KR970046751U - 열판 온도 제어장치 - Google Patents

열판 온도 제어장치

Info

Publication number
KR970046751U
KR970046751U KR2019950051890U KR19950051890U KR970046751U KR 970046751 U KR970046751 U KR 970046751U KR 2019950051890 U KR2019950051890 U KR 2019950051890U KR 19950051890 U KR19950051890 U KR 19950051890U KR 970046751 U KR970046751 U KR 970046751U
Authority
KR
South Korea
Prior art keywords
temperature controller
hot plate
plate temperature
hot
controller
Prior art date
Application number
KR2019950051890U
Other languages
English (en)
Other versions
KR0134717Y1 (ko
Inventor
김학문
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019950051890U priority Critical patent/KR0134717Y1/ko
Publication of KR970046751U publication Critical patent/KR970046751U/ko
Application granted granted Critical
Publication of KR0134717Y1 publication Critical patent/KR0134717Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019950051890U 1995-12-29 1995-12-29 열판 온도 제어장치 KR0134717Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950051890U KR0134717Y1 (ko) 1995-12-29 1995-12-29 열판 온도 제어장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950051890U KR0134717Y1 (ko) 1995-12-29 1995-12-29 열판 온도 제어장치

Publications (2)

Publication Number Publication Date
KR970046751U true KR970046751U (ko) 1997-07-31
KR0134717Y1 KR0134717Y1 (ko) 1999-03-20

Family

ID=19441358

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950051890U KR0134717Y1 (ko) 1995-12-29 1995-12-29 열판 온도 제어장치

Country Status (1)

Country Link
KR (1) KR0134717Y1 (ko)

Also Published As

Publication number Publication date
KR0134717Y1 (ko) 1999-03-20

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
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Payment date: 20050922

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