KR970022535A - How to make contact mask - Google Patents

How to make contact mask Download PDF

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Publication number
KR970022535A
KR970022535A KR1019950034942A KR19950034942A KR970022535A KR 970022535 A KR970022535 A KR 970022535A KR 1019950034942 A KR1019950034942 A KR 1019950034942A KR 19950034942 A KR19950034942 A KR 19950034942A KR 970022535 A KR970022535 A KR 970022535A
Authority
KR
South Korea
Prior art keywords
photoresist
film
pattern
mask
interlayer material
Prior art date
Application number
KR1019950034942A
Other languages
Korean (ko)
Inventor
차동호
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950034942A priority Critical patent/KR970022535A/en
Publication of KR970022535A publication Critical patent/KR970022535A/en

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Abstract

본 발명은 미세한 콘택 마스크의 제작방법에 관해 게시한다. 재래식 콘택 마스크로는 초고집적도의 반도체 장치의 콘택홀을 형성하는데 한계에 도달했다. 따라서 본 발명은 초고집적도의 콘택홀에 적합한 콘택 마스크의 제작방법을 제공한다. 본 발명은 마스크 기판상에 차광막, 제1포토레지스트막, 층간물질막 및 제2포토레지스트막을 순차적으로 적층하는 단계와, 상기 제2포토레지스트막을 패더닝하여 제2포토레지스트 패턴을 형성하는 단계와, 상기 제2포토레지스트 패턴을 마스크로 상기 층간물질막을 경사식각하여 층간물질막 패턴을 형성하는 단계와, 상기 적층물질막 패턴을 마스크로 제1포토레지스트막과 차광막을 식각하는 단계 및 상기 제2포토레지스트 패턴, 층간물질막 패턴, 제1포토레지스트막을 제거하는 단계를 제공한다.The present invention discloses a method for manufacturing a fine contact mask. Conventional contact masks have reached a limit in forming contact holes of ultra-high integration semiconductor devices. Accordingly, the present invention provides a method of manufacturing a contact mask suitable for ultra high integration contact holes. According to an embodiment of the present invention, a light blocking film, a first photoresist film, an interlayer material film, and a second photoresist film are sequentially stacked on a mask substrate, and the second photoresist film is patterned to form a second photoresist pattern. Forming an interlayer material layer pattern by etching the interlayer material layer using the second photoresist pattern as a mask, etching the first photoresist layer and the light shielding layer using the layered material layer pattern as a mask, and the second layer A step of removing the photoresist pattern, the interlayer material film pattern, and the first photoresist film is provided.

Description

콘택 마스크 제작방법How to make contact mask

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제12도는 본 발명의 콘택용 마스크 제작단계를 도시한 단면도.12 is a cross-sectional view showing a step of manufacturing a contact mask of the present invention.

Claims (1)

마스크 기판상에 차광막, 제1포토레지스트막, 층간물질막 및 제2포토레지스트막을 순차적으로 적층하는 단계; 상기 제2포토레지스트막을 패터닝하여 제2포토레지스트 패턴을 형성하는 단계; 상기 제2포토레지스트 패턴을 마스크로 상기 층간물질막을 경사식각하여 층간물질막 패턴을 형성하는 단계; 상기 층간물질막 패턴을Sequentially depositing a light blocking film, a first photoresist film, an interlayer material film, and a second photoresist film on a mask substrate; Patterning the second photoresist film to form a second photoresist pattern; Forming an interlayer material layer pattern by tilting the interlayer material layer using the second photoresist pattern as a mask; The interlayer material film pattern 마스크로 제1포토레지스트막과 차광막을 식각하는 단계; 및 상기 제2포토레지스트 패턴, 층간물질막 패턴, 제1포토레지스트막을 제거하는 단계를 포함하는 것을 특징으로 하는 콘택 마스크 제작방법.Etching the first photoresist film and the light shielding film with a mask; And removing the second photoresist pattern, the interlayer material layer pattern, and the first photoresist layer. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950034942A 1995-10-11 1995-10-11 How to make contact mask KR970022535A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950034942A KR970022535A (en) 1995-10-11 1995-10-11 How to make contact mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950034942A KR970022535A (en) 1995-10-11 1995-10-11 How to make contact mask

Publications (1)

Publication Number Publication Date
KR970022535A true KR970022535A (en) 1997-05-30

Family

ID=66582553

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950034942A KR970022535A (en) 1995-10-11 1995-10-11 How to make contact mask

Country Status (1)

Country Link
KR (1) KR970022535A (en)

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