KR960022832A - Polyamide film composition - Google Patents
Polyamide film composition Download PDFInfo
- Publication number
- KR960022832A KR960022832A KR1019940033772A KR19940033772A KR960022832A KR 960022832 A KR960022832 A KR 960022832A KR 1019940033772 A KR1019940033772 A KR 1019940033772A KR 19940033772 A KR19940033772 A KR 19940033772A KR 960022832 A KR960022832 A KR 960022832A
- Authority
- KR
- South Korea
- Prior art keywords
- film composition
- polyamide film
- aliphatic
- average particle
- particle diameter
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
- C08L77/02—Polyamides derived from omega-amino carboxylic acids or from lactams thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/002—Physical properties
- C08K2201/005—Additives being defined by their particle size in general
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/16—Applications used for films
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/54—Inorganic substances
- C08L2666/58—SiO2 or silicates
Abstract
지방족 또는 방향족 디아민, 디카르본산, 아미노 애시드를 포함하는 폴리아미드 필름 조성물에 있어서, 평균 입경 0.5~10㎛, 흡유량 200㎖/100g 이하인 이산화규소를 0.01~2.0wt% 더욱 포함하는 것을 특징으로 하는 폴리아미드 필름 조성물은 슬립성이 우수하며 따라서 고속 생산성 및 슬리팅, 인쇄, 라미네이트 등의 후가공이 용이하며 파단이 발생하지 않아 조업성이 우수한 폴리아미드 필름 조성물이다.A polyamide film composition comprising an aliphatic or aromatic diamine, dicarboxylic acid and amino acid, the polyamide film composition comprising 0.01 to 2.0 wt% of silicon dioxide having an average particle diameter of 0.5 to 10 µm and an oil absorption amount of 200 ml / 100 g or less. The amide film composition is a polyamide film composition which is excellent in slip property, and thus has high productivity and easy post-processing such as slitting, printing, and lamination, and does not cause breakage.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940033772A KR0143363B1 (en) | 1994-12-12 | 1994-12-12 | Polyamide film composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940033772A KR0143363B1 (en) | 1994-12-12 | 1994-12-12 | Polyamide film composition |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960022832A true KR960022832A (en) | 1996-07-18 |
KR0143363B1 KR0143363B1 (en) | 1998-07-15 |
Family
ID=19401080
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940033772A KR0143363B1 (en) | 1994-12-12 | 1994-12-12 | Polyamide film composition |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0143363B1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100317906B1 (en) * | 2000-02-22 | 2001-12-22 | 홍원기 | Building Anchoring Method by friction and its design method |
KR100313721B1 (en) * | 1998-11-26 | 2001-12-28 | 김징완 | Method for designing synthetic underground retaining wall by temporary soil protection structure and working process of underground retaining wall of structure |
KR100358600B1 (en) * | 1995-11-02 | 2003-01-29 | 주식회사 코오롱 | Process for preparing polyamide mat film |
-
1994
- 1994-12-12 KR KR1019940033772A patent/KR0143363B1/en not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100358600B1 (en) * | 1995-11-02 | 2003-01-29 | 주식회사 코오롱 | Process for preparing polyamide mat film |
KR100313721B1 (en) * | 1998-11-26 | 2001-12-28 | 김징완 | Method for designing synthetic underground retaining wall by temporary soil protection structure and working process of underground retaining wall of structure |
KR100317906B1 (en) * | 2000-02-22 | 2001-12-22 | 홍원기 | Building Anchoring Method by friction and its design method |
Also Published As
Publication number | Publication date |
---|---|
KR0143363B1 (en) | 1998-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20040331 Year of fee payment: 7 |
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LAPS | Lapse due to unpaid annual fee |