KR960035599U - Vacuum degree measuring device - Google Patents

Vacuum degree measuring device

Info

Publication number
KR960035599U
KR960035599U KR2019950007742U KR19950007742U KR960035599U KR 960035599 U KR960035599 U KR 960035599U KR 2019950007742 U KR2019950007742 U KR 2019950007742U KR 19950007742 U KR19950007742 U KR 19950007742U KR 960035599 U KR960035599 U KR 960035599U
Authority
KR
South Korea
Prior art keywords
measuring device
vacuum degree
degree measuring
vacuum
measuring
Prior art date
Application number
KR2019950007742U
Other languages
Korean (ko)
Other versions
KR0122874Y1 (en
Inventor
이동민
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950007742U priority Critical patent/KR0122874Y1/en
Publication of KR960035599U publication Critical patent/KR960035599U/en
Application granted granted Critical
Publication of KR0122874Y1 publication Critical patent/KR0122874Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Measuring Fluid Pressure (AREA)
KR2019950007742U 1995-04-17 1995-04-17 Vacuum detector KR0122874Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950007742U KR0122874Y1 (en) 1995-04-17 1995-04-17 Vacuum detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950007742U KR0122874Y1 (en) 1995-04-17 1995-04-17 Vacuum detector

Publications (2)

Publication Number Publication Date
KR960035599U true KR960035599U (en) 1996-11-21
KR0122874Y1 KR0122874Y1 (en) 1999-02-18

Family

ID=19411455

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950007742U KR0122874Y1 (en) 1995-04-17 1995-04-17 Vacuum detector

Country Status (1)

Country Link
KR (1) KR0122874Y1 (en)

Also Published As

Publication number Publication date
KR0122874Y1 (en) 1999-02-18

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040326

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee