KR970003159U - Spray nozzle for cleaning exposed parts for exposure machine - Google Patents
Spray nozzle for cleaning exposed parts for exposure machineInfo
- Publication number
- KR970003159U KR970003159U KR2019940013366U KR19950013366U KR970003159U KR 970003159 U KR970003159 U KR 970003159U KR 2019940013366 U KR2019940013366 U KR 2019940013366U KR 19950013366 U KR19950013366 U KR 19950013366U KR 970003159 U KR970003159 U KR 970003159U
- Authority
- KR
- South Korea
- Prior art keywords
- spray nozzle
- exposure machine
- exposed parts
- cleaning exposed
- cleaning
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Physics & Mathematics (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940013366U KR200146396Y1 (en) | 1995-06-14 | 1995-06-14 | A lighting projection device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940013366U KR200146396Y1 (en) | 1995-06-14 | 1995-06-14 | A lighting projection device |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970003159U true KR970003159U (en) | 1997-01-24 |
KR200146396Y1 KR200146396Y1 (en) | 1999-06-15 |
Family
ID=19415503
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019940013366U KR200146396Y1 (en) | 1995-06-14 | 1995-06-14 | A lighting projection device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200146396Y1 (en) |
-
1995
- 1995-06-14 KR KR2019940013366U patent/KR200146396Y1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR200146396Y1 (en) | 1999-06-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20030227 Year of fee payment: 5 |
|
LAPS | Lapse due to unpaid annual fee |