KR970077308A - How to Remove Particles in Plasma Etching Process - Google Patents
How to Remove Particles in Plasma Etching Process Download PDFInfo
- Publication number
- KR970077308A KR970077308A KR1019960015542A KR19960015542A KR970077308A KR 970077308 A KR970077308 A KR 970077308A KR 1019960015542 A KR1019960015542 A KR 1019960015542A KR 19960015542 A KR19960015542 A KR 19960015542A KR 970077308 A KR970077308 A KR 970077308A
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- KR
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- etching process
- plasma
- reaction chamber
- present
- plasma etching
- Prior art date
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Abstract
본 발명은 플라즈마 식각공정에서의 파티클 제거방법에 관해 개시한다. 본 발명에 의한 파티클 제거방법은 반응챔버에서 플라즈마를 이용한 식각공정을 실시한 후 플라즈마 온(ON)상태로 상기 반응챔버내에 불활성가스를 플로우 시키면서 펌핑을 실시한다.The present invention discloses a particle removing method in a plasma etching process. In the method for removing particles according to the present invention, an etching process using a plasma is performed in a reaction chamber, and pumping is performed while flowing an inert gas into the reaction chamber in a plasma ON state.
따라서 본 발명에 의하면, 이러한 일련의 공정에 의하여 반응챔버내에서 발생되는 파티클을 충분히 제거할 수 있으므로 본 발명을 이용하면, 디바이스의 결함을 방지하여 수율을 높일 수 있다.Therefore, according to the present invention, since the particles generated in the reaction chamber can be sufficiently removed by the series of steps, the present invention can prevent defects in the device and increase the yield.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제1도 및 제2도는 각각 질화막과 산화막을 식각했을 경우 본 발명 및 종래 기술에 의한 방법으로 파티클을 제거한 후의 결과를 나타낸 도면이다.FIGS. 1 and 2 are views showing the results of removing the particles by the method of the present invention and the conventional method when the nitride film and the oxide film are etched, respectively.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960015542A KR970077308A (en) | 1996-05-11 | 1996-05-11 | How to Remove Particles in Plasma Etching Process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960015542A KR970077308A (en) | 1996-05-11 | 1996-05-11 | How to Remove Particles in Plasma Etching Process |
Publications (1)
Publication Number | Publication Date |
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KR970077308A true KR970077308A (en) | 1997-12-12 |
Family
ID=66219967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1019960015542A KR970077308A (en) | 1996-05-11 | 1996-05-11 | How to Remove Particles in Plasma Etching Process |
Country Status (1)
Country | Link |
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KR (1) | KR970077308A (en) |
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1996
- 1996-05-11 KR KR1019960015542A patent/KR970077308A/en not_active Application Discontinuation
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