KR960040086A - Method and apparatus for manufacturing a high thermal resistance transparent heating conductive film - Google Patents

Method and apparatus for manufacturing a high thermal resistance transparent heating conductive film Download PDF

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Publication number
KR960040086A
KR960040086A KR1019950008067A KR19950008067A KR960040086A KR 960040086 A KR960040086 A KR 960040086A KR 1019950008067 A KR1019950008067 A KR 1019950008067A KR 19950008067 A KR19950008067 A KR 19950008067A KR 960040086 A KR960040086 A KR 960040086A
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South Korea
Prior art keywords
glass substrate
raw material
material solution
chamber
conductive film
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KR1019950008067A
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Korean (ko)
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KR0150721B1 (en
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한원택
황태진
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한원택
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H05B3/14—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
    • H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
    • H05B3/265—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/013—Heaters using resistive films or coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017—Manufacturing methods or apparatus for heaters

Abstract

본 발명은 고전기저항 투명 발열 도전막의 제조방법 및 장치에 관한 것으로, 특히 제조공정이 단순하고 설비비가 적게 들면서도 광학적으로 투명하면서 전기적으로 전도성을 갖는 발열막을 제조할 수 있는 고전기저항 투명 발열 도전막의 제조방법 및 장치에 관한 것이다. 본 발명의 방법은 투명 발열 도전막의 원료용액을 제조하는 단계; 상기 원료용액의 막을 표면에 형성시킬 유리기판을 세척하는 단계; 상기 유리기판을 고온으로 유지되고 있는 챔버의 내부에서 예열하는 단계; 상기 예열시킨 유리기판의 표면에 상기 원료용액을 분사시키는 단계; 상기 원료용액이 분사된 유리기판을 고온으로 유지하는 단계; 상기 유리기판을 냉각하는 단계를 포함함을 특징으로 한다. 또한, 본 발명의 장치는 고온으로 유지되는 챔버, 표면에 고전기저항 투명 발열 도전막을 형성할 상기 유리기판을 그 챔버내에서 전, 후방으로 이동시키기 위한 이동수단, 및 상기 챔버의 내부에서 이동되고 있는 유리기판 표면에 고전기저항 투명 발열 도전막의 원료용액을 분사시키기 위하여 챔버내부에 고정설치된 분사수단을 포함하는 것을 특징으로 한다.The present invention relates to a method and apparatus for manufacturing a high resistance transparent heat generating conductive film, and in particular, to manufacture a high resistance transparent heat generating conductive film which can manufacture a heat generating film having an optically transparent and electrically conductive with a simple manufacturing process and low equipment cost. A method and apparatus are disclosed. The method of the present invention comprises the steps of preparing a raw material solution of the transparent heating conductive film; Washing the glass substrate to form a film of the raw material solution on the surface; Preheating the glass substrate in a chamber maintained at a high temperature; Spraying the raw material solution on a surface of the preheated glass substrate; Maintaining the glass substrate sprayed with the raw material solution at a high temperature; It characterized in that it comprises the step of cooling the glass substrate. In addition, the apparatus of the present invention is a chamber that is maintained at a high temperature, moving means for moving the glass substrate to form a high-electromagnetic resistance transparent heating conductive film on the surface before and after in the chamber, and the inside of the chamber being moved It characterized in that it comprises a spray means fixed to the inside of the chamber to inject the raw material solution of the high-electromagnetic resistance transparent heating conductive film on the glass substrate surface.

Description

고전기저항 투명 발열 도전막의 제조방법 및 장치Method and apparatus for manufacturing a high thermal resistance transparent heating conductive film

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명의 고전기저항 투명 발열 도전막의 제조공정을 나타낸 공정 순서도, 제2도는 본 발명과 고전기저항 투명 발열 도전막의 제조장치의 개략도.1 is a process flow chart showing the manufacturing process of the high-electromagnetic resistance transparent heating conductive film of the present invention, and FIG. 2 is a schematic diagram of the present invention and an apparatus for producing a high-electric resistance transparent heating conductive film.

Claims (8)

투명 발열 도전막의 원료용액을 제조하는 단계; 상기 원료용액의 막을 표면에 형성시킬 유리기판을 세척하는 단계; 상기 유리기판을 고온으로 유지되고 있는 챔버의 내부에서 예열하는 단계; 상기 예열시킨 유리기판의 표면에 상기 원료용액을 분사시키는 단계; 상기 원료용액이 분사된 유리기판을 고온으로 유지하는 단계; 상기 유리기판을 냉각하는 단계를 포함함을 특징으로 고전기저항 투명 발열 도전막의 제조방법.Preparing a raw material solution of the transparent exothermic conductive film; Washing the glass substrate to form a film of the raw material solution on the surface; Preheating the glass substrate in a chamber maintained at a high temperature; Spraying the raw material solution on a surface of the preheated glass substrate; Maintaining the glass substrate sprayed with the raw material solution at a high temperature; And cooling the glass substrate. 제1항에 있어서, 상기 원료용액을 제조하는 단계는 원료용액내의 산화주석 대 불화주석의 몰비 (mole ratio)가 1:0.5 내지 1:0.3이 되도록 적정량의 SnCl2·xH20 분말을 알콜에 용해하여 적정량의 불산 (HF)용액과 혼합하고, 이 혼합액에 적당량의 염삼 (HC1)용액을 첨가하여 약 pH1이 되도록 조정하고, 이를 약 30분 동안 교반하여줌을 특징으로 하는 고전기저항 투명 발열 도전막의 제조방법.The method of claim 1, wherein the preparing of the raw material solution comprises dissolving an appropriate amount of SnCl2.xH20 powder in alcohol so that the mole ratio of tin oxide to tin fluoride in the raw material solution is 1: 0.5 to 1: 0.3. Mixed with a hydrofluoric acid (HF) solution, and added to the mixed solution an appropriate amount of saline (HC1) solution to adjust the pH to about pH1, and stirred for about 30 minutes, characterized in that the method for producing a high thermal resistance transparent heating conductive film . 제1항에 있어서, 상기 유리기판을 세척하는 단계는 준비한 유리기판을 통상의 세척제를 사용하여 1차 세척한 후, 잔존하는 세척제를 증류수로 세척하고, 이어서 적당량의 수산화나트륨이 포화된 알콜용액에 그 유리기판을 24시간 동안 침지시켜주어 유리기판을 활성화시켜 주고, 상기 유리기판 표면에 잔존하고 있는 화학약품을 제거하기 위하여 통상의 세제를 이용하여 2차 세척하여줌을 특징으로 하는 고전기저항 투명 발열 도전막의 제조방법.The method of claim 1, wherein the washing of the glass substrate is performed by first washing the prepared glass substrate using a conventional cleaning agent, followed by washing the remaining cleaning agent with distilled water, and then, in an alcohol solution saturated with sodium hydroxide. High heat resistance transparent heat generation by immersing the glass substrate for 24 hours to activate the glass substrate, and second cleaning using a normal detergent to remove the chemicals remaining on the surface of the glass substrate Method for producing a conductive film. 제1항에 있어서, 상기 유리기판을 예열하는 단계는 상기 원료용액을 유리기판을 분사하기 전에 470℃ 내지 520℃의 온도로 유지되고 있는 챔버내부에서 5분 내지 2시간 예열함을 특징으로 하는 고전기저항 투명 발열 도전막의 제조방법.The method of claim 1, wherein the preheating of the glass substrate comprises preheating the raw material solution in a chamber maintained at a temperature of 470 ° C. to 520 ° C. before spraying the glass substrate. Method of manufacturing a resistive transparent heating conductive film. 제1항에 있어서, 상기 원료용액을 분사시키는 단계는 상기 유리기판을 예열한 후, 챔버의 벽면에 장착되어 있는 스프레이 노즐을 통하여 상기 원료용액을 챔버내부에서 이동되고 있는 유리기판의 표면에 분사시킴을 특징으로 하는 고전기저항 투명 발열 도전막의 제조방법.The method of claim 1, wherein the spraying of the raw material solution comprises preheating the glass substrate and then spraying the raw material solution onto the surface of the glass substrate being moved inside the chamber through a spray nozzle mounted on a wall of the chamber. A method of manufacturing a high electromotive resistance transparent heating conductive film, characterized in that. 고온으로 유지되는 챔버, 표면에 고전기저항 투명 발열 도전막을 형성할 상기 유리기판을 그 챔버내에서 전, 후방으로 이동시키기 위한 이동수단 및 상기 챔버의 내부에서 이동되고 있는 유리기판 표면에 고전기저항 투명 발열 도전막의 원료용액을 분사시키기 위하여 챔버내부에 고정설치된 분사수단을 포함하는 것을 고전기저항 투명 발열 도전막의 제조장치.High temperature resistant transparent heat generation on the chamber maintained at high temperature, moving means for moving the glass substrate to form the high resistance transparent heat generating conductive film on the surface forward and backward in the chamber, and the surface of the glass substrate being moved inside the chamber. And a spraying means fixedly installed in the chamber to inject the raw material solution of the conductive film. 제6항에 있어서, 상기 분사수단은 상기 원료용액을 주입하기 위한 용액주입부 : 상기 주입된 용액을 챔버 내부의 유리기판 표면에 이동시키기 위한 공기를 주입하기 위한 공기주입부 : 및 상기 용액주입부와 공기주입부를 통하여 상기 원료용액과 공기를 상기 유리기판에 분사시키기 위한 스프레이 노즐과 스프레이 건을 포함함을 특징으로 하는 고전기저항 투명 발열 도전막의 제조장치.The method of claim 6, wherein the injection means is a solution injection unit for injecting the raw material solution: an air injection unit for injecting air for moving the injected solution to the glass substrate surface in the chamber: and the solution injection unit And a spray nozzle and a spray gun for spraying the raw material solution and air onto the glass substrate through an air injection unit. 제7항에 있어서, 상기 분사 수단은 상기 챔버 내부의 벽면에 일렬로 장착됨을 특징으로 하는 고전기저항 투명 발열 도전막의 제조장치.8. The apparatus of claim 7, wherein the injection means is mounted in a line on the wall inside the chamber. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950008067A 1995-04-07 1995-04-07 Manufacturing method and apparatus of high resistance transparency heating conductivity membrane KR0150721B1 (en)

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KR0150721B1 KR0150721B1 (en) 1998-12-15

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001091518A1 (en) * 2000-05-22 2001-11-29 Park Sung Don Method for producing thin film heating element and heating device using same

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108337746A (en) * 2018-01-25 2018-07-27 陈昭 High stable heating element and preparation method thereof
KR102058865B1 (en) * 2018-04-12 2019-12-24 (주)아이엠 Heating device using hyper heat accelerator and method for manufacturing the same
KR102296895B1 (en) * 2019-09-18 2021-09-01 주식회사 아이엠첨단소재 Heating device and camera for vehicles using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001091518A1 (en) * 2000-05-22 2001-11-29 Park Sung Don Method for producing thin film heating element and heating device using same

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