KR960024381U - Wafer exposure apparatus with light transmittance measuring means - Google Patents
Wafer exposure apparatus with light transmittance measuring meansInfo
- Publication number
- KR960024381U KR960024381U KR2019940037366U KR19940037366U KR960024381U KR 960024381 U KR960024381 U KR 960024381U KR 2019940037366 U KR2019940037366 U KR 2019940037366U KR 19940037366 U KR19940037366 U KR 19940037366U KR 960024381 U KR960024381 U KR 960024381U
- Authority
- KR
- South Korea
- Prior art keywords
- light transmittance
- exposure apparatus
- measuring means
- wafer exposure
- transmittance measuring
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940037366U KR960024381U (en) | 1994-12-29 | 1994-12-29 | Wafer exposure apparatus with light transmittance measuring means |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940037366U KR960024381U (en) | 1994-12-29 | 1994-12-29 | Wafer exposure apparatus with light transmittance measuring means |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960024381U true KR960024381U (en) | 1996-07-22 |
Family
ID=60850204
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019940037366U KR960024381U (en) | 1994-12-29 | 1994-12-29 | Wafer exposure apparatus with light transmittance measuring means |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960024381U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19980051522A (en) * | 1996-12-23 | 1998-09-15 | 김영환 | Transmittance Measurement Method of Halftone Phase Inversion Mask |
-
1994
- 1994-12-29 KR KR2019940037366U patent/KR960024381U/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19980051522A (en) * | 1996-12-23 | 1998-09-15 | 김영환 | Transmittance Measurement Method of Halftone Phase Inversion Mask |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Withdrawal due to no request for examination |