KR970023947A - Chemical and Gas Leak Detectors in Semiconductor Manufacturing Systems - Google Patents

Chemical and Gas Leak Detectors in Semiconductor Manufacturing Systems Download PDF

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Publication number
KR970023947A
KR970023947A KR1019950037816A KR19950037816A KR970023947A KR 970023947 A KR970023947 A KR 970023947A KR 1019950037816 A KR1019950037816 A KR 1019950037816A KR 19950037816 A KR19950037816 A KR 19950037816A KR 970023947 A KR970023947 A KR 970023947A
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KR
South Korea
Prior art keywords
chemical
gas
leakage
semiconductor manufacturing
sensing means
Prior art date
Application number
KR1019950037816A
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Korean (ko)
Inventor
백인학
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950037816A priority Critical patent/KR970023947A/en
Publication of KR970023947A publication Critical patent/KR970023947A/en

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  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

케미칼 및 가스를 공급하는 배관의 분기되는 지점에 센서를 설치하여 케미칼 및 가스가 누설됨을 감지하여 경보를 발생시키는 반도체 제조 시스템의 케미칼 및 가스 누설 감지장치가 개시되어 있다.A chemical and gas leakage detecting apparatus of a semiconductor manufacturing system is disclosed, in which a sensor is installed at a branching point of a pipe supplying chemical and gas to detect leakage of chemical and gas to generate an alarm.

본 발명에 따른 감지장치는, 케미칼 및 가스가 공급원으로부터 공급배관을 통하여 다단분기되어 복수의 제조 설비로 공급토록 구성된 반도체 제조 장치에서 상기 공급라인의 다단 분기되는 각 위치에 설치되어 상기 케미칼 및 가스의 누설을 감지할 수 있는 센싱수단 및 상기 센싱수단과 전기적으로 접속되어 상기 센싱수단의 전기적 상태에 따라 누설 경보를 발생시키는 모니터링 수단을 포함하여 구성된다.The sensing device according to the present invention is provided in each position where the chemical and gas are multi-stage branched from the supply line in a semiconductor manufacturing apparatus configured to be multi-stage branched from a supply source through a supply pipe and supplied to a plurality of manufacturing facilities. Sensing means for detecting the leakage and the monitoring means electrically connected to the sensing means for generating a leakage alarm in accordance with the electrical state of the sensing means.

따라서, 케미칼 및 가스 공급라인에서 누설이 발생시 누설지점을 정확히 알고 대응함으로써 누설에의한 피해를 최소화 할 수 있다는 효과가 있다.Therefore, when leakage occurs in the chemical and gas supply lines, it is possible to minimize the damage caused by leakage by accurately knowing and responding to the leak point.

Description

반도체 제조 시스템의 케미칼 및 가스 누설 감지장치Chemical and Gas Leak Detectors in Semiconductor Manufacturing Systems

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제 1 도는 본 발명의 일 실시예를 나타내는 개략적인 블럭도이다.1 is a schematic block diagram illustrating an embodiment of the present invention.

Claims (2)

케미칼 및 가스가 공급원으로부터 공급배관을 통하여 다단분기되어 복수의 제조설비로 공급토록 구성된 반도체 제조 장치에있어서, 상기 공급라인의 다단 분기되는 각 위치에 설치되어 상기 케미칼 및 가스의 누설을 감지할 수 있는 센싱수단; 및 상기 센싱수단과 전기적으로 접속되어 상기 센싱수단의 전기적 상태에 따라 누설 경보를 발생시키는 모니터링 수단; 을 포함하여 구성됨을 특징으로 하는 반도체 제조 시스템의 케미칼 및 가스 누설 감지장치.In a semiconductor manufacturing apparatus configured to supply a plurality of chemicals and gas through a supply pipe from a supply source to a plurality of manufacturing facilities, each of the plurality of locations in the supply line may be installed to detect leakage of the chemical and gas. Sensing means; And monitoring means electrically connected to the sensing means to generate a leakage alarm according to the electrical state of the sensing means. Chemical and gas leak detection device of a semiconductor manufacturing system comprising a. 제 1 항에 있어서, 상기 센싱수단은 내부에 전선이 통과하는 케이블의 소정위치에 케이블의 피복을 천공하여 설치된 센서판으로 구성되어 있으며, 누설된 케미칼이 접촉하면 전선간에 합선이 일어나 상기 모니터링 수단에서 경보가 발생하는 것을 특징으로 하는 상기 반도체 제조 시스템의 케미칼 및 가스 누설 감지장치.The method of claim 1, wherein the sensing means is composed of a sensor plate installed by puncturing the sheath of the cable at a predetermined position of the cable through which the wire passes, and when the leaked chemical contact the short circuit occurs between the wires in the monitoring means Chemical and gas leakage detection device of the semiconductor manufacturing system, characterized in that the alarm occurs. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950037816A 1995-10-28 1995-10-28 Chemical and Gas Leak Detectors in Semiconductor Manufacturing Systems KR970023947A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950037816A KR970023947A (en) 1995-10-28 1995-10-28 Chemical and Gas Leak Detectors in Semiconductor Manufacturing Systems

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950037816A KR970023947A (en) 1995-10-28 1995-10-28 Chemical and Gas Leak Detectors in Semiconductor Manufacturing Systems

Publications (1)

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KR970023947A true KR970023947A (en) 1997-05-30

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KR1019950037816A KR970023947A (en) 1995-10-28 1995-10-28 Chemical and Gas Leak Detectors in Semiconductor Manufacturing Systems

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100296453B1 (en) * 1997-11-26 2001-10-25 윤종용 Apparatus and method for detecting leakage of water in semiconductor fabricating equipment
KR100349358B1 (en) * 1999-12-11 2002-08-21 주식회사 하이닉스반도체 A Gas Supplying apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100296453B1 (en) * 1997-11-26 2001-10-25 윤종용 Apparatus and method for detecting leakage of water in semiconductor fabricating equipment
KR100349358B1 (en) * 1999-12-11 2002-08-21 주식회사 하이닉스반도체 A Gas Supplying apparatus

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