KR960019116U - Developer spray nozzle - Google Patents

Developer spray nozzle

Info

Publication number
KR960019116U
KR960019116U KR2019940029458U KR19940029458U KR960019116U KR 960019116 U KR960019116 U KR 960019116U KR 2019940029458 U KR2019940029458 U KR 2019940029458U KR 19940029458 U KR19940029458 U KR 19940029458U KR 960019116 U KR960019116 U KR 960019116U
Authority
KR
South Korea
Prior art keywords
spray nozzle
developer spray
developer
nozzle
spray
Prior art date
Application number
KR2019940029458U
Other languages
Korean (ko)
Other versions
KR0117498Y1 (en
Inventor
이창석
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940029458U priority Critical patent/KR0117498Y1/en
Publication of KR960019116U publication Critical patent/KR960019116U/en
Application granted granted Critical
Publication of KR0117498Y1 publication Critical patent/KR0117498Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019940029458U 1994-11-07 1994-11-07 Spray nozzle of developer KR0117498Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940029458U KR0117498Y1 (en) 1994-11-07 1994-11-07 Spray nozzle of developer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940029458U KR0117498Y1 (en) 1994-11-07 1994-11-07 Spray nozzle of developer

Publications (2)

Publication Number Publication Date
KR960019116U true KR960019116U (en) 1996-06-19
KR0117498Y1 KR0117498Y1 (en) 1998-06-01

Family

ID=19397579

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940029458U KR0117498Y1 (en) 1994-11-07 1994-11-07 Spray nozzle of developer

Country Status (1)

Country Link
KR (1) KR0117498Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100788390B1 (en) * 2001-12-29 2007-12-31 엘지.필립스 엘시디 주식회사 Manufacturing Apparatus of Liquid Crystal Display Devices

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100788390B1 (en) * 2001-12-29 2007-12-31 엘지.필립스 엘시디 주식회사 Manufacturing Apparatus of Liquid Crystal Display Devices

Also Published As

Publication number Publication date
KR0117498Y1 (en) 1998-06-01

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20090121

Year of fee payment: 12

EXPY Expiration of term