KR960029723U - 클리닝 와이퍼 - Google Patents

클리닝 와이퍼

Info

Publication number
KR960029723U
KR960029723U KR2019950002362U KR19950002362U KR960029723U KR 960029723 U KR960029723 U KR 960029723U KR 2019950002362 U KR2019950002362 U KR 2019950002362U KR 19950002362 U KR19950002362 U KR 19950002362U KR 960029723 U KR960029723 U KR 960029723U
Authority
KR
South Korea
Prior art keywords
cleaning wiper
wiper
cleaning
Prior art date
Application number
KR2019950002362U
Other languages
English (en)
Other versions
KR0120929Y1 (ko
Inventor
형남신
김한진
Original Assignee
주식회사제텍스
형남신
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사제텍스, 형남신 filed Critical 주식회사제텍스
Priority to KR2019950002362U priority Critical patent/KR0120929Y1/ko
Publication of KR960029723U publication Critical patent/KR960029723U/ko
Application granted granted Critical
Publication of KR0120929Y1 publication Critical patent/KR0120929Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019950002362U 1995-02-15 1995-02-15 클리닝 와이퍼 KR0120929Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950002362U KR0120929Y1 (ko) 1995-02-15 1995-02-15 클리닝 와이퍼

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950002362U KR0120929Y1 (ko) 1995-02-15 1995-02-15 클리닝 와이퍼

Publications (2)

Publication Number Publication Date
KR960029723U true KR960029723U (ko) 1996-09-17
KR0120929Y1 KR0120929Y1 (ko) 1998-08-01

Family

ID=19407883

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950002362U KR0120929Y1 (ko) 1995-02-15 1995-02-15 클리닝 와이퍼

Country Status (1)

Country Link
KR (1) KR0120929Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200006676A (ko) 2018-07-11 2020-01-21 (주)아이솔루션 반도체 설비 세정용 와이퍼 및 이를 가진 세정 팩

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200006676A (ko) 2018-07-11 2020-01-21 (주)아이솔루션 반도체 설비 세정용 와이퍼 및 이를 가진 세정 팩

Also Published As

Publication number Publication date
KR0120929Y1 (ko) 1998-08-01

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
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J301 Trial decision

Free format text: TRIAL DECISION FOR CONFIRMATION OF THE SCOPE OF RIGHT_DEFENSIVE REQUESTED 20020813

Effective date: 20040228

FPAY Annual fee payment

Payment date: 20090407

Year of fee payment: 12

EXPY Expiration of term