) | 1963-08-27 | 1964-08-26 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3319515A (de) |
DE (1) | DE1447253B2 (de) |
GB (1) | GB1024598A (de) |
LU (1) | LU46837A1 (de) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3492491A (en) * | 1967-03-03 | 1970-01-27 | Optomechanisms Inc | Thickness monitor for coating silicon wafer |
FR2070474A5 (de) * | 1969-12-05 | 1971-09-10 | Anvar | |
US3720471A (en) * | 1970-02-25 | 1973-03-13 | Jeol Ltd | Method for measuring plate thickness |
US4309109A (en) * | 1972-05-25 | 1982-01-05 | The United States Of America As Represented By The Secretary Of The Navy | Pulsed interferometric remote gauge |
US3930167A (en) * | 1973-05-04 | 1975-12-30 | Univ Minnesota | In-line production control of polymeric film |
DE2457253C2 (de) * | 1974-12-04 | 1982-09-02 | Krautkrämer, GmbH, 5000 Köln | Optisches interferometrisches Verfahren und Vorrichtung zur berührungslosen Messung der durch Ultraschallwellen verursachten Oberflächenauslenkung eines Prüflings |
US4105335A (en) * | 1975-06-28 | 1978-08-08 | Canon Kabushiki Kaisha | Interferometric optical phase discrimination apparatus |
US4072422A (en) * | 1975-10-27 | 1978-02-07 | Canon Kabushiki Kaisha | Apparatus for interferometrically measuring the physical properties of test object |
DE2709686C2 (de) * | 1977-03-05 | 1982-09-09 | Krautkrämer, GmbH, 5000 Köln | Optisches interferometrisches Verfahren zur berührungslosen Messung der durch Ultraschallwellen verursachten Oberflächenauslenkung eines Prüflings |
US4355903A (en) * | 1980-02-08 | 1982-10-26 | Rca Corporation | Thin film thickness monitor |
GB2106736B (en) * | 1981-09-03 | 1985-06-12 | Standard Telephones Cables Ltd | Optical transmission system |
FI823028A0 (fi) * | 1982-09-01 | 1982-09-01 | Kalevi Juhani Kalliomaeki | Foerfarande foer maetning av korta straeckor med en interferometer som utnyttjar icke-koherent ljus, samt foer utfoerande av foerfarandet avsedd interferometer |
US4958930A (en) * | 1985-12-11 | 1990-09-25 | E. I. Du Pont De Nemours And Company | Apparatus for monitoring thickness variations in a film web |
US4842410A (en) * | 1986-10-24 | 1989-06-27 | Geo-Centers, Inc. | Apparatus and method utilizing interference fringes to determine the thermal stability of a liquid |
JPS6453101A (en) * | 1987-05-25 | 1989-03-01 | Kurashiki Boseki Kk | Equal tilt angle interference type film thickness gauge |
US4844614A (en) * | 1987-09-01 | 1989-07-04 | Nicolet Instrument Corporation | Interchangeable beam splitting holder and compartment therefor |
EP0420113B1 (de) * | 1989-09-25 | 1995-08-23 | Mitsubishi Denki Kabushiki Kaisha | Apparat und Verfahren für die Ausmessung von dünnen mehrschichtigen Lagen |
US5473432A (en) * | 1994-09-12 | 1995-12-05 | Hewlett-Packard Company | Apparatus for measuring the thickness of a moving film utilizing an adjustable numerical aperture lens |
US5659392A (en) * | 1995-03-22 | 1997-08-19 | Eastman Kodak Company | Associated dual interferometric measurement apparatus for determining a physical property of an object |
US5596409A (en) * | 1995-03-22 | 1997-01-21 | Eastman Kodak Company | Associated dual interferometric measurement method for determining a physical property of an object |
US6067161A (en) * | 1998-10-29 | 2000-05-23 | Eastman Kodak Company | Apparatus for measuring material thickness profiles |
US6034772A (en) * | 1998-10-29 | 2000-03-07 | Eastman Kodak Company | Method for processing interferometric measurement data |
US6038027A (en) * | 1998-10-29 | 2000-03-14 | Eastman Kodak Company | Method for measuring material thickness profiles |
US6470294B1 (en) * | 1999-04-13 | 2002-10-22 | Qualitek-Vib, Inc. | System and method for the on-line measurement of glue application rate on a corrugator |
US6614534B1 (en) | 1999-12-14 | 2003-09-02 | Eastman Kodak Company | Method and apparatus for combined measurement of surface non-uniformity index of refraction variation and thickness variation |
US6724487B2 (en) | 2002-06-06 | 2004-04-20 | Eastman Kodak Company | Apparatus and method for measuring digital imager, package and wafer bow and deviation from flatness |
DE102009025562A1 (de) * | 2008-10-20 | 2010-04-29 | Siemens Aktiengesellschaft | Verfahren zum optischen Untersuchen von Schichten |
US9581433B2 (en) * | 2013-12-11 | 2017-02-28 | Honeywell Asca Inc. | Caliper sensor and method using mid-infrared interferometry |
US20150253127A1 (en) * | 2014-03-04 | 2015-09-10 | Honeywell Asca Inc. | Thickness Determination of Web Product by Mid-infrared Wavelength Scanning Interferometry |
CN109459416B (zh) * | 2018-11-07 | 2023-12-22 | 天津大学 | 基于反射窗口提高太赫兹波成像信噪比的装置及方法 |
CN109709073B (zh) * | 2019-01-10 | 2021-10-22 | 苏州市东挺河智能科技发展有限公司 | 一种纳米小球膜层数检测装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2518647A (en) * | 1948-01-07 | 1950-08-15 | Celanese Corp | Interferometer means for thickness measurements |
US3202052A (en) * | 1962-01-12 | 1965-08-24 | Werner R Rambauske | Interferometer used with piezoelectric crystal to form light valve |
US3238839A (en) * | 1962-03-29 | 1966-03-08 | Gen Electric | Optical thickness gauge |
-
1963
- 1963-08-27 US US304849A patent/US3319515A/en not_active Expired - Lifetime
-
1964
- 1964-08-26 LU LU46837D patent/LU46837A1/xx unknown
- 1964-08-27 DE DE19641447253 patent/DE1447253B2/de active Pending
- 1964-08-27 GB GB35235/64A patent/GB1024598A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1447253A1 (de) | 1969-02-06 |
DE1447253B2 (de) | 1972-04-06 |
US3319515A (en) | 1967-05-16 |
GB1024598A (en) | 1966-03-30 |
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