KR970064172U - 압력조절장치 - Google Patents

압력조절장치

Info

Publication number
KR970064172U
KR970064172U KR2019960011922U KR19960011922U KR970064172U KR 970064172 U KR970064172 U KR 970064172U KR 2019960011922 U KR2019960011922 U KR 2019960011922U KR 19960011922 U KR19960011922 U KR 19960011922U KR 970064172 U KR970064172 U KR 970064172U
Authority
KR
South Korea
Prior art keywords
pressure regulating
regulating device
pressure
regulating
Prior art date
Application number
KR2019960011922U
Other languages
English (en)
Other versions
KR200145599Y1 (ko
Inventor
최창식
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019960011922U priority Critical patent/KR200145599Y1/ko
Publication of KR970064172U publication Critical patent/KR970064172U/ko
Application granted granted Critical
Publication of KR200145599Y1 publication Critical patent/KR200145599Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45557—Pulsed pressure or control pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR2019960011922U 1996-05-15 1996-05-15 압력조절장치 KR200145599Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960011922U KR200145599Y1 (ko) 1996-05-15 1996-05-15 압력조절장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960011922U KR200145599Y1 (ko) 1996-05-15 1996-05-15 압력조절장치

Publications (2)

Publication Number Publication Date
KR970064172U true KR970064172U (ko) 1997-12-11
KR200145599Y1 KR200145599Y1 (ko) 1999-06-15

Family

ID=19456139

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960011922U KR200145599Y1 (ko) 1996-05-15 1996-05-15 압력조절장치

Country Status (1)

Country Link
KR (1) KR200145599Y1 (ko)

Also Published As

Publication number Publication date
KR200145599Y1 (ko) 1999-06-15

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
O032 Opposition [utility model]: request for opposition
O131 Decision on opposition [utility model]
O062 Revocation of registration by opposition: final registration of opposition [utility model]
LAPS Lapse due to unpaid annual fee