KR970002478A - Exposure equipment - Google Patents

Exposure equipment Download PDF

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Publication number
KR970002478A
KR970002478A KR1019950016433A KR19950016433A KR970002478A KR 970002478 A KR970002478 A KR 970002478A KR 1019950016433 A KR1019950016433 A KR 1019950016433A KR 19950016433 A KR19950016433 A KR 19950016433A KR 970002478 A KR970002478 A KR 970002478A
Authority
KR
South Korea
Prior art keywords
support member
coupled
backward
exposure apparatus
support rod
Prior art date
Application number
KR1019950016433A
Other languages
Korean (ko)
Other versions
KR100252631B1 (en
Inventor
윤재호
Original Assignee
이대원
삼성항공산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이대원, 삼성항공산업 주식회사 filed Critical 이대원
Priority to KR1019950016433A priority Critical patent/KR100252631B1/en
Publication of KR970002478A publication Critical patent/KR970002478A/en
Application granted granted Critical
Publication of KR100252631B1 publication Critical patent/KR100252631B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

적재함으로부터 반출되는 글라스판이 아암으로부터 반출되는 과정에서 기울어진 상태로 반출되더라도, 이송되는 과정에서 바로 교정을 함으로서 글라스판에 노광이 균일하게 이루어지도록 하는 데에 있는 것으로서 그 구조는, 베이스 상에 수직되게 고정 설치되는 기둥과, 상기 기둥에 직각 방향으로 결합되면서 전,후로 슬라이드 되게 설치되는 지지봉과, 상기 지지봉의 선단부에 결합되어 지지봉과 함께 전,후진하는 “ㄷ”형상의 지지부재와, 상기 지지부재에서 전, 후진하는 동시에, 광섬유의 노광 광조준위치를 조정하는 조준부재가 구성된 노광 장치를 제공한다.Even if the glass plate taken out from the loading box is taken out in an inclined state in the process of being taken out from the arm, the structure is vertically placed on the base by correcting it immediately in the process of transportation so that the glass plate is uniformly exposed. A pillar to be fixedly installed, a support rod installed to slide forward and backward while being coupled to the pillar at a right angle, and a 'c' shaped support member coupled to the tip of the support rod to move forward and backward with the support rod, and the support member. In the present invention, an exposure apparatus is provided, wherein the aiming member is configured to adjust the exposure light collimation position of the optical fiber while moving forward and backward.

Description

노광 장치Exposure equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명이 설치된 노광 장치를 전체적으로 나타낸 사시도, 제2도는 본 발명의 사시도, 제3도는 본 발명의 단면도.1 is a perspective view of an overall exposure apparatus provided with the present invention, FIG. 2 is a perspective view of the present invention, and FIG. 3 is a sectional view of the present invention.

Claims (5)

베이스(2)상에 수직되게 고정 설치되는 기둥(8)과, 상기 기둥(8)에 직각 방향으로 결합되면서 전, 후로 슬라이드 되게 작용하는 지지봉(10)과, 상기 지지봉(10)의 선단부에 결합되어 지지봉(10)과 함께 전, 후진하는 “ㄷ”형상의지지부재(12)와, 상기 지지부재(12)의 선단에 설치되면서 광섬유(22)를 결합하고 있는 조준부재(16)가 구성된 것을 특징으로 하는 노광 장치.A pillar 8 fixedly installed on the base 2 perpendicularly, a support rod 10 coupled to the pillar 8 at right angles and sliding forward and backward, and coupled to a tip of the support rod 10. And a support member 12 having a “c” shaped support member 12 that is forward and backward with the support rod 10 and an aiming member 16 that is coupled to the optical fiber 22 while being installed at the tip of the support member 12. An exposure apparatus characterized by the above-mentioned. 제1항에 있어서, 상기 조준부재(16)가 지지부재(12)상에서 전,후로 슬라이드 되게 결합되면서 일측면에 고정나사(18)를 체결하되, 이 고정나사(18)의 선단부가 지지부재(12)의 둘레면과 접촉되게 설치된 것을 특징으로 하는 노광 장치.The method of claim 1, wherein the aiming member 16 is coupled to slide forward and backward on the support member 12, the fastening screw 18 is fastened to one side, the tip end of the fixing screw 18, the support member ( 12) An exposure apparatus, characterized in that it is installed in contact with the peripheral surface. 제1항에 있어서, 상기 지지봉(10)에 전,후진하는 지지부재(12)에 대하여 탄성력을 제공하는 스프링(14)이결합되어 설치된 것을 특징으로 하는 노광 장치.2. An exposure apparatus according to claim 1, wherein a spring (14) providing an elastic force with respect to the support member (12) forward and backward is coupled to the support rod (10). 제1항에 있어서, 상기 지지부재(12)에 축봉(28)이 고정되게 결합되어 설치되고, 동시에 상기 축봉(28)에 글라스판(4)의 이송을 안내하는 로울러(32)가 회전되게 결합되어 설치된 것을 특징으로 하는 노광 장치.According to claim 1, wherein the shaft member 28 is fixedly installed on the support member 12, and at the same time the roller 32 for guiding the transport of the glass plate 4 to the shaft rod 28 is rotatably coupled The exposure apparatus characterized by the above-mentioned. 제4항에 있어서, 상기 축봉(28)에 길이 방향을 따라 연통되는 관통공(26)이 형성되고, 이 축봉(28)의 상단부에 콤퓨레서(44)와 연결된 호우스(30)가 연결되며, 동시에 로울러(32)의 외주에 공급되는 압축공기가 외부로 토출되도록 하는 호울(34)이 형성된 것을 특징으로 하는 노광 장치.According to claim 4, The through-hole 26 is formed in the shaft 28 in communication in the longitudinal direction, the upper end of the shaft 28 is connected to the compressor 44, the hose 30 is connected And at the same time, the exposure apparatus characterized in that a hole (34) is formed to discharge the compressed air supplied to the outer circumference of the roller (32) to the outside. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950016433A 1995-06-20 1995-06-20 Exposure apparatus KR100252631B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950016433A KR100252631B1 (en) 1995-06-20 1995-06-20 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950016433A KR100252631B1 (en) 1995-06-20 1995-06-20 Exposure apparatus

Publications (2)

Publication Number Publication Date
KR970002478A true KR970002478A (en) 1997-01-24
KR100252631B1 KR100252631B1 (en) 2000-06-01

Family

ID=19417593

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950016433A KR100252631B1 (en) 1995-06-20 1995-06-20 Exposure apparatus

Country Status (1)

Country Link
KR (1) KR100252631B1 (en)

Also Published As

Publication number Publication date
KR100252631B1 (en) 2000-06-01

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