KR960022613A - Copolymer using N- (tertiary-butyloxycarbonyloxy) maleimide and its preparation method - Google Patents

Copolymer using N- (tertiary-butyloxycarbonyloxy) maleimide and its preparation method Download PDF

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KR960022613A
KR960022613A KR1019940038064A KR19940038064A KR960022613A KR 960022613 A KR960022613 A KR 960022613A KR 1019940038064 A KR1019940038064 A KR 1019940038064A KR 19940038064 A KR19940038064 A KR 19940038064A KR 960022613 A KR960022613 A KR 960022613A
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South Korea
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tertiary
styrene
butyloxycarbonyloxy
maleimide
copolymer
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KR1019940038064A
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Korean (ko)
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KR0148622B1 (en
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안광덕
정찬문
구재선
강종희
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김은영
한국과학기술연구원
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Priority to KR1019940038064A priority Critical patent/KR0148622B1/en
Publication of KR960022613A publication Critical patent/KR960022613A/en
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Publication of KR0148622B1 publication Critical patent/KR0148622B1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36Amides or imides
    • C08F222/40Imides, e.g. cyclic imides
    • C08F222/402Alkyl substituted imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06Hydrocarbons
    • C08F212/08Styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36Amides or imides
    • C08F222/40Imides, e.g. cyclic imides
    • C08F222/404Imides, e.g. cyclic imides substituted imides comprising oxygen other than the carboxy oxygen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerization Catalysts (AREA)

Abstract

N-(터셔리-부틸옥시카보닐옥시)말레이미드(t-BOCOMI)와 스티렌 유도체(X-St)의 단위를 가진 아래 구조식의 N-(터셔리-부틸옥시카보닐옥시)말레이미드를 이용한 공중합체 및N- (tertiary-butyloxycarbonyloxy) maleimide having the unit of the following structural formula with units of t-BOCOMI and styrene derivative (X-St) Copolymer and

식 중 X-St는 스티렌, p-메틸스티렌, p-아세톡시스티렌, p-염화스티렌, p-염화메틸스티렌, p-히드톡시스티렌, p-터셔리-부톡시카보닐옥시스티렌, p-트리에틸실릴스티렌이며 n은 20~1000이다.Wherein X-St is styrene, p-methylstyrene, p-acetoxy styrene, p-styrene chloride, p-methyl chloride, p-hydroxystyrene, p-tertiary-butoxycarbonyloxystyrene, p- Triethylsilylstyrene and n is 20-1000.

N-(터셔리-부틸옥시카보닐옥시)말레이미드와 스티렌 유도체를 디옥산에 용해시키고 라디칼 중합개시제를 가하여 중합시키는 N-터셔리-부틸옥시카보닐옥시말레이드-스티렌유도체 공중합체 제조방법.A method for producing N- (tertary-butyloxycarbonyloxy) maleimide and styrene derivatives in dioxane and polymerizing by adding a radical polymerization initiator.

Description

N-(터셔리-부틸옥시카보닐옥시)말레이미드를 이용한 공중합체 및 그 제조방법Copolymer using N- (tertiary-butyloxycarbonyloxy) maleimide and its preparation method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (2)

N-(터셔리-부틸옥시카보닐옥시)말레이미드(t-BOCOMI)와 스티렌 유도체(X-St)의 단위를 가진 아래 구조식의 N-(터셔리-부틸옥시카보닐옥시)맏레이미드를 이용한 공중합체.N- (tertiary-butyloxycarbonyloxy) maleimide having the unit of N- (tertiary-butyloxycarbonyloxy) maleimide (t-BOCOMI) and styrene derivative (X-St) Copolymer Used. 식 중 X-St는 스티렌, p-메틸스티렌, p-아세톡시스티렌, p-염화스티렌, p-염화메틸스티렌, p-히드록시스티렌, p-터셔리-부톡시카보닐옥시스티렌, p-트리메틸실릴스티렌이며 n은 20∼1000이다.Wherein X-St is styrene, p-methylstyrene, p-acetoxystyrene, p-styrene chloride, p-methyl chloride, p-hydroxystyrene, p-tertiary-butoxycarbonyloxystyrene, p- Trimethylsilylstyrene and n is 20-1000. N-(터셔리-부틸옥시카보닐옥시)말레이미드와 스티렌 유도체를 디옥산에 용해시키고 라디칼 중합개시제를 가하여 중합시키는 N-터셔리-부틸옥시카보닐옥시말레이미드-스티렌유도체 공중합체 제조방법.A method for producing an N- (tertary-butyloxycarbonyloxymaleimide-styrene derivative copolymer) in which N- (tertiary-butyloxycarbonyloxy) maleimide and styrene derivative are dissolved in dioxane and polymerized by adding a radical polymerization initiator. ※ 참고사항:최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940038064A 1994-12-28 1994-12-28 The copolymer of n-(tert-butyloxycarbonyloxy)maleimide and styrene derivative and its processing method KR0148622B1 (en)

Priority Applications (1)

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KR1019940038064A KR0148622B1 (en) 1994-12-28 1994-12-28 The copolymer of n-(tert-butyloxycarbonyloxy)maleimide and styrene derivative and its processing method

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Application Number Priority Date Filing Date Title
KR1019940038064A KR0148622B1 (en) 1994-12-28 1994-12-28 The copolymer of n-(tert-butyloxycarbonyloxy)maleimide and styrene derivative and its processing method

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KR960022613A true KR960022613A (en) 1996-07-18
KR0148622B1 KR0148622B1 (en) 1999-02-01

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KR100848196B1 (en) * 2007-01-18 2008-07-24 주식회사 삼양이엠에스 Thermosetting resin composition for over-coat
KR102384231B1 (en) * 2020-02-19 2022-04-07 삼성전자주식회사 Resist compound, method of forming pattern using the same, and method of manufacturing semiconductor device using the same

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