KR970046673U - Wafer Cooling System - Google Patents

Wafer Cooling System

Info

Publication number
KR970046673U
KR970046673U KR2019950039480U KR19950039480U KR970046673U KR 970046673 U KR970046673 U KR 970046673U KR 2019950039480 U KR2019950039480 U KR 2019950039480U KR 19950039480 U KR19950039480 U KR 19950039480U KR 970046673 U KR970046673 U KR 970046673U
Authority
KR
South Korea
Prior art keywords
cooling system
wafer cooling
wafer
cooling
Prior art date
Application number
KR2019950039480U
Other languages
Korean (ko)
Other versions
KR0132421Y1 (en
Inventor
맹주완
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950039480U priority Critical patent/KR0132421Y1/en
Publication of KR970046673U publication Critical patent/KR970046673U/en
Application granted granted Critical
Publication of KR0132421Y1 publication Critical patent/KR0132421Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR2019950039480U 1995-12-09 1995-12-09 Cooling system of wafer KR0132421Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950039480U KR0132421Y1 (en) 1995-12-09 1995-12-09 Cooling system of wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950039480U KR0132421Y1 (en) 1995-12-09 1995-12-09 Cooling system of wafer

Publications (2)

Publication Number Publication Date
KR970046673U true KR970046673U (en) 1997-07-31
KR0132421Y1 KR0132421Y1 (en) 1999-02-01

Family

ID=19432814

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950039480U KR0132421Y1 (en) 1995-12-09 1995-12-09 Cooling system of wafer

Country Status (1)

Country Link
KR (1) KR0132421Y1 (en)

Also Published As

Publication number Publication date
KR0132421Y1 (en) 1999-02-01

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
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Payment date: 20040820

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee