KR960042238A - Uses of cyclic polysaccharide inclusion compounds as charge control agents - Google Patents

Uses of cyclic polysaccharide inclusion compounds as charge control agents Download PDF

Info

Publication number
KR960042238A
KR960042238A KR1019960015263A KR19960015263A KR960042238A KR 960042238 A KR960042238 A KR 960042238A KR 1019960015263 A KR1019960015263 A KR 1019960015263A KR 19960015263 A KR19960015263 A KR 19960015263A KR 960042238 A KR960042238 A KR 960042238A
Authority
KR
South Korea
Prior art keywords
alkyl
aromatic
compound
aliphatic
cyclic
Prior art date
Application number
KR1019960015263A
Other languages
Korean (ko)
Inventor
바우어 뤼디거
토비아스 마콜트 한스
Original Assignee
짜우너, 루츠
훽스트 아크티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 짜우너, 루츠, 훽스트 아크티엔게젤샤프트 filed Critical 짜우너, 루츠
Publication of KR960042238A publication Critical patent/KR960042238A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00Developers
    • G03G9/08Developers with toner particles
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08BPOLYSACCHARIDES; DERIVATIVES THEREOF
    • C08B37/00Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
    • C08B37/0006Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
    • C08B37/0009Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid alpha-D-Glucans, e.g. polydextrose, alternan, glycogen; (alpha-1,4)(alpha-1,6)-D-Glucans; (alpha-1,3)(alpha-1,4)-D-Glucans, e.g. isolichenan or nigeran; (alpha-1,4)-D-Glucans; (alpha-1,3)-D-Glucans, e.g. pseudonigeran; Derivatives thereof
    • C08B37/0012Cyclodextrin [CD], e.g. cycle with 6 units (alpha), with 7 units (beta) and with 8 units (gamma), large-ring cyclodextrin or cycloamylose with 9 units or more; Derivatives thereof
    • C08B37/0015Inclusion compounds, i.e. host-guest compounds, e.g. polyrotaxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/03Powdery paints
    • C09D5/033Powdery paints characterised by the additives
    • C09D5/034Charge control agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00Developers
    • G03G9/08Developers with toner particles
    • G03G9/097Plasticisers; Charge controlling agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00Developers
    • G03G9/08Developers with toner particles
    • G03G9/097Plasticisers; Charge controlling agents
    • G03G9/09708Inorganic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00Developers
    • G03G9/08Developers with toner particles
    • G03G9/097Plasticisers; Charge controlling agents
    • G03G9/09733Organic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00Developers
    • G03G9/08Developers with toner particles
    • G03G9/097Plasticisers; Charge controlling agents
    • G03G9/09733Organic compounds
    • G03G9/09741Organic compounds cationic
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00Developers
    • G03G9/08Developers with toner particles
    • G03G9/097Plasticisers; Charge controlling agents
    • G03G9/09733Organic compounds
    • G03G9/09758Organic compounds comprising a heterocyclic ring

Abstract

3 내지 100개의 단량체성 사카라이드 단위를 함유하고, 그의 분자 골격내의 형성하는 환식 결합 폴리사카라이드인 호스트 화합물과 이 공동 속에 게스트 화합물로서 포함되는 1 이상의 화학적 화합물로 구성된 포접 화합물을 전자사진 토너 및 현상제, 마찰전기적으로 또는 동전기적으로 분무 가능한 분말과 분말 도료 및 일렉트렛 물질에서의 전하 조절제 및 하전 개선제로서 사용된다.An inclusion compound comprising 3 to 100 monomeric saccharide units, which is a cyclic-linked polysaccharide formed in its molecular skeleton, and at least one chemical compound contained as a guest compound in the cavity, Triboelectrically or electrokinetically sprayable powders and as charge control agents and charge control agents in powder coatings and electret materials.

Description

사이클릭 폴리사카라이드 포접 화합물의 전하 조절제로서의 용도Uses of cyclic polysaccharide inclusion compounds as charge control agents

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

Claims (17)

3 내지 100개의 단량체성 사카라이드 단위를 함유하고, 그의 분자 골격내에 공동을 형성하는 환식 결합 폴리사카라이드인 호스트 화합물과 이 공동 속에 게스트 화합물로서 포함되는 1 이상의 화학적 화합물로 구성된 포접 화합물의 전자사진 토너 및 현상제, 마찰전기적으로 또는 동전기적으로 분무 가능한 분말과 분말 도료 및 일렉트렛 물질에서의 전하 조절제 및 하전 개선제로서의 용도.An electrophotographic toner comprising a host compound which contains 3 to 100 monomeric saccharide units and is a cyclic bonded polysaccharide which forms a cavity in its molecular skeleton and an inclusion compound composed of at least one chemical compound contained as a guest compound in the cavity, And as developers, triboelectrically or electrostatically atomizable powders and as charge control agents and charge improving agents in powder coatings and electret materials. 제1항에 있어서, 상기 호스트 화합물이 하기 일반식(I)의 1,4-결합 피라노스 또는 일반식(Ⅱ)의 1,6-결합 피라노스인 용도.The use according to claim 1, wherein the host compound is a 1,4-linked pyranose of the general formula (I) or a 1,6-linked pyranose of the general formula (II). 〔상기 식에서, n1은 6 내지 100의 수이고, n2는 3 내지 100의 수이며, R1,R|2및 R3은 서로 독립적으로 동일하거나 상이하고, 하이드록실; 측쇄 또는 비측쇄, 사이클릭 또는 개쇄 C1-C30-알콕시; 측쇄 또는 비측쇄, 사이클릭 또는 개쇄 C2-C|30-알켄옥시(여기서, 알콕시 및 알켄옥시 라디칼은 부분적으로 또는 완전히 플로오르화 될 수 있다); 비치환-O-아릴(C6-C30), 또는 1 내지 5개의 C1-C30-알킬, 라디칼 또는 C1-C30-알콕시 라디칼에 의해 치환된 -O-아릴(C6-C30); -O-(C1-C|4)-알킬-(C6-C30)아릴; -O-C60-C70-풀레렌; -O-(알킬렌(C0-C30)-Y-알킬-(C1-C|30))x,-O-(아릴(C6-C30)-Y-아릴-(C1-C30))x,-O-(아릴(C6-C30)-Y-알킬-(C6-C30))|x,-O-(알킬렌-(C6-C30)-Y-아릴-(C6-C30)-알킬(C0-C|4))x{여기서, x는 1 내지 30, 바람직하게는 1 내지 2이고, Y는 화학 결합, O, S, SO2, PR4, PR4 3, Si, SiR4 2또는 NR4(여기서, 라디칼 R4는 수소. C1-C4-알킬 또는 C1-C4-알콕시이다)}; 라디칼-O-COR6(여기서, R6은 OH, 포화 또는 불포화, 측쇄 또는 비측쇄, 사이클릭 또는 개쇄(C1-C18-알킬, 부분적으로 플루오르화되거나 퍼플루오르화된 ((C1-C18)-알킬,페닐 또는 (C1-C18)-알킬-페닐이다.; 라디칼 -O-PR2 7또는 -O-PR2 7{여기서 R7는 수소, 메틸, 에틸, 프로필, 부틸, 비닐, 알릴, 이소프로필, 이소부틸, 네오펜틸, t-부틸, 사이클로헥실, 사이클로펜틸, 페닐, 톨릴, 벤질, 부분적으로 플루오르화되거나 퍼플루오르화된 알킬-(C1-C18) 및 O, OH, S 및 NR2 8(여기서, R8은 수소, C1-C8-알킬 또는 페닐이다)}; 라디칼-O-SO2R9(여기서, R9는 메틸, 에틸, 프로필, 부틸, 비닐, 알릴, 이소프로필, 이소부틸, 네오펜틸, t-부틸, 사이클로헥실, 사이클로펜틸, 페닐, 톨릴, 벤질, 부분적으로 플로오르화되거나 퍼플루오르화된 알킬-(C1-C18), O,OR8, S, 또는 NR2 8이다.);라디칼 -O-SiR10 3(여기서, R10은 메틸, 에틸, 프로필, 부틸, 비닐, 알릴, 이소프로필, 이소부틸, 네오펜틸,t-부틸, 사이클로헥실, 사이클로펜틸, 페닐, 톨릴, 부분적으로 플루오르화되거나 퍼플루오르화된 알킬-{(C1-C18),O, OR8, S, 또는 NR2 8이다); 라디칼 -O-BR11 3(여기서, R11은 메틸, 에틸, 프로필, 부틸, 비닐, 알릴, 이소프로필, 이소부틸, 네오펜틸, t-부틸, 사이클로헥실, 사이클로펜틸, 페닐, 톨릴, 부분적으로 플루오르화되거나 퍼플루오르화된 알킬(C1-C18), O, OH, OR8, S 또는 NR2 8이다.); 일반식 -NH2, -NHR12또는 -NR12 2의 아미노 라디칼(여기서, R12는 각각 동일하거나 상이하고, 1 내지 3개의 헤테로 원자 N, O 및/또는 S에 의해 끊길 수 있는 C1-C30지방족, C7-C60아르지방족 또는 C6-C30방향족 탄화수소 라디칼이며; 퍼플루오르화되거나 부분적으로 플루오르화된 알킬 (C1-C18); 또는 아미노 라디칼의 질소원자는 추가로 질소, 산소, 황 또는 그의 조합물로부터 선택된 헤테로 원자를 환에 함유하고 추가의 환 시스템에 융합 결합되거나 브릿지되어 개질될 수 있는 포화 또는 불포화, 방향족 또는 비방향족 5 내지 7원 환 시스템의 일부이고; 또는 암모늄 라디칼 -NR12 4 -A-(여기서, A-는 무기 또는 유기 음이온이다.); 또는 아지드 라디칼 -N3; 또는 라디칼 R1과 R2또는 R2와 R3은 함께 하기 일반식의 환 시스템을 형성하고, X는 -CH2R1,CH2-NO2, -CH2-Hal(여기서, Hal은 할로겐이다.), -CH2OH, -CH2OCH3, -CH2OCO(C1-C4)알킬, -CH2-O-SiR|3 4, -CH2-O-트리틸, -COOH-, -COO-(C1-C4)알킬, -CH2-O-SO2-(C1-C4)-알킬 또는 -CH2-O-SO2-C6H4-(C1-C4)-알킬이다.〕Wherein n 1 is a number from 6 to 100, n 2 is a number from 3 to 100, and R 1 , R | 2 and R < 3 > are, independently of each other, the same or different, hydroxyl; Branched or unbranched, cyclic or branched C 1 -C 30 -alkoxy; Branched or unbranched, cyclic or branched C 2 -C 6 alkyl, 30 -alkenoxy, wherein alkoxy and alkenoxy radicals may be partially or fully fluorinated; Unsubstituted -O- aryl (C 6 -C 30), or 1 to 5 C 1 -C 30 - alkyl, radical or a C 1 -C 30 - aryl optionally substituted by a -O- alkoxy radical (C 6 -C 30 ); -O- (C 1 -C | 4) - alkyl, - (C 6 -C 30) aryl; -OC 60 -C 70 -fullerene; -O- (alkylene (C 0 -C 30) -Y- alkyl - (C 1 -C | 30) ) x, -O- ( aryl (C 6 -C 30) -Y- aryl - (C 1 - C 30)) x, -O- (aryl (C 6 -C 30) -Y- alkyl, - (C 6 -C 30)) | x, -O- (alkylene- (C 6 -C 30 ) -Y-aryl- (C 6 -C 30 ) -alkyl (C 0 -C 4 )) x wherein x is from 1 to 30, And Y is a chemical bond, O, S, SO 2 , PR 4 , PR 4 3 , Si, SiR 4 2 or NR 4 wherein the radical R 4 is hydrogen, C 1 -C 4 -alkyl Or C 1 -C 4 -alkoxy; Radical-O-COR 6 wherein R 6 is OH, saturated or unsaturated, branched or unbranched, cyclic or in the ring (C 1 -C 18 -alkyl, partially fluorinated or perfluorinated ((C 1 - . C 18) - alkyl, phenyl or (C 1 -C 18) - alkyl-phenyl; radical -O-PR 2 7 or -O-PR 2 7 {wherein R 7 is hydrogen, methyl, ethyl, propyl, butyl vinyl, allyl, isopropyl, isobutyl, neopentyl, t- butyl, cyclohexyl, cyclopentyl, phenyl, tolyl, benzyl, partly fluorinated or perfluorinated alkyl, - (C 1 -C 18), and O , OH, S, and NR 8 2 (wherein, R 8 is hydrogen, C 1 -C 8 - alkyl or phenyl)}; radical -O-SO 2 R 9 (wherein, R 9 is methyl, ethyl, propyl, butyl (C 1 -C 18 ), O (C 1 -C 18 ), partially fluorinated or perfluorinated alkyl, (C 1 -C 18 ) alkyl, (C 1 -C 18 ) alkenyl such as vinyl, allyl, isopropyl, isobutyl, neopentyl, t- butyl, cyclohexyl, cyclopentyl, phenyl, , OR 8 , S, or NR 2 8 A radical -O-SiR 10 3 wherein R 10 is selected from the group consisting of methyl, ethyl, propyl, butyl, vinyl, allyl, isopropyl, isobutyl, neopentyl, t- butyl, cyclohexyl, cyclopentyl, O-BR 11 3 wherein R 11 is selected from the group consisting of methyl (C 1 -C 18 ), O, OR 8 , S, or NR 2 8 ; , ethyl, propyl, butyl, vinyl, allyl, isopropyl, isobutyl, neopentyl, t- butyl, cyclohexyl, cyclopentyl, phenyl, tolyl, flower part, by fluorine or perfluorinated alkyl (C 1 -C 18 ), O, OH, oR 8, S or a NR 2 8);. the formula -NH 2, -NHR 12, or amino radical -NR 12 2 (wherein, R 12 are respectively the same or different and 1 to 3 A C 1 -C 30 aliphatic, C 7 -C 60 araliphatic or C 6 -C 30 aromatic hydrocarbon radical which may be interrupted by two or more heteroatoms N, O and / or S; Perfluorinated or partially fluorinated alkyl (C 1 -C 18); Or the nitrogen atom of the amino radical is a saturated or unsaturated, aromatic or non-aromatic 5 to 12 membered ring which may contain further heteroatoms selected from nitrogen, oxygen, sulfur or a combination thereof and which may be fused together or bridged to a further ring system. 7 < / RTI > ring system; Or ammonium radical -NR 12 4 - A - , wherein A - is an inorganic or organic anion; Or an azide radical -N 3 ; Or the radicals R 1 and R 2 or R 2 and R 3 together are formula In the form a ring system, and X is -CH 2 R 1, CH 2- NO 2, -CH 2 -Hal ( wherein, Hal is a halogen.), -CH 2 OH, -CH 2 OCH 3, -CH 2 OCO (C 1 -C 4) alkyl, -CH 2 -O-SiR | 3 4, -CH 2 -O- trityl, -COOH-, -COO- (C 1 -C 4) alkyl, -CH 2 -O-SO 2 - (C 1 -C 4) - alkyl or -CH 2 -O-SO 2 -C 6 H 4 - (C 1 -C 4 ) -alkyl. 제2항에 있어서, 상기 n1이 6 내지 80, 바람직하게는 6 내지 60의 수이고, n2이 3 내지 60의 수이며, R1, R2및 R3이 서로 독립적으로 -O-(C2-C3-알킬렌-O)x-R5(여기서, R5는 수소, C1-C4-알킬, 아세틸, 벤조일 또는 나프토일이며, x는 1 내지 30의 수이다); -PO(OH2) 또는 -PO-(O-C6CH5)2인 용도.The compound according to claim 2, wherein n 1 is a number of 6 to 80, preferably 6 to 60, n 2 is a number of 3 to 60, and R 1 , R 2 and R 3 are each independently -O- ( C 2 -C 3 -alkylene-O) x -R 5 wherein R 5 is hydrogen, C 1 -C 4 -alkyl, acetyl, benzoyl or naphthoyl, and x is a number from 1 to 30; -PO (OH 2 ) or -PO- (OC 6 CH 5 ) 2 . 제2항 또는 제3항에 있어서, 상기 R1, R2및 R3이 서로 독립적으로 하이드록실, 메톡시, 에톡시, 프로필옥시, 이소프로필옥시, n-부틸옥시, 이소부틸옥시, t-부틸옥시, 비닐옥시, 알릴옥시, 페녹시, 벤질옥시, O-CF3, -O-(CH2CH2-O)x-R5, -O-COR13(여기서, R13은 C1-C8-알킬, 페닐 또는 C1-C8-알킬-페닐이다): 또는 암모늄 기 -NR14R15(여기서, R14및 R15는 서로 독립적으로 수소, 메틸, 에틸, n-프로필, 이소프로필, n-부틸, 이소부틸, t-부틸, 알릴, 비닐, 페닐, 벤질 또는 톨릴이거나, 질소원자는 피페리딜, 모르폴리닐, 피리디늄 또는 퀴놀리늄 환 시스템의 일부이다); 또는 암노늄기 -N HR14R15A'(여기서, A')는 보레이트, 설페이트, 클로라이드, 브로마이드, 니트레이트, 시아나이드, 포스페이트, 카보네이트, 아세테이트 또는 알콜레이트 음이온이다)이고, X가 -CH2Cl, -CH2Br, -COO-CH3, -CH2-O-Si(-CH3)3, -CH2-O -SO2-CH3또는 -CH2-O-SO2-C6H4CH3인 용도.4. The method according to claim 2 or 3, wherein the ROne, R2And R3Independently of one another are selected from the group consisting of hydroxyl, methoxy, ethoxy, propyloxy, isopropyloxy, n-butyloxy, isobutyloxy, t-butyloxy, vinyloxy, allyloxy, phenoxy,3, -O- (CH2CH2-O)x-R5, -O-COR13(Wherein R13COne-C8- alkyl, phenyl or COne-C8-Alkyl-phenyl) or an ammonium group -NR < RTI ID = 0.0 >14R15(Wherein R14And R15Are independently of each other hydrogen, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, t-butyl, allyl, vinyl, phenyl, benzyl or tolyl or the nitrogen atoms are piperidyl, morpholinyl, Lt; / RTI > or quinolinium ring system); Or an ammonium group -N HR14R15A '(Where A ') Is a borate, sulfate, chloride, bromide, nitrate, cyanide, phosphate, carbonate, acetate or alcoholate anion) and X is -CH2Cl, -CH2Br, -COO-CH3, -CH2-O-Si (-CH3)3, -CH2-O-SO2-CH3Or -CH2-O-SO2-C6H4CH3For use. 제2항 내지 제4항 중 어느 한 항에 있어서, 호스트 화합물이 일반식(I)의 1,4-결합 사이클로덱스트린 (여기서, R1및 R2는 각각 OH이고, X는 CH2OH이며, n1은 6 내지 8의 수이다)인 용도.5. A compound according to any one of claims 2 to 4, wherein the host compound is a 1,4-linked cyclodextrin of the general formula (I) wherein R 1 and R 2 are each OH, X is CH 2 OH, and n < 1 > is a number from 6 to 8. 제1항 내지 제5항 중 어느 한 항에 있어서, 게스트 화합물이 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환, 방향족 또는 지방족, 사이클릭 또는 직쇄 알콕; 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환, 방향족 또는 지방족, 사이클릭 또는 직쇄 케톤; 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환 , 방향족 또는 지방족, 사이클릭 또는 직쇄 알데히드; 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환 , 방향족 또는 지방족, 사이클릭 또는 직쇄 카르복실산; 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환 , 방향족 또는 지방족, 사이클릭 또는 직쇄 폴리알콜; 치환 또는 비치환 퀴논; 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환 당; 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환, 방향족 또는 지방족, 사이클릭 또는 직쇄 에테르; 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환, 방향족 또는 지방족, 사이클릭 또는 직쇄 티올; 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환, 방향족 또는 지방족, 사이클릭 또는 직쇄 시아노 화합물; 방향족 또는 지방족 니트로 화합물; 1급, 2급 또는 3급 아민 NR3(여기서, R은 H, OH, 할로겐 또는, 측쇄 또는 비측쇄, 포화 또는 불포화, 치환 또는 비치환, 방향족 또는 지방족, 사이클릭 또는 직쇄 탄화수소 라다킬이다); 유기 금속성 화합물(예: 페로센 또는 금속 알킬); 붕소 화합물 BR3및 BR4 -,(여기서, R은 상기 저의한 바와 같다); 규소 화합물 SiR4(여기서, R은 상기 정의한 바와 같다); 인 화합물 PR'3, PR'5, 또는 PR'6(여기서, R'은 H, O, S, OH, 할로겐 또는 유기 라디칼이다); 황 화합물 SR'2,SR'3,-SO'3,SR'4(여기서, R'는 상기 정의한 바와 같다); 암모늄 화합물 NR'4(여기서, R은 상기 정의한 바와 같다); 무기 양이온(예:1가, 2가, 3가 또는 4가 금속 양이온); 1가 또는 2가 유기 음이온, 바람직하게는 카복실레이트, 페놀레이트, 티올레이트 또는 알콜레이트; 또는 무기 음이온, 또는 상기한 유기 또는 무기 음이온 중 하나와 상기한 양이온 중 하나와의 염인 용도.6. The compound according to any one of claims 1 to 5, wherein the guest compound is branched or unbranched, saturated or unsaturated, substituted or unsubstituted, aromatic or aliphatic, cyclic or straight chain alkoxy; Branched or unbranched, saturated or unsaturated, substituted or unsubstituted, aromatic or aliphatic, cyclic or straight chain ketone; Branched or unbranched, saturated or unsaturated, substituted or unsubstituted, aromatic or aliphatic, cyclic or straight chain aldehyde; Branched or unbranched, saturated or unsaturated, substituted or unsubstituted, aromatic or aliphatic, cyclic or straight chain carboxylic acid; Branched or unbranched, saturated or unsaturated, substituted or unsubstituted, aromatic or aliphatic, cyclic or straight chain polyalcohol; Substituted or unsubstituted quinone; Branched or unbranched, saturated or unsaturated, substituted or unsubstituted sugar; Branched or unbranched, saturated or unsaturated, substituted or unsubstituted, aromatic or aliphatic, cyclic or straight chain ether; Branched or unbranched, saturated or unsaturated, substituted or unsubstituted, aromatic or aliphatic, cyclic or linear chain thiol; Branched or unbranched, saturated or unsaturated, substituted or unsubstituted, aromatic or aliphatic, cyclic or straight chain cyano compound; Aromatic or aliphatic nitro compounds; Primary, secondary or tertiary amines NR 3 (wherein, R is H, OH, a halogen or a branched or unbranched, saturated or unsaturated, cyclic substituted or unsubstituted, aromatic or aliphatic, or a straight-chain hydrocarbon ladder kill) ; Organometallic compounds such as ferrocene or metal alkyl; Boron compounds BR 3 and BR 4 - , wherein R is as defined above; Silicon compound SiR 4 (wherein R is as defined above); Phosphorus compounds PR ' 3 , PR' 5 , or PR ' 6 , wherein R' is H, O, S, OH, halogen or an organic radical; Sulfur compounds SR ' 2 , SR' 3 , -SO 3 , SR ' 4 (wherein R' is as defined above); Ammonium compound NR ' 4 , wherein R is as defined above; Inorganic cations such as monovalent, divalent, trivalent or tetravalent metal cations; A monovalent or divalent organic anion, preferably a carboxylate, phenolate, thiolate or alcoholate; Or an inorganic anion, or a salt of one of the above-mentioned cations with one of the above-mentioned organic or inorganic anions. 제1항 내지 제6항 중 어느 한 항에 있어서, 게스트 화합물이 C1-C30지방족, C2-C30올레핀성 불포화 및 C3-C30지환족 알콜; C3-C|30지방족, C4-C30올레핀성 불포화, C4-C30지환족 및 C8-C30방향족 케톤; C1-C|30지방족, C3-C30올레핀성 불포화, C4-C30치환족 및 C7-C30방향족 알데히드; C1-C|30지방족, C3-C30올레핀성 불포화, C4-C30지환족 및 C7-C30방향족 카복실산; C2-C|30지방족, C4-C30올레핀성 불포화 또는 C8-C30방향족 디카복실산 ; 2 내지 10개의 하이드록실기를 갖는 C2-C|30지방족, C3-C30올레핀성 불포화, C3-C30지환족 및 C6-C|30방향족 폴리알콜; C6-C30하이드록시 방향족 화합물; 탄소수 6 내지 30의 퀴아르지환족 및 방향족 에테르; 3 내지 100개의 에톡시 및/또는 프로폭시 단위를 함유하는 폴리에테르; NH3, 모노 -(C1-C18)-알킬-, 디-(C1-C18)-알킬- 및 트리-(C1-C|18)-알킬-아민, 질소 함유 헤테로사이클; 아미노산; 알칼리 금속 및 알카리 토금속 양이온, Zn2+,Mn2+,Co2+,Fe|3+및 Al3+, NO3 -, OH-, HSO4 -, SO4 2-,HSO|3 -, SO3 2-,S2 -, S2O3 2-, HCO3 -, CO3 2-, H2PO4 -, HPO4 2-〈 PO4 3, CN-, CF3SO3 -, CF3COO-, F-, Cl-, Br-, I-, PF6 -, 아연 테트라시아네이트, 퍼클로레이트, SiF6 2-, 테트라플루오로보레이트, 테트라페닐보레이트; 포화 또는 불포화 지방족 또는 지환족 또는 방향족 카복실레이이트 또는 설포네이트; 및 하기 일반식(Ⅳ)의 디설포피롤리디늄 베타인인 용도.7. The process of any one of claims 1 to 6 wherein the guest compound is selected from the group consisting of C 1 -C 30 aliphatic, C 2 -C 30 olefinically unsaturated and C 3 -C 30 alicyclic alcohols; C 3 -C | 30 aliphatic, C 4 -C 30 olefinically unsaturated, C 4 -C 30 alicyclic and C 8 -C 30 aromatic ketones; C 1 -C? 30 aliphatic, C 3 -C 30 olefinically unsaturated, C 4 -C 30 group, and a substituted C 7 -C 30 aromatic aldehyde; C 1 -C? 30 aliphatic, C 3 -C 30 olefinic unsaturation, C 4 -C 30 alicyclic and C 7 -C 30 aromatic carboxylic acids; C 2 -C | 30 aliphatic, C 4 -C 30 olefinically unsaturated or C 8 -C 30 aromatic dicarboxylic acid; C 2 -C 6 alkyl group having 2 to 10 hydroxyl groups 30 aliphatic, C 3 -C 30 olefinically unsaturated, C 3 -C 30 alicyclic and C 6 -C | 30 aromatic polyalcohol; C 6 -C 30 hydroxy aromatic compounds; Quarternary alicyclic groups and aromatic ethers having 6 to 30 carbon atoms; Polyethers containing from 3 to 100 ethoxy and / or propoxy units; NH 3, mono - (C 1 -C 18) - alkyl, di - (C 1 -C 18) - alkyl and tri - (C 1 -C | 18) - alkyl-amines, a nitrogen-containing heterocycle; amino acid; Alkali metal and alkaline earth metal cations, Zn 2+ , Mn 2+ , Co 2+ , Fe | 3+ and Al 3+ , NO 3 - , OH - , HSO 4 - , SO 4 2- , HSO | 3 - , SO 3 2- , S 2 - , S 2 O 3 2- , HCO 3 - , CO 3 2- , H 2 PO 4 - , HPO 4 2- PO 4 3 , CN - , CF 3 SO 3 -, CF 3 COO -, F -, Cl -, Br -, I -, PF 6 -, zinc tetra-cyanate, perchlorate, SiF 6 2-, tetrafluoroborate, tetraphenylborate; Saturated or unsaturated aliphatic or alicyclic or aromatic carboxylates or sulfonates; And disulfopyrrolidinium betaines of the general formula (IV). 〔상기 식에서, R1' 및 R2' 는 수소, 아킬(C1-C5) 또는 알콕시 -(C1-C5) 라디칼, 폴리옥시알킬렌 라디탈, 바람직하게는 폴리옥시에틸렌 또는 폴리옥시프로필렌 라디칼, 또는 일반식(알킬렌 -(C1-C5)-O)n-R의 라디칼(여기서, R은 수소원자 또는 알킬(C1-C4) 라디칼이고, n은 1 내지 10의 수이며, X 및 Y는 각각 알킬렌(C1-C|5)이다)이다〕.(C 1 -C 5 ) or alkoxy- (C 1 -C 5 ) radicals, polyoxyalkylene radicals, preferably polyoxyethylene or polyoxyalkylene radicals, in which R 1 'and R 2 ' (C 1 -C 5 ) -O) n -R wherein R is a hydrogen atom or an alkyl (C 1 -C 4 ) radical and n is an integer from 1 to 10 And X and Y are each alkylene (C 1 -C 5 ). 제1항 내지 제7항 중 어느 한 항에 있어서, 환식 결합 폴리사카라이드(호스트 화합물)가, 각각의 경우, 동일 하거나 에난티오머성 사카라이드 단위 또는 당해 단위의 에난티오머 혼합물(여기서, R1, R2, R3및 X는 각각의 경우에 서로 동일한 의미를 갖는다)로 구성되는 용도.The process according to any one of claims 1 to 7, wherein the cyclic bonded polysaccharide (host compound) comprises in each case the same or an enantiomeric saccharide unit or an enantiomeric mixture of the said unit, wherein R 1 , R < 2 >, R < 3 > and X have the same meanings in each case). 제1항 내지 제8항 중 어느 한 항에 있어서, 동일하거나 상이한 게스트 화합물을 갖는 포접 화합물의 혼합물 또는 혼합 결정을 사용하는 용도.9. The use according to any one of claims 1 to 8, wherein a mixture or blend of inclusion compounds having the same or different guest compounds is used. 통상적인 토너 결합제와 제1항 내지 제9항 중의 어느 한 항에 기재된 1 이상의 포접 화합물 0.01 내지 50중량%, 바람직하게는 0.5 내지 20중량%를 포함하는 전자사진 토너.An electrophotographic toner comprising a conventional toner binder and 0.01 to 50% by weight, preferably 0.5 to 20% by weight, of at least one inclusion compound according to any one of claims 1 to 9. 포접 화합물을 토너 결합제에 균질하게 혼입시키는, 제10항에서 청구한 전자사진 토너의 제조방법.The method of producing an electrophotographic toner as claimed in claim 10, wherein the inclusion compound is homogeneously incorporated into the toner binder. 에폭사이드, 카복실기 또는 하이드록실기를 함유하는 폴리에스테르 수지 또는 아크릴 수지 또는 이들 수지의 혼합물 및 제1항 내지 제9항 중 어느 한 항에 기재된 1 이상의 포접 화합물 0.01 내지 50중량%, 바람직하게는 0.5 내지 20중량%를 포함하는 분말 또는 분말 도료.A polyester resin or an acrylic resin containing an epoxy, a carboxyl group or a hydroxyl group, or a mixture of these resins and 0.01 to 50% by weight of at least one inclusion compound according to any one of claims 1 to 9, 0.5 to 20% by weight. 포접 화합물을 수지에 균일하게 혼입시키는, 제12항에서 청구한 분말 또는 분말 도료의 제조 방법.A process for producing a powder or powder coating as claimed in claim 12, wherein the inclusion compound is uniformly incorporated into the resin. 3 내지 100개의 단량체성 사카라이드 단위를 함유하고, 그의 분자 골격내에 공동을 형성하는 환식 결합 폴리사카라이드인 호스트 화합물과, 고체 입자 크기가 0.1 내지 1000㎛, 바람직하게는 0.5 내지 100㎛이고, 칼-피셔법으로 측정한 함수율이 0.1 내지 20%이며, 열안정도가 200℃ 이상인, 상기 공동 속에 게스트 화합물로서 포함되는 1 이상의 화합물로 구성되는 포접 화합물.A host compound which is a cyclic bonded polysaccharide which contains 3 to 100 monomeric saccharide units and forms a cavity in its molecular framework, and a host compound having a solid particle size of 0.1 to 1000 탆, preferably 0.5 to 100 탆, An inclusion compound composed of at least one compound contained in the cavity as a guest compound, having a water content of 0.1 to 20% as measured by the Fischer method and a thermal stability of 200 DEG C or more. 제14항에 있어서, 호스트 화합물이 제2항 내지 제5항 중 어느 한 항에 정의된 바와 같고, 게스트 화합물이 제6항 또는 제7항에 정의된 바와 같은 포접 화합물.The inclusion compound according to claim 14, wherein the host compound is as defined in any one of claims 2 to 5, and the guest compound is as defined in claim 6 or 7. 제14항 또는 제15항에 있어서, 호스트 화합물이 제5항에서 정의된 바와 같고, 게스트 화합물이 LiCl, ZnCl2, SrCl2, 옥타데실 3-(3,5--t-부틸-4-하이드록시페닐)-프로피오네이트, Na2CO3, NaBF4, Zn(NO3)2, CdCl2, FeSO4, 옥살산, NaB(C6H5)4, KNO3, 코코넛알킬디메틸벤질암모늄 클로라이드, 살리실산, 스테아르산, MnSO4, 트리페닐아민, 나트륨 트리플루오로메탄설포네이트, CH3COONa, p-벤조퀴논, 안트라센, 2,5-디-t-부틸-하디드로퀴논, 트리에틸아민, 테트라메틸포스포늄 클로라이드, 페로센, KPF6, K2Ca(NO3)2, CaSO4, AL(NO3)|3, 프로피온산, 글리콜 비스〔3,3-비스(4'-히드록시-3'-t-부틸페닐)-부타노에이트〕, 펜타에리트리톨 테트라키스〔3,5-디-t-부틸-4-하이드록시페닐프로피오네이트〕, β,β′-티오디(프로피온산 라우릴에스테르), β,β'-티오디(프로피온산 스테아릴에스테르), 디옥타데실디설파이드, 트리스(2,4-디-t-부틸페닐)포스파이트, C12/C14-알킬트리메틸암모늄 클로라이드, 벤조산, 디데실디메틸암모늄 클로라이드, 디데실메틸알콕시암모늄 프로피오네이트, 폴리(디알릴 디메틸암모늄 클로라이드), K2CO3, N-(트리하이드로퍼플루오로알켄)-N,N,N-트리알킬암모늄 메토설페이트, 2,4,5,2'3',4,-헥사하이드록시벤조페논, 2,4,6-트리하이드록시벤조산 또는 1,1,1-트리하이드록시메틸에탄인 포접 화합물.15. The method of claim 14 or claim 15, wherein the host compound is as defined in claim 5, wherein the guest compound LiCl, ZnCl 2, SrCl 2, octadecyl-3- (3,5 - t- butyl-4-hydroxy hydroxyphenyl) -propionate, Na 2 CO 3, NaBF 4 , Zn (NO 3) 2, CdCl 2, FeSO 4, oxalic acid, NaB (C 6 H 5) 4, KNO 3, coconut alkyl dimethyl benzyl ammonium chloride, But are not limited to, salicylic acid, stearic acid, MnSO 4 , triphenylamine, sodium trifluoromethanesulfonate, CH 3 COONa, p-benzoquinone, anthracene, 2,5- Methylphosphonium chloride, ferrocene, KPF 6 , K 2 Ca (NO 3 ) 2 , CaSO 4 , AL (NO 3 ) 3 , propionic acid, glycol bis [3,3-bis (4'-hydroxy-3'-t-butylphenyl) butanoate], pentaerythritol tetrakis [3,5- -Hydroxyphenylpropionate], β, β'-thiodi (lauryl propionate), β, β'-thiodi (stearyl propionate), dioctadecyl disulfide, tris (2,4- t-butylphenyl) phosphite, C 12 / C 14 -alkyltrimethylammonium chloride, benzoic acid, didecyldimethylammonium chloride, didecylmethylalkoxyammonium propionate, poly (diallyldimethylammonium chloride), K 2 CO 3 , (Trihydroperfluoroalkene) -N, N, N-trialkylammonium methosulfate, 2,4,5,2'3 ', 4-hexahydroxybenzophenone, 2,4,6-tri Hydroxybenzoic acid or 1,1,1-trihydroxymethyl ethane. 환식 결합 폴리사카라이드를 7 내지 14, 바람직하게는 8 내지 12의 pH에서 게스트 화합물과 반응시키고, 생성된 포접 화합물을 분무 건조시키거나 건조시키고, 밀링하는, 제14항 내지 제16항 중 어느 한 항에서 청구한 포접 화합물의 제조 방법.The process according to any one of claims 14 to 16, wherein the cyclic bonded polysaccharide is reacted with a guest compound at a pH of 7 to 14, preferably 8 to 12, and the resulting inclusion compound is spray dried, dried and milled ≪ / RTI > ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960015263A 1995-05-10 1996-05-09 Uses of cyclic polysaccharide inclusion compounds as charge control agents KR960042238A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19517034A DE19517034A1 (en) 1995-05-10 1995-05-10 Use of inclusion compounds of ring-shaped polysaccharides as charge control agents
DE19517034.2 1995-05-10

Publications (1)

Publication Number Publication Date
KR960042238A true KR960042238A (en) 1996-12-21

Family

ID=7761492

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960015263A KR960042238A (en) 1995-05-10 1996-05-09 Uses of cyclic polysaccharide inclusion compounds as charge control agents

Country Status (7)

Country Link
US (1) US5800602A (en)
EP (1) EP0742230A3 (en)
JP (1) JPH08325305A (en)
KR (1) KR960042238A (en)
CA (1) CA2176398A1 (en)
DE (1) DE19517034A1 (en)
TW (1) TW342396B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6132916A (en) * 1996-11-21 2000-10-17 Minolta Co., Ltd. Toner for developing electrostatic latent images
DE19711260A1 (en) * 1997-03-18 1998-09-24 Clariant Gmbh Cyclooligosaccharide boron complex
US7195923B2 (en) * 2001-01-31 2007-03-27 Scripps Laboratories, Inc. Ratiometric determination of glycated protein
SE0300801D0 (en) * 2003-03-21 2003-03-21 Paul Gatenholm Polymeric film or coating comprising hemicellulose
US7014968B2 (en) 2003-12-30 2006-03-21 Samsung Electronics Co., Ltd. Organophotoreceptor with charge transport material having a thiiranyl group
US7851457B2 (en) * 2004-01-29 2010-12-14 Innovative Biologics, Inc. β-Cyclodextrin derivatives
AU2006211173A1 (en) * 2005-01-28 2006-08-10 Pinnacle Pharmaceuticals, Inc. Beta-cyclodextrin derivatives as antibacterial agents
JP2007206262A (en) * 2006-01-31 2007-08-16 Tomoegawa Paper Co Ltd Electrophotographic toner
DE102009020544A1 (en) * 2009-05-08 2010-11-11 Heinrich-Heine-Universität Düsseldorf Preparing a copolymer, useful to produce e.g. plastics, comprises providing a cyclodextrin compound, providing a metallocene compound with double bonds and providing a styrene compound, adding an initiator and polymerizing components
WO2012061112A2 (en) 2010-10-25 2012-05-10 Chapman Rick L Filtration material using fiber blends that contain strategically shaped fibers and/or charge control agents
US8974993B2 (en) * 2013-01-15 2015-03-10 Xerox Corporation UV red fluorescent EA toner

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4656112A (en) * 1984-09-12 1987-04-07 Orient Chemical Industries, Ltd. Toner for developing electrostatic latent images
US4683188A (en) * 1985-05-28 1987-07-28 Hodogaya Chemical Co., Ltd. Electrophotographic toner containing metal complex charge control agent
US4684596A (en) * 1986-02-18 1987-08-04 Eastman Kodak Company Electrographic toner and developer composition containing quaternary ammonium salt charge-control agent
JPS63194946A (en) * 1987-02-10 1988-08-12 東洋製罐株式会社 Multilayer resin molded form
US4789614A (en) * 1987-12-17 1988-12-06 Eastman Kodak Company Toners and developers containing benzyldimethylalkylammonium charge-control agents
DE3837345A1 (en) * 1988-11-03 1990-05-10 Hoechst Ag USE OF COLORLESS HIGH GRADE FLUORATED AMMONIUM AND IMMONIUM COMPOUNDS AS LOADING AGENTS FOR ELECTROPHOTOGRAPHIC RECORDING METHODS
DE4037518C2 (en) * 1989-11-27 1998-12-17 Toyo Boseki Polymer particles, processes for their manufacture and use thereof
US5352521A (en) * 1990-11-20 1994-10-04 Toyo Boseki Kabushiki Kaisha Resin particles, method for production thereof and their uses
JP2798487B2 (en) * 1990-07-31 1998-09-17 オリヱント化学工業株式会社 Azine dyes with excellent heat and light resistance
US5187038A (en) * 1990-09-19 1993-02-16 Hoechst Aktiengesellschaft Polymeric ammonium compounds as charge control agents
DE4029653A1 (en) * 1990-09-19 1992-03-26 Hoechst Ag Use of polymeric ammonium salts - as charge controlling agents in electrophotographic toners and developers and in powders and powder lacquers
JP3158713B2 (en) * 1992-09-17 2001-04-23 株式会社日立製作所 Electrophotographic toner
DE4321289A1 (en) * 1993-06-26 1995-01-05 Hoechst Ag Electret fibres with improved charge stability, manufacture thereof, and textile material containing same
US5432274A (en) * 1993-07-28 1995-07-11 National Research Council Of Canada Redox dye and method of preparation thereof using 2-hydroxypropyl-β-cyclodextrin and 1,1'-dimethylferrocene
JP3373610B2 (en) * 1993-08-23 2003-02-04 オリヱント化学工業株式会社 Chargeable resin powder and related technologies
US5492615A (en) * 1994-11-22 1996-02-20 Learonal Inc. Cyclodextrin stabilization of organic metal finishing additives in aqueous metal treating baths

Also Published As

Publication number Publication date
EP0742230A2 (en) 1996-11-13
JPH08325305A (en) 1996-12-10
TW342396B (en) 1998-10-11
US5800602A (en) 1998-09-01
DE19517034A1 (en) 1996-11-14
EP0742230A3 (en) 1997-10-01
CA2176398A1 (en) 1996-11-11

Similar Documents

Publication Publication Date Title
KR960042238A (en) Uses of cyclic polysaccharide inclusion compounds as charge control agents
US4482698A (en) Thermosetting coating composition containing a blocked acid as catalyst
JP3511144B2 (en) Storage stable solution of accelerator system
CA2241773A1 (en) Products obtainable by salt formation from polyamines, and the use thereof as dispersing agents for pigments and extenders
US8501641B2 (en) Compositions comprising cationic fluorinated ether silanes, and related methods
JP2008511764A5 (en)
SE7614619L (en) PREPARATION OF BENZYL AND ARYL ESTERS OF N-PHOSPHONE MATHYL GYLCINS, HERBICIDIC COMPOSITIONS AND THEIR PREPARATION
JPH09227802A (en) Anticorrosive composition for metal
US7208554B2 (en) Polyoxyalkylene phosphonates and improved process for their synthesis
JP5319717B2 (en) Stable solution of rare earth tris (organophosphorus derivative)
JPS582349A (en) Composition and substrate hydrophobization
EP0098034A3 (en) A process for producing n-phosphonomethylglycine derivatives and herbicidal compounds and compositions prepared thereby
KR960042245A (en) Use of Cyclic Oligosaccharides as Charge Regulators
KR940018413A (en) (Co) polycarbonate and its manufacturing method
JPS55116753A (en) Composition
US3901930A (en) Hydrophilic and difficulty volatile biocidal triorganolead compounds
EP0340753A2 (en) Surface treating agent
JPS5643364A (en) Coating composition
US6717005B2 (en) Epoxy-stabilized polyphosphate compositions
DE69511401D1 (en) AQUEOUS COATING COMPOSITIONS
IE39268L (en) Antistatic polyamide compositions which are stabilised¹against yellowing
GB1489808A (en) Sulphonic derivatives of polyoxapolyfluoroalkanes
JP2000264757A (en) Stone surface modifier and modifying method
JPH0354136B2 (en)
JPS5584341A (en) Chlorine-containing resin omposition

Legal Events

Date Code Title Description
N231 Notification of change of applicant
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application