KR970022535A - How to make contact mask - Google Patents
How to make contact mask Download PDFInfo
- Publication number
- KR970022535A KR970022535A KR1019950034942A KR19950034942A KR970022535A KR 970022535 A KR970022535 A KR 970022535A KR 1019950034942 A KR1019950034942 A KR 1019950034942A KR 19950034942 A KR19950034942 A KR 19950034942A KR 970022535 A KR970022535 A KR 970022535A
- Authority
- KR
- South Korea
- Prior art keywords
- photoresist
- film
- pattern
- mask
- interlayer material
- Prior art date
Links
Abstract
본 발명은 미세한 콘택 마스크의 제작방법에 관해 게시한다. 재래식 콘택 마스크로는 초고집적도의 반도체 장치의 콘택홀을 형성하는데 한계에 도달했다. 따라서 본 발명은 초고집적도의 콘택홀에 적합한 콘택 마스크의 제작방법을 제공한다. 본 발명은 마스크 기판상에 차광막, 제1포토레지스트막, 층간물질막 및 제2포토레지스트막을 순차적으로 적층하는 단계와, 상기 제2포토레지스트막을 패더닝하여 제2포토레지스트 패턴을 형성하는 단계와, 상기 제2포토레지스트 패턴을 마스크로 상기 층간물질막을 경사식각하여 층간물질막 패턴을 형성하는 단계와, 상기 적층물질막 패턴을 마스크로 제1포토레지스트막과 차광막을 식각하는 단계 및 상기 제2포토레지스트 패턴, 층간물질막 패턴, 제1포토레지스트막을 제거하는 단계를 제공한다.The present invention discloses a method for manufacturing a fine contact mask. Conventional contact masks have reached a limit in forming contact holes of ultra-high integration semiconductor devices. Accordingly, the present invention provides a method of manufacturing a contact mask suitable for ultra high integration contact holes. According to an embodiment of the present invention, a light blocking film, a first photoresist film, an interlayer material film, and a second photoresist film are sequentially stacked on a mask substrate, and the second photoresist film is patterned to form a second photoresist pattern. Forming an interlayer material layer pattern by etching the interlayer material layer using the second photoresist pattern as a mask, etching the first photoresist layer and the light shielding layer using the layered material layer pattern as a mask, and the second layer A step of removing the photoresist pattern, the interlayer material film pattern, and the first photoresist film is provided.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제12도는 본 발명의 콘택용 마스크 제작단계를 도시한 단면도.12 is a cross-sectional view showing a step of manufacturing a contact mask of the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950034942A KR970022535A (en) | 1995-10-11 | 1995-10-11 | How to make contact mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950034942A KR970022535A (en) | 1995-10-11 | 1995-10-11 | How to make contact mask |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970022535A true KR970022535A (en) | 1997-05-30 |
Family
ID=66582553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950034942A KR970022535A (en) | 1995-10-11 | 1995-10-11 | How to make contact mask |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970022535A (en) |
-
1995
- 1995-10-11 KR KR1019950034942A patent/KR970022535A/en not_active Application Discontinuation
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WITN | Withdrawal due to no request for examination |