KR970030246A - Multi-chamber semiconductor device manufacturing facility - Google Patents

Multi-chamber semiconductor device manufacturing facility Download PDF

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Publication number
KR970030246A
KR970030246A KR1019950042516A KR19950042516A KR970030246A KR 970030246 A KR970030246 A KR 970030246A KR 1019950042516 A KR1019950042516 A KR 1019950042516A KR 19950042516 A KR19950042516 A KR 19950042516A KR 970030246 A KR970030246 A KR 970030246A
Authority
KR
South Korea
Prior art keywords
chamber
process chamber
load lock
semiconductor device
device manufacturing
Prior art date
Application number
KR1019950042516A
Other languages
Korean (ko)
Other versions
KR100187372B1 (en
Inventor
심경보
김기상
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950042516A priority Critical patent/KR100187372B1/en
Publication of KR970030246A publication Critical patent/KR970030246A/en
Application granted granted Critical
Publication of KR100187372B1 publication Critical patent/KR100187372B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

가동효율을 높일 수 있는 구성의 멀티챔버형 반도체소자 제조설비가 개시되어 있다.Disclosed is a multi-chambered semiconductor device manufacturing facility having a configuration capable of increasing operation efficiency.

본 발명은 로드록챔버와 상기 로드록챔버에 연결되는 복수개의 공정챔버를 구비하는 멀티챔버형 반도체 제조설비에 있어서, 분리되지 않는 다른 공정챔버 및 로드록챔버의 가동을 중지함이 없이 특정 공정챔버에 대한 작업이 가능하도록 상기 각 공정챔버가 상기 반도체 제조설비에 대해 착탈가능하게 연결되는 것을 특징으로 한다.The present invention relates to a multi-chamber semiconductor manufacturing apparatus having a load lock chamber and a plurality of process chambers connected to the load lock chamber, wherein the process chamber and the load lock chamber are not stopped. Each process chamber is detachably connected with respect to the semiconductor manufacturing equipment so as to be able to work on.

따라서, 공정챔버의 보수, 청소, 등의 작업을 용이하고 빠르게 하고 예비 공정챔버를 운용할 수 있게 하므로 설비의 가동효율을 높일 수 있는 효과를 가진다.Therefore, the maintenance, cleaning, and the like of the process chamber can be easily and quickly performed, and the preliminary process chamber can be operated, thereby increasing the operation efficiency of the facility.

Description

멀티챔버형 반도체소자 제조설비Multi-chamber semiconductor device manufacturing facility

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명의 일 실시예에 따른 착탈식 멀티챔버형 반도체소자 제조설비를 개략적으로 나타낸 평면도.Figure 2 is a plan view schematically showing a removable multi-chamber semiconductor device manufacturing equipment according to an embodiment of the present invention.

Claims (3)

로드록챔버와 상기 로드록챔버에 연결되는 복수개의공정챔버를 구비하는 멀티챔버형 반도체소자 제조설비에 있어서, 분리되지 않는 다른 공정챔버 및 로드록챔버의 가동을 중지함이 없이 특정 공정챔버에 대한 작업이 가능하도록 상기 각 공정챔버가 상기 제조설비에 대해 착탈가능하게 연결되는 것을 특징으로 하는 멀티챔버형 반도체소자 제조설비.A multi-chamber semiconductor device manufacturing apparatus having a load lock chamber and a plurality of process chambers connected to the load lock chamber, wherein the process chamber and the load lock chamber are not stopped. The process chamber is a multi-chamber semiconductor device manufacturing equipment, characterized in that the process chamber is detachably connected to the manufacturing equipment to enable work. 제1항에 있어서, 상기 공정챔버와 상기 로드록챔버는 이중 슬릿밸브로 연결되어 상기 공정챔버가 분리될 때 상기 공정챔버측에 형성된 슬릿밸브는 공정챔버를 밀폐하고, 상기 로드록챔버측에 형성된 다른 하나의 슬릿밸브는 로드록챔버를 밀폐하도록 이루어진 것을 특징으로 하는 상기 멀티챔버형 반도체소자 제조설비.The slit valve of claim 1, wherein the process chamber and the load lock chamber are connected to a double slit valve so that the slit valve formed on the process chamber side seals the process chamber and is formed on the load lock chamber side when the process chamber is separated. The other slit valve is the multi-chamber type semiconductor device manufacturing equipment, characterized in that made to seal the load lock chamber. 제1항에 있어서, 상기 제조설비에 상기 공정챔버를 분리하여 필요한 작업을 완료한 후 예비 공정챔버로 보관하기 위한 별도의 공간이 설치되는 것을 특징으로 하는 상기 멀티챔버형 반도체소자 제조설비.The multi-chamber type semiconductor device manufacturing apparatus according to claim 1, wherein a separate space is provided in the manufacturing facility to separate the process chamber and complete the necessary work and to store the process chamber as a preliminary process chamber.
KR1019950042516A 1995-11-21 1995-11-21 Multi-chamber semiconductor device fabricating system KR100187372B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950042516A KR100187372B1 (en) 1995-11-21 1995-11-21 Multi-chamber semiconductor device fabricating system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950042516A KR100187372B1 (en) 1995-11-21 1995-11-21 Multi-chamber semiconductor device fabricating system

Publications (2)

Publication Number Publication Date
KR970030246A true KR970030246A (en) 1997-06-26
KR100187372B1 KR100187372B1 (en) 1999-10-01

Family

ID=19434936

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950042516A KR100187372B1 (en) 1995-11-21 1995-11-21 Multi-chamber semiconductor device fabricating system

Country Status (1)

Country Link
KR (1) KR100187372B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100427816B1 (en) * 1999-12-15 2004-04-30 주성엔지니어링(주) Apparatus for fabricating semiconductor devices

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100961467B1 (en) 2007-12-27 2010-06-08 세메스 주식회사 Slit valve and apparatus for substrate processing having the valve

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100427816B1 (en) * 1999-12-15 2004-04-30 주성엔지니어링(주) Apparatus for fabricating semiconductor devices

Also Published As

Publication number Publication date
KR100187372B1 (en) 1999-10-01

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