KR970008320A - Exposure apparatus and its operation method - Google Patents

Exposure apparatus and its operation method Download PDF

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Publication number
KR970008320A
KR970008320A KR1019950021104A KR19950021104A KR970008320A KR 970008320 A KR970008320 A KR 970008320A KR 1019950021104 A KR1019950021104 A KR 1019950021104A KR 19950021104 A KR19950021104 A KR 19950021104A KR 970008320 A KR970008320 A KR 970008320A
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KR
South Korea
Prior art keywords
stage
reticle
horizontal plane
exposure apparatus
conveying means
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Application number
KR1019950021104A
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Korean (ko)
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KR0183641B1 (en
Inventor
하응주
Original Assignee
이대원
삼성항공산업 주식회사
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Priority to KR1019950021104A priority Critical patent/KR0183641B1/en
Publication of KR970008320A publication Critical patent/KR970008320A/en
Application granted granted Critical
Publication of KR0183641B1 publication Critical patent/KR0183641B1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

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  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

본 발명은 반도체 노광 장치 및 그의 운용 방법에 관한 것이다. 본 발명에 따르면, 다수의 래티클을 구비하는 래티클 적재 수단(24), 상기 래티클을 상부에 복수개로 배치할 수 있는 것으로서 수평면상의 직각 방향 운동 및 회전 운동이 가능한 스테이지 수단(22) 및, 상기 래티클을 파지하여 수평면상의 직각 방향, 수직방향 및, 회전 운동을 할 수 있는 래티클 이송 수단(21)을 포함하는 반도체 가공용 노광 장치가 제공된다. 본 발명에 따른 노광 장비는 종래 기술과는 달리 복수개의 매니풀레이터나 중간 매개 역할을 하는 플랫포옴이 없이 직접적으로 래티클을 스테이지에 배치할 수 있도록 구성되어 있으므로 매우 효율적은 작업이 이루어진다.The present invention relates to a semiconductor exposure apparatus and its operation method. According to the present invention, a reticle stacking means 24 having a plurality of reticles, stage means 22 capable of orthogonal and rotational movements on a horizontal plane as having a plurality of the reticles disposed thereon, and There is provided an exposure apparatus for semiconductor processing, comprising a reticle conveying means (21) capable of holding the reticle in a vertical direction, a vertical direction, and a rotational movement on a horizontal plane. Unlike the prior art, the exposure apparatus according to the present invention is configured so that the reticle can be directly placed on the stage without a plurality of manipulators or a platform serving as an intermediate medium.

Description

노광 장치 및 그의 운용 방법Exposure apparatus and its operation method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도는 본 발명의 노광 장치에 대한 개략적인 사시도, 제3도는 본 발명의 노광 장치 운용 방법을 예시하는 간략화된 평면도.2 is a schematic perspective view of an exposure apparatus of the present invention, and FIG. 3 is a simplified plan view illustrating a method of operating the exposure apparatus of the present invention.

Claims (7)

다수의 래티클을 구비하는 래티클 적재 수단(24), 상기 래티클을 상부에 복수개로 배치할 수 있는 것으로서 수평면상의 직각 방향 운동 및 회전 운동이 가능한 스테이지 수단(22) 및, 상기 래티클을 파지하여 수평면상의 직각 방향, 수직 방향 및, 회전 운동을 할 수 있는 단일의 래티클 이송 수단(21)을 포함하는 반도체 가공용 노광 장치.A reticle stacking means 24 having a plurality of reticles, a stage means 22 capable of arranging a plurality of the reticles on the top, and capable of performing perpendicular and rotational movements on a horizontal plane, and holding the reticle And a single reticle conveying means (21) capable of performing a right-angle direction, a vertical direction, and a rotational movement on a horizontal plane. 제1항에 있어서, 상기 래티클 이송 수단(21)은 래티클 파지 핸드(28)의 수평, 수직 및 회전 운동을 발생시킬 수 있도록 제1축 이송부(24), 상기 제1축에 직각인 제2축 이송부(25), 상기 제1축과 제2축에 직각인 제3축 이송부(26)와 회전부(27)를 구비하는 것을 특징으로 하는 반도체 가공용 노광 장치.2. The reticle conveying means (21) according to claim 1, characterized in that the reticle conveying means (21) comprises a first axis feed (24), perpendicular to the first axis to generate horizontal, vertical and rotational movements of the reticle gripping hand (28). And a biaxial feed section (25), a third shaft feed section (26) and a rotating section (27) perpendicular to said first and second axes. 수평면상의 직각 방향 운동 또는 회전 운동이 가능한 스테이지 위에, 수평면상의 직각 방향 운동, 수직 방향 운동 및 회전 운동이 가능한 래티클 이송 수단으로 래티클을 로딩하거나 또는 언로딩하는 노광 장치 운용 방법.A method of operating an exposure apparatus for loading or unloading a reticle on a stage on which a perpendicular motion or a rotational motion on a horizontal plane is possible, by a reticle conveying means capable of a perpendicular motion, a vertical motion and a rotational motion on a horizontal plane. 제3항에 있어서, 상기 스테이지(22)는 수평면상의 제1축 방향 운동만을 일으키고, 상기 래티클 이송 수단(21)의 로딩/언로딩 위치는 상기 제1축 방향을 따라서 어느 한곳(36)에만 있는 것을 특징으로 하는 노광 장치 운용 방법.4. The stage (22) according to claim 3, wherein the stage (22) causes only a first axial movement on a horizontal plane, and the loading / unloading position of the reticle conveying means (21) is only at one location (36) along the first axial direction. The exposure apparatus operating method characterized by the above-mentioned. 제3항에 있어서, 상기 스테이지(22)는 제1축 방향 운동만을 일으키고, 상기 래티클 이송 수단(41)의 로딩/언로딩 위치는 상기 제1축 방향을 따라서 복수의 위치(48,49)에 있는 것을 특징으로 하는 노광 장치 운용 방법.4. The stage (22) according to claim 3, wherein the stage (22) produces only a first axial movement and the loading / unloading position of the reticle conveying means (41) is a plurality of positions (48, 49) along the first axial direction. Method for operating an exposure apparatus, characterized in that. 제3항에 있어서, 복수의 래티클을 상기 스테이지(62)상에 정방형으로 배열하고 상기 스테이지(52)가 수평면상의 직각 방향 운동만을 일으키는 것을 특징으로 하는 노광 장치 운용 방법.4. A method according to claim 3, characterized in that a plurality of reticles are arranged in a square on the stage (62) and the stage (52) produces only a right-angle movement on a horizontal plane. 제3항에 있어서, 복수의 래티클을 스테이지(62) 상에 원형으로 배열하고 상기 스테이지(62)는 회전 운동만을 일으키는 것을 특징으로 하는 노광 장치 운용 방법.4. A method according to claim 3, wherein a plurality of reticles are arranged in a circle on the stage (62) and the stage (62) causes only rotational movement. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950021104A 1995-07-18 1995-07-18 Exposure apparatus and its operation method KR0183641B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950021104A KR0183641B1 (en) 1995-07-18 1995-07-18 Exposure apparatus and its operation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950021104A KR0183641B1 (en) 1995-07-18 1995-07-18 Exposure apparatus and its operation method

Publications (2)

Publication Number Publication Date
KR970008320A true KR970008320A (en) 1997-02-24
KR0183641B1 KR0183641B1 (en) 1999-04-15

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