KR970052843U - Strip alignment device - Google Patents
Strip alignment deviceInfo
- Publication number
- KR970052843U KR970052843U KR2019960001641U KR19960001641U KR970052843U KR 970052843 U KR970052843 U KR 970052843U KR 2019960001641 U KR2019960001641 U KR 2019960001641U KR 19960001641 U KR19960001641 U KR 19960001641U KR 970052843 U KR970052843 U KR 970052843U
- Authority
- KR
- South Korea
- Prior art keywords
- alignment device
- strip alignment
- strip
- alignment
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019960001641U KR200143491Y1 (en) | 1996-02-03 | 1996-02-03 | Strip array apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019960001641U KR200143491Y1 (en) | 1996-02-03 | 1996-02-03 | Strip array apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970052843U true KR970052843U (en) | 1997-09-08 |
KR200143491Y1 KR200143491Y1 (en) | 1999-06-15 |
Family
ID=19450096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019960001641U KR200143491Y1 (en) | 1996-02-03 | 1996-02-03 | Strip array apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200143491Y1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100363738B1 (en) * | 2000-04-18 | 2002-12-06 | 동양반도체장비 주식회사 | Material alignment device of marking apparatus for semiconductor |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100778737B1 (en) * | 2001-12-20 | 2007-11-23 | 주식회사 포스코 | Wiper capable of controlling a minute gap |
-
1996
- 1996-02-03 KR KR2019960001641U patent/KR200143491Y1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100363738B1 (en) * | 2000-04-18 | 2002-12-06 | 동양반도체장비 주식회사 | Material alignment device of marking apparatus for semiconductor |
Also Published As
Publication number | Publication date |
---|---|
KR200143491Y1 (en) | 1999-06-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20041220 Year of fee payment: 7 |
|
LAPS | Lapse due to unpaid annual fee |