KR960022613A - Copolymer using N- (tertiary-butyloxycarbonyloxy) maleimide and its preparation method - Google Patents
Copolymer using N- (tertiary-butyloxycarbonyloxy) maleimide and its preparation method Download PDFInfo
- Publication number
- KR960022613A KR960022613A KR1019940038064A KR19940038064A KR960022613A KR 960022613 A KR960022613 A KR 960022613A KR 1019940038064 A KR1019940038064 A KR 1019940038064A KR 19940038064 A KR19940038064 A KR 19940038064A KR 960022613 A KR960022613 A KR 960022613A
- Authority
- KR
- South Korea
- Prior art keywords
- tertiary
- styrene
- butyloxycarbonyloxy
- maleimide
- copolymer
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/402—Alkyl substituted imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/404—Imides, e.g. cyclic imides substituted imides comprising oxygen other than the carboxy oxygen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Polymerization Catalysts (AREA)
Abstract
N-(터셔리-부틸옥시카보닐옥시)말레이미드(t-BOCOMI)와 스티렌 유도체(X-St)의 단위를 가진 아래 구조식의 N-(터셔리-부틸옥시카보닐옥시)말레이미드를 이용한 공중합체 및N- (tertiary-butyloxycarbonyloxy) maleimide having the unit of the following structural formula with units of t-BOCOMI and styrene derivative (X-St) Copolymer and
식 중 X-St는 스티렌, p-메틸스티렌, p-아세톡시스티렌, p-염화스티렌, p-염화메틸스티렌, p-히드톡시스티렌, p-터셔리-부톡시카보닐옥시스티렌, p-트리에틸실릴스티렌이며 n은 20~1000이다.Wherein X-St is styrene, p-methylstyrene, p-acetoxy styrene, p-styrene chloride, p-methyl chloride, p-hydroxystyrene, p-tertiary-butoxycarbonyloxystyrene, p- Triethylsilylstyrene and n is 20-1000.
N-(터셔리-부틸옥시카보닐옥시)말레이미드와 스티렌 유도체를 디옥산에 용해시키고 라디칼 중합개시제를 가하여 중합시키는 N-터셔리-부틸옥시카보닐옥시말레이드-스티렌유도체 공중합체 제조방법.A method for producing N- (tertary-butyloxycarbonyloxy) maleimide and styrene derivatives in dioxane and polymerizing by adding a radical polymerization initiator.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940038064A KR0148622B1 (en) | 1994-12-28 | 1994-12-28 | The copolymer of n-(tert-butyloxycarbonyloxy)maleimide and styrene derivative and its processing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940038064A KR0148622B1 (en) | 1994-12-28 | 1994-12-28 | The copolymer of n-(tert-butyloxycarbonyloxy)maleimide and styrene derivative and its processing method |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960022613A true KR960022613A (en) | 1996-07-18 |
KR0148622B1 KR0148622B1 (en) | 1999-02-01 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940038064A KR0148622B1 (en) | 1994-12-28 | 1994-12-28 | The copolymer of n-(tert-butyloxycarbonyloxy)maleimide and styrene derivative and its processing method |
Country Status (1)
Country | Link |
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KR (1) | KR0148622B1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100848196B1 (en) * | 2007-01-18 | 2008-07-24 | 주식회사 삼양이엠에스 | Thermosetting resin composition for over-coat |
KR102384231B1 (en) * | 2020-02-19 | 2022-04-07 | 삼성전자주식회사 | Resist compound, method of forming pattern using the same, and method of manufacturing semiconductor device using the same |
-
1994
- 1994-12-28 KR KR1019940038064A patent/KR0148622B1/en not_active IP Right Cessation
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Publication number | Publication date |
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KR0148622B1 (en) | 1999-02-01 |
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