KR970046630U - Integral gas injector - Google Patents

Integral gas injector

Info

Publication number
KR970046630U
KR970046630U KR2019950052648U KR19950052648U KR970046630U KR 970046630 U KR970046630 U KR 970046630U KR 2019950052648 U KR2019950052648 U KR 2019950052648U KR 19950052648 U KR19950052648 U KR 19950052648U KR 970046630 U KR970046630 U KR 970046630U
Authority
KR
South Korea
Prior art keywords
gas injector
integral gas
integral
injector
gas
Prior art date
Application number
KR2019950052648U
Other languages
Korean (ko)
Other versions
KR200158123Y1 (en
Inventor
김상윤
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019950052648U priority Critical patent/KR200158123Y1/en
Publication of KR970046630U publication Critical patent/KR970046630U/en
Application granted granted Critical
Publication of KR200158123Y1 publication Critical patent/KR200158123Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR2019950052648U 1995-12-29 1995-12-29 Built-in gas injector KR200158123Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950052648U KR200158123Y1 (en) 1995-12-29 1995-12-29 Built-in gas injector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950052648U KR200158123Y1 (en) 1995-12-29 1995-12-29 Built-in gas injector

Publications (2)

Publication Number Publication Date
KR970046630U true KR970046630U (en) 1997-07-31
KR200158123Y1 KR200158123Y1 (en) 1999-10-15

Family

ID=19441831

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950052648U KR200158123Y1 (en) 1995-12-29 1995-12-29 Built-in gas injector

Country Status (1)

Country Link
KR (1) KR200158123Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102323078B1 (en) * 2014-11-05 2021-11-10 세메스 주식회사 Apparatus for treating substrate

Also Published As

Publication number Publication date
KR200158123Y1 (en) 1999-10-15

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20050621

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee